MY164438A - Polishing composition - Google Patents
Polishing compositionInfo
- Publication number
- MY164438A MY164438A MYPI20041159A MYPI20041159A MY164438A MY 164438 A MY164438 A MY 164438A MY PI20041159 A MYPI20041159 A MY PI20041159A MY PI20041159 A MYPI20041159 A MY PI20041159A MY 164438 A MY164438 A MY 164438A
- Authority
- MY
- Malaysia
- Prior art keywords
- polishing composition
- polishing
- phosphorus
- ammonia
- hydrogen peroxide
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Abstract
THE PRESENT INVENTION RELATES TO A POLISHING COMPOSITION MORE SUITABLE FOR USE IN POLISHING A SUBSTRATE FOR A MAGNETIC DISK. THE POLISHING COMPOSITION INCLUDES SILICON DIOXIDE, A PHOSPHORUS-CONTAINING COMPOUND CONTAINING AT LEAST ONE COMPOUND SELECTED FROM A SPECIFIC GROUP, AMMONIUM SALT CONTAINING AT LEAST ONE SALT PRODUCED BY A NEUTRALIZATION REACTION OF EACH OF SPECIFIC ACID WITH AMMONIA, HYDROGEN PEROXIDE, AND WATER.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003097252A JP4202172B2 (en) | 2003-03-31 | 2003-03-31 | Polishing composition |
Publications (1)
Publication Number | Publication Date |
---|---|
MY164438A true MY164438A (en) | 2017-12-15 |
Family
ID=32212185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20041159A MY164438A (en) | 2003-03-31 | 2004-03-30 | Polishing composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4202172B2 (en) |
CN (1) | CN100389161C (en) |
GB (1) | GB2401109B8 (en) |
MY (1) | MY164438A (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4202201B2 (en) * | 2003-07-03 | 2008-12-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
JP2006077127A (en) * | 2004-09-09 | 2006-03-23 | Fujimi Inc | Polishing composition and polishing method using the composition |
JP4523935B2 (en) * | 2006-12-27 | 2010-08-11 | 昭和電工株式会社 | An aqueous polishing slurry for polishing a silicon carbide single crystal substrate and a polishing method. |
WO2009096495A1 (en) | 2008-02-01 | 2009-08-06 | Fujimi Incorporated | Polishing composition and polishing method using the same |
EP2614121B1 (en) * | 2010-09-08 | 2019-03-06 | Basf Se | Aqueous polishing composition and process for chemically mechanically polishing substrates for electrical, mechanical and optical devices |
JP6015931B2 (en) * | 2011-12-15 | 2016-10-26 | Jsr株式会社 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
TWI629347B (en) * | 2012-07-17 | 2018-07-11 | 福吉米股份有限公司 | Method for polishing alloy material by using polishing composition for alloy material |
CN102796458B (en) * | 2012-07-17 | 2014-04-23 | 清华大学 | Chemical mechanical polishing aqueous composite and chemical mechanical polishing process of titanium substrate |
CN103897604B (en) * | 2012-12-28 | 2015-12-02 | 上海新安纳电子科技有限公司 | A kind of chemical mechanical polishing liquid of hard disc of computer |
KR102611598B1 (en) * | 2017-04-27 | 2023-12-08 | 주식회사 동진쎄미켐 | Aqueous slurry composition for chemical mechanical polishing |
WO2018199453A1 (en) * | 2017-04-27 | 2018-11-01 | 주식회사 동진쎄미켐 | Slurry composition for chemical mechanical polishing |
KR102422952B1 (en) * | 2017-06-12 | 2022-07-19 | 삼성전자주식회사 | Slurry composition for polishing a metal layer and method for fabricating semiconductor device using the same |
JP7058097B2 (en) * | 2017-09-29 | 2022-04-21 | 株式会社フジミインコーポレーテッド | Method for manufacturing polishing composition and magnetic disk substrate |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG54606A1 (en) * | 1996-12-05 | 1998-11-16 | Fujimi Inc | Polishing composition |
