NL176711C - Buitenassig catoptrisch optisch afbeeldingsstelsel. - Google Patents

Buitenassig catoptrisch optisch afbeeldingsstelsel.

Info

Publication number
NL176711C
NL176711C NLAANVRAGE7208478,A NL7208478A NL176711C NL 176711 C NL176711 C NL 176711C NL 7208478 A NL7208478 A NL 7208478A NL 176711 C NL176711 C NL 176711C
Authority
NL
Netherlands
Prior art keywords
outside
optical image
image system
catoptric optical
catoptric
Prior art date
Application number
NLAANVRAGE7208478,A
Other languages
English (en)
Dutch (nl)
Other versions
NL176711B (nl
NL7208478A (xx
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22553496&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL176711(C) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of NL7208478A publication Critical patent/NL7208478A/xx
Publication of NL176711B publication Critical patent/NL176711B/xx
Application granted granted Critical
Publication of NL176711C publication Critical patent/NL176711C/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G02B17/0636—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
    • G02B23/02—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices involving prisms or mirrors
    • G02B23/06—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices involving prisms or mirrors having a focussing action, e.g. parabolic mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Astronomy & Astrophysics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NLAANVRAGE7208478,A 1971-06-21 1972-06-21 Buitenassig catoptrisch optisch afbeeldingsstelsel. NL176711C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15494871A 1971-06-21 1971-06-21

Publications (3)

Publication Number Publication Date
NL7208478A NL7208478A (xx) 1972-12-27
NL176711B NL176711B (nl) 1984-12-17
NL176711C true NL176711C (nl) 1985-05-17

Family

ID=22553496

Family Applications (3)

Application Number Title Priority Date Filing Date
NLAANVRAGE7208478,A NL176711C (nl) 1971-06-21 1972-06-21 Buitenassig catoptrisch optisch afbeeldingsstelsel.
NL8401002A NL8401002A (nl) 1971-06-21 1984-03-29 Buitenassig optisch afbeeldingsstelsel.
NL8401001A NL8401001A (nl) 1971-06-21 1984-03-29 Buitenassig optisch afbeeldingsstelsel.

Family Applications After (2)

Application Number Title Priority Date Filing Date
NL8401002A NL8401002A (nl) 1971-06-21 1984-03-29 Buitenassig optisch afbeeldingsstelsel.
NL8401001A NL8401001A (nl) 1971-06-21 1984-03-29 Buitenassig optisch afbeeldingsstelsel.

Country Status (13)

Country Link
US (1) US3748015A (xx)
JP (3) JPS5751083B1 (xx)
KR (1) KR790000468B1 (xx)
BR (1) BR7203998D0 (xx)
CA (1) CA970611A (xx)
CH (1) CH552222A (xx)
DE (1) DE2230002C2 (xx)
FR (1) FR2143493B1 (xx)
GB (1) GB1401687A (xx)
IL (1) IL39693A (xx)
IT (1) IT956732B (xx)
NL (3) NL176711C (xx)
SE (1) SE383423B (xx)

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* Cited by examiner, † Cited by third party
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BR7203998D0 (pt) 1973-06-05
JPS5517196A (en) 1980-02-06
GB1401687A (en) 1975-07-30
FR2143493A1 (xx) 1973-02-02
NL176711B (nl) 1984-12-17
IL39693A0 (en) 1972-08-30
NL8401002A (nl) 1984-07-02
JPS5751083B1 (xx) 1982-10-30
CH552222A (de) 1974-07-31
NL7208478A (xx) 1972-12-27
CA970611A (en) 1975-07-08
JPS5817933B2 (ja) 1983-04-11
JPS5517197A (en) 1980-02-06
IL39693A (en) 1975-02-10
JPS5817932B2 (ja) 1983-04-11
KR790000468B1 (en) 1979-05-20
IT956732B (it) 1973-10-10
US3748015A (en) 1973-07-24
SE383423B (sv) 1976-03-08
DE2230002A1 (de) 1973-01-11
NL8401001A (nl) 1984-07-02
FR2143493B1 (xx) 1977-12-23
DE2230002C2 (de) 1984-11-22

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