MY164438A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY164438A
MY164438A MYPI20041159A MYPI20041159A MY164438A MY 164438 A MY164438 A MY 164438A MY PI20041159 A MYPI20041159 A MY PI20041159A MY PI20041159 A MYPI20041159 A MY PI20041159A MY 164438 A MY164438 A MY 164438A
Authority
MY
Malaysia
Prior art keywords
polishing composition
polishing
phosphorus
ammonia
hydrogen peroxide
Prior art date
Application number
MYPI20041159A
Other languages
English (en)
Inventor
Hirano Junichi
Matsunami Yasushi
Yokomichi Noritaka
Owaki Toshiki
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY164438A publication Critical patent/MY164438A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
MYPI20041159A 2003-03-31 2004-03-30 Polishing composition MY164438A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003097252A JP4202172B2 (ja) 2003-03-31 2003-03-31 研磨用組成物

Publications (1)

Publication Number Publication Date
MY164438A true MY164438A (en) 2017-12-15

Family

ID=32212185

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20041159A MY164438A (en) 2003-03-31 2004-03-30 Polishing composition

Country Status (4)

Country Link
JP (1) JP4202172B2 (zh)
CN (1) CN100389161C (zh)
GB (1) GB2401109B8 (zh)
MY (1) MY164438A (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4202201B2 (ja) * 2003-07-03 2008-12-24 株式会社フジミインコーポレーテッド 研磨用組成物
JP2006077127A (ja) * 2004-09-09 2006-03-23 Fujimi Inc 研磨用組成物及びそれを用いた研磨方法
JP4523935B2 (ja) * 2006-12-27 2010-08-11 昭和電工株式会社 炭化珪素単結晶基板の研磨用水系研磨スラリー及び研磨法。
SG10201605686XA (en) 2008-02-01 2016-08-30 Fujimi Inc Polishing Composition And Polishing Method Using The Same
TWI538971B (zh) * 2010-09-08 2016-06-21 巴斯夫歐洲公司 用於電子、機械及光學裝置之化學機械研磨基材之水性研磨組成物及方法
JP6015931B2 (ja) * 2011-12-15 2016-10-26 Jsr株式会社 化学機械研磨用水系分散体および化学機械研磨方法
CN102796458B (zh) * 2012-07-17 2014-04-23 清华大学 化学机械抛光水性组合物及钛基片化学机械抛光工艺方法
US20150166862A1 (en) * 2012-07-17 2015-06-18 Fujimi Incorporated Composition for polishing alloy material and method for producing alloy material using same
CN103897604B (zh) * 2012-12-28 2015-12-02 上海新安纳电子科技有限公司 一种计算机硬盘的化学机械抛光液
KR102611598B1 (ko) * 2017-04-27 2023-12-08 주식회사 동진쎄미켐 화학-기계적 연마용 슬러리 조성물
WO2018199453A1 (ko) * 2017-04-27 2018-11-01 주식회사 동진쎄미켐 화학-기계적 연마용 슬러리 조성물
KR102422952B1 (ko) * 2017-06-12 2022-07-19 삼성전자주식회사 금속막 연마용 슬러리 조성물 및 이를 이용하는 반도체 장치의 제조 방법
JP7058097B2 (ja) * 2017-09-29 2022-04-21 株式会社フジミインコーポレーテッド 研磨用組成物および磁気ディスク基板の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG54606A1 (en) * 1996-12-05 1998-11-16 Fujimi Inc Polishing composition
US6051870A (en) * 1997-12-17 2000-04-18 Advanced Micro Devices Process for fabricating semiconductor device including improved phosphorous-doped silicon dioxide dielectric film
US6258140B1 (en) * 1999-09-27 2001-07-10 Fujimi America Inc. Polishing composition
JP3877924B2 (ja) * 2000-01-24 2007-02-07 昭和電工株式会社 磁気ディスク基板研磨用組成物
TW471057B (en) * 2000-06-09 2002-01-01 Macronix Int Co Ltd Method for reducing dishing effect during chemical mechanical polishing
JP4231632B2 (ja) * 2001-04-27 2009-03-04 花王株式会社 研磨液組成物
MY134679A (en) * 2002-12-26 2007-12-31 Kao Corp Polishing composition
JP3997152B2 (ja) * 2002-12-26 2007-10-24 花王株式会社 研磨液組成物

Also Published As

Publication number Publication date
GB2401109A (en) 2004-11-03
JP2004300348A (ja) 2004-10-28
GB2401109A8 (en) 2007-11-14
CN1536046A (zh) 2004-10-13
GB2401109B (en) 2007-10-10
GB2401109B8 (en) 2007-11-14
GB0407024D0 (en) 2004-04-28
CN100389161C (zh) 2008-05-21
JP4202172B2 (ja) 2008-12-24

Similar Documents

Publication Publication Date Title
MY164438A (en) Polishing composition
WO2003095398A3 (en) Polydiazeniumdiolated cyclic polyamines with polyphasic nitric oxide release and related compounds, compositions comprising same and methods of using same
GB0305704D0 (en) Radiofluorination methods
WO2004062613A3 (en) Hiv integrase inhibitors
EP1940528A4 (en) METHOD USING RARE EARTH TO REMOVE OXYANIONS FROM AQUEOUS FLOWS
HK1088890A1 (en) Biguanide and dihydrotriazine derivatives
EA200801607A1 (ru) Производные бензимидазолонкарбоновой кислоты
WO2007003956A3 (en) Eutectic mixtures based upon multivalent metal ions
TW200604149A (en) Norbornane based cycloaliphatic compounds containing nitrile groups
TW200635917A (en) Novel compounds
HK1088013A1 (en) Pyrimidine compounds having phosphonate groups as antiviral nucleotide analogs
HK1085675A1 (en) Anticancer compounds
TW200635916A (en) Compounds
WO2005058921A3 (de) Aldiminoalkylsilane
MXPA04009283A (es) Nuevos derivados de alcoxipiridina.
CO5700715A2 (es) Proceso para la preparacion de (4-hidroxi-6-oxo-tetrahidropiran-2-il)acetonitrilo y derivados del mismo
WO2008088051A1 (ja) ホスホリルコリン基含有化合物、ホスホリルコリン基含有化合物の製造方法、表面改質剤、及び表面改質剤を用いた表面改質方法
MXPA03009602A (es) Analogos de nociceptina.
TW200606588A (en) Resist composition and process for forming resist pattern
TW200719889A (en) Amino acid derivatives
MY143042A (en) Polishing composition
ATE405162T1 (de) Eingebettetes biozid
MXPA06003345A (es) Derivados de aminopiridina como inhibidores de la no-sintasa inducible.
MX2007005042A (es) Un metodo para regenerar un catalizador.
WO2007071578A3 (de) Verfahren zur herstellung von 5 -norbornen-2-carbonsäure aus 5-norbornen-2-carbonitril unter verwendung einer arylacetonitrilase