US6051870A (en) * | 1997-12-17 | 2000-04-18 | Advanced Micro Devices | Process for fabricating semiconductor device including improved phosphorous-doped silicon dioxide dielectric film |
US6258140B1 (en) * | 1999-09-27 | 2001-07-10 | Fujimi America Inc. | Polishing composition |
JP3877924B2 (en) * | 2000-01-24 | 2007-02-07 | 昭和電工株式会社 | Magnetic disk substrate polishing composition |
TW471057B (en) * | 2000-06-09 | 2002-01-01 | Macronix Int Co Ltd | Method for reducing dishing effect during chemical mechanical polishing |
JP4231632B2 (en) * | 2001-04-27 | 2009-03-04 | 花王株式会社 | Polishing liquid composition |
MY134679A (en) * | 2002-12-26 | 2007-12-31 | Kao Corp | Polishing composition |
JP3997152B2 (en) * | 2002-12-26 | 2007-10-24 | 花王株式会社 | Polishing liquid composition |
-
2003
- 2003-03-31 JP JP2003097252A patent/JP4202172B2/en not_active Expired - Lifetime
-
2004
- 2004-03-29 GB GB0407024A patent/GB2401109B8/en not_active Expired - Fee Related
- 2004-03-30 CN CNB2004100342151A patent/CN100389161C/en not_active Expired - Fee Related
- 2004-03-30 MY MYPI20041159A patent/MY164438A/en unknown
Also Published As
Publication number | Publication date |
---|---|
GB2401109B (en) | 2007-10-10 |
GB2401109A (en) | 2004-11-03 |
GB0407024D0 (en) | 2004-04-28 |
JP4202172B2 (en) | 2008-12-24 |
CN1536046A (en) | 2004-10-13 |
GB2401109A8 (en) | 2007-11-14 |
JP2004300348A (en) | 2004-10-28 |
GB2401109B8 (en) | 2007-11-14 |
CN100389161C (en) | 2008-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MY164438A (en) | Polishing composition | |
AU9475001A (en) | Modulation of immunostimulatory activity of immunostimulatory oligonucleotide analogs by positional chemical changes | |
WO2003095398A3 (en) | Polydiazeniumdiolated cyclic polyamines with polyphasic nitric oxide release and related compounds, compositions comprising same and methods of using same | |
HK1068626A1 (en) | Chemical compounds | |
EP1940528A4 (en) | Process using rare earths to remove oxyanions from aqueous streams | |
HK1088890A1 (en) | Biguanide and dihydrotriazine derivatives | |
WO2007003956A3 (en) | Eutectic mixtures based upon multivalent metal ions | |
TW200604149A (en) | Norbornane based cycloaliphatic compounds containing nitrile groups | |
HK1088013A1 (en) | Pyrimidine compounds having phosphonate groups as antiviral nucleotide analogs | |
TW200635917A (en) | Novel compounds | |
HK1085675A1 (en) | Anticancer compounds | |
WO2005058921A3 (en) | Aldiminoalkylsilanes | |
CO5700715A2 (en) | PROCESS FOR THE PREPARATION OF (4-HIDROXI-6-OXO-TETRAHIDROPIRAN-2-IL) ACETONITRILE AND DERIVATIVES OF THE SAME | |
TW200730596A (en) | Composition for polishing semiconductor layers | |
UA93529C2 (en) | Salts of 9-oxoacridine-10-acetic acid with 1-alkylamno-1-desoxy-polyols | |
TW200719889A (en) | Amino acid derivatives | |
HK1080077A1 (en) | Non-peptidic brs-3 agonists | |
MY143042A (en) | Polishing composition | |
BRPI0506547A (en) | phosphonium compounds, uses of a phosphonium compound, processes for reducing the number of microorganisms and the amount of tartar | |
MXPA06003345A (en) | Aminopyridine-derivatives as inductible no-synthase inhibitors. | |
MX2007005042A (en) | A method of regenerating a catalyst. | |
WO2007071578A3 (en) | Method for producing 5-norbornen-2-carboxylic acid from 5-norbornen-2-carbonitrile using an arylacetonitrilase | |
JP2004532111A5 (en) | ||
MXPA04005210A (en) | Process for the prereparation of compositions having an increased amount of pharmaceutically active salts of rotamers. | |
LT2008055A (en) | Plastics etching composition |