MY174738A - Sputtering target - Google Patents

Sputtering target

Info

Publication number
MY174738A
MY174738A MYPI2015703289A MYPI2015703289A MY174738A MY 174738 A MY174738 A MY 174738A MY PI2015703289 A MYPI2015703289 A MY PI2015703289A MY PI2015703289 A MYPI2015703289 A MY PI2015703289A MY 174738 A MY174738 A MY 174738A
Authority
MY
Malaysia
Prior art keywords
phase
sputtering target
based alloy
shape
atomic number
Prior art date
Application number
MYPI2015703289A
Other languages
English (en)
Inventor
Atsushi Sato
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY174738A publication Critical patent/MY174738A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0466—Alloys based on noble metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
MYPI2015703289A 2013-04-15 2014-01-29 Sputtering target MY174738A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013084817 2013-04-15

Publications (1)

Publication Number Publication Date
MY174738A true MY174738A (en) 2020-05-12

Family

ID=51731122

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015703289A MY174738A (en) 2013-04-15 2014-01-29 Sputtering target

Country Status (5)

Country Link
JP (1) JP5944580B2 (zh)
MY (1) MY174738A (zh)
SG (1) SG11201506140WA (zh)
TW (1) TWI593810B (zh)
WO (1) WO2014171161A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6285043B2 (ja) * 2014-09-22 2018-03-07 Ｊｘ金属株式会社 磁気記録膜形成用スパッタリングターゲット及びその製造方法
CN106378455A (zh) * 2015-07-31 2017-02-08 汉能新材料科技有限公司 一种钼合金旋转金属管材及其制备方法
TWI761264B (zh) * 2021-07-15 2022-04-11 光洋應用材料科技股份有限公司 鐵鉑銀基靶材及其製法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007080781A1 (ja) * 2006-01-13 2007-07-19 Nippon Mining & Metals Co., Ltd. 非磁性材粒子分散型強磁性材スパッタリングターゲット
US9011653B2 (en) * 2010-11-29 2015-04-21 Mitsui Mining & Smelting Co., Ltd. Sputtering target
CN103459656B (zh) * 2011-03-30 2015-05-06 吉坤日矿日石金属株式会社 磁记录膜用溅射靶
WO2013046882A1 (ja) * 2011-09-26 2013-04-04 Jx日鉱日石金属株式会社 Ｆｅ－Ｐｔ－Ｃ系スパッタリングターゲット
JP2014034730A (ja) * 2012-08-10 2014-02-24 Mitsui Mining & Smelting Co Ltd 焼結体およびスパッタリングターゲット

Also Published As

Publication number Publication date
TWI593810B (zh) 2017-08-01
TW201446975A (zh) 2014-12-16
JP5944580B2 (ja) 2016-07-05
WO2014171161A1 (ja) 2014-10-23
JPWO2014171161A1 (ja) 2017-02-16
SG11201506140WA (en) 2015-09-29

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