NL1013530A1 - Excimeerlaserinrichting en gas voor excimeerlaser. - Google Patents

Excimeerlaserinrichting en gas voor excimeerlaser.

Info

Publication number
NL1013530A1
NL1013530A1 NL1013530A NL1013530A NL1013530A1 NL 1013530 A1 NL1013530 A1 NL 1013530A1 NL 1013530 A NL1013530 A NL 1013530A NL 1013530 A NL1013530 A NL 1013530A NL 1013530 A1 NL1013530 A1 NL 1013530A1
Authority
NL
Netherlands
Prior art keywords
excimer laser
gas
laser device
excimer
laser
Prior art date
Application number
NL1013530A
Other languages
English (en)
Other versions
NL1013530C2 (nl
Inventor
Katsutomo Terashima
Akira Sumitani
Eiji Sunaka
Original Assignee
Komatsu Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Mfg Co Ltd filed Critical Komatsu Mfg Co Ltd
Publication of NL1013530A1 publication Critical patent/NL1013530A1/nl
Application granted granted Critical
Publication of NL1013530C2 publication Critical patent/NL1013530C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1013530A 1998-11-09 1999-11-09 Excimeerlaserinrichting en gas voor excimeerlaser. NL1013530C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31769298 1998-11-09
JP31769298 1998-11-09

Publications (2)

Publication Number Publication Date
NL1013530A1 true NL1013530A1 (nl) 2000-05-10
NL1013530C2 NL1013530C2 (nl) 2001-10-24

Family

ID=18090969

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1013530A NL1013530C2 (nl) 1998-11-09 1999-11-09 Excimeerlaserinrichting en gas voor excimeerlaser.

Country Status (4)

Country Link
US (1) US7006548B1 (nl)
KR (1) KR100731948B1 (nl)
NL (1) NL1013530C2 (nl)
TW (1) TW425741B (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111801855A (zh) * 2018-04-24 2020-10-20 极光先进雷射株式会社 激光气体再生装置和电子器件的制造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4650881B2 (ja) * 2005-04-20 2011-03-16 株式会社小松製作所 エキシマレーザ装置とレーザガス交換方法と部分ガス交換量演算方法
TWI608680B (zh) * 2015-08-24 2017-12-11 曼瑟森三汽油公司 用於高能雷射系統中之可再回收、再平衡及再循環雷射氣體混合物之系統

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829551A (en) * 1973-03-27 1974-08-13 Atomic Energy Commission Atmosphere purification of xenon,radon & radon daughter elements
GB8927209D0 (en) * 1989-12-01 1990-01-31 British Aerospace Apparatus for controlling the composition of a laser gas or gas mixture
US5463650A (en) 1992-07-17 1995-10-31 Kabushiki Kaisha Komatsu Seisakusho Apparatus for controlling output of an excimer laser device
US5450436A (en) 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
US5307364A (en) 1993-05-24 1994-04-26 Spectra Gases, Inc. Addition of oxygen to a gas mix for use in an excimer laser
JP3824092B2 (ja) * 1993-12-24 2006-09-20 株式会社小松製作所 エキシマレ−ザ装置のガス補給方法
JP2816813B2 (ja) * 1994-04-12 1998-10-27 株式会社小松製作所 エキシマレーザ装置
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US6014398A (en) * 1997-10-10 2000-01-11 Cymer, Inc. Narrow band excimer laser with gas additive
US6188710B1 (en) * 1997-10-10 2001-02-13 Cymer, Inc. Narrow band gas discharge laser with gas additive
US6490307B1 (en) * 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111801855A (zh) * 2018-04-24 2020-10-20 极光先进雷射株式会社 激光气体再生装置和电子器件的制造方法
CN111801855B (zh) * 2018-04-24 2023-01-13 极光先进雷射株式会社 激光气体再生装置和电子器件的制造方法

Also Published As

Publication number Publication date
TW425741B (en) 2001-03-11
KR100731948B1 (ko) 2007-06-25
NL1013530C2 (nl) 2001-10-24
KR20000035059A (ko) 2000-06-26
US7006548B1 (en) 2006-02-28

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20010820

PD2B A search report has been drawn up
PD Change of ownership

Owner name: GIGAPHOTON INC.; JP

Free format text: DETAILS ASSIGNMENT: VERANDERING VAN EIGENAAR(S), OVERDRACHT; FORMER OWNER NAME: KOMATSU LTD.

Effective date: 20160729

MM Lapsed because of non-payment of the annual fee

Effective date: 20181201