MY143652A - Polishing composition for glass substrate - Google Patents

Polishing composition for glass substrate

Info

Publication number
MY143652A
MY143652A MYPI20055822A MYPI20055822A MY143652A MY 143652 A MY143652 A MY 143652A MY PI20055822 A MYPI20055822 A MY PI20055822A MY PI20055822 A MYPI20055822 A MY PI20055822A MY 143652 A MY143652 A MY 143652A
Authority
MY
Malaysia
Prior art keywords
substrate
glass
polishing composition
glass substrate
polishing
Prior art date
Application number
MYPI20055822A
Other languages
English (en)
Inventor
Kazuhiko Nishimoto
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of MY143652A publication Critical patent/MY143652A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
MYPI20055822A 2004-12-13 2005-12-12 Polishing composition for glass substrate MY143652A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004359842A JP4667848B2 (ja) 2004-12-13 2004-12-13 ガラス基板用研磨液組成物

Publications (1)

Publication Number Publication Date
MY143652A true MY143652A (en) 2011-06-30

Family

ID=35735789

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20055822A MY143652A (en) 2004-12-13 2005-12-12 Polishing composition for glass substrate

Country Status (4)

Country Link
JP (1) JP4667848B2 (ja)
CN (2) CN1789366A (ja)
GB (1) GB2421955B (ja)
MY (1) MY143652A (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102863943B (zh) 2005-08-30 2015-03-25 花王株式会社 硬盘用基板用研磨液组合物、基板的研磨方法和制造方法
JP5283247B2 (ja) * 2005-12-22 2013-09-04 花王株式会社 ガラス基板用研磨液組成物
GB2433516B (en) * 2005-12-22 2010-11-03 Kao Corp Polishing composition for glass substrate
JP5008350B2 (ja) * 2006-07-05 2012-08-22 花王株式会社 ガラス基板用の研磨液組成物
JP5606663B2 (ja) * 2006-12-26 2014-10-15 花王株式会社 研磨用シリカ粒子分散液
JP5437571B2 (ja) * 2006-12-26 2014-03-12 花王株式会社 研磨液キット
KR101564922B1 (ko) * 2008-05-09 2015-11-03 삼성디스플레이 주식회사 소다라임유리 기판의 처리 방법을 이용한 표시기판의 제조 방법
WO2009154164A1 (ja) 2008-06-18 2009-12-23 株式会社 フジミインコーポレーテッド 研磨用組成物及びそれを用いた研磨方法
JP5251861B2 (ja) * 2009-12-28 2013-07-31 信越化学工業株式会社 合成石英ガラス基板の製造方法
WO2011132665A1 (ja) 2010-04-20 2011-10-27 花王株式会社 ハードディスク用アルミノシリケートガラス基板の製造方法
JP2013080530A (ja) * 2011-09-30 2013-05-02 Hoya Corp 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
CN103958124A (zh) * 2011-12-02 2014-07-30 旭硝子株式会社 玻璃板的研磨装置
US10068602B2 (en) * 2013-06-29 2018-09-04 Hoya Corporation Method for manufacturing glass substrate, method for manufacturing magnetic disk, and polishing liquid composition for glass substrate
JP6393231B2 (ja) 2015-05-08 2018-09-19 信越化学工業株式会社 合成石英ガラス基板用研磨剤及び合成石英ガラス基板の研磨方法
JP6560155B2 (ja) 2016-04-20 2019-08-14 信越化学工業株式会社 合成石英ガラス基板用研磨剤及び合成石英ガラス基板の研磨方法
JP6694653B2 (ja) 2017-04-10 2020-05-20 信越化学工業株式会社 合成石英ガラス基板用研磨剤及びその製造方法並びに合成石英ガラス基板の研磨方法
JP6985116B2 (ja) 2017-11-17 2021-12-22 信越化学工業株式会社 合成石英ガラス基板用の研磨剤及び合成石英ガラス基板の研磨方法
CN108148507B (zh) * 2017-12-18 2020-12-04 清华大学 一种用于熔石英的抛光组合物
JP2021183655A (ja) 2020-05-21 2021-12-02 信越化学工業株式会社 合成石英ガラス基板用の研磨剤及びその研磨剤の製造方法、及び合成石英ガラス基板の研磨方法
CN113618497A (zh) * 2021-07-09 2021-11-09 维达力实业（赤壁）有限公司 用于抛光微晶陶瓷的抛光液以及微晶陶瓷抛光方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0322721B1 (en) * 1987-12-29 1993-10-06 E.I. Du Pont De Nemours And Company Fine polishing composition for wafers
SG78405A1 (en) * 1998-11-17 2001-02-20 Fujimi Inc Polishing composition and rinsing composition
US6821897B2 (en) * 2001-12-05 2004-11-23 Cabot Microelectronics Corporation Method for copper CMP using polymeric complexing agents
JP4095833B2 (ja) * 2002-05-30 2008-06-04 株式会社フジミインコーポレーテッド 研磨用組成物
US20060096179A1 (en) * 2004-11-05 2006-05-11 Cabot Microelectronics Corporation CMP composition containing surface-modified abrasive particles

Also Published As

Publication number Publication date
CN1789366A (zh) 2006-06-21
CN101892032A (zh) 2010-11-24
JP4667848B2 (ja) 2011-04-13
JP2006167817A (ja) 2006-06-29
GB2421955A (en) 2006-07-12
GB0525057D0 (en) 2006-01-18
GB2421955B (en) 2009-10-14

Similar Documents

Publication Publication Date Title
MY143652A (en) Polishing composition for glass substrate
MY144460A (en) Polishing composition for glass substrate
TW200703719A (en) Nitride-based compound semiconductor, method of cleaning a compound semiconductor, method of producing the same, and substrate
MY126249A (en) Polishing composition.
GB2439799B (en) Polishing composition for glass substrate
WO2010120784A8 (en) Chemical mechanical polishing of silicon carbide comprising surfaces
TWI262905B (en) Quartz glass parts, ceramic parts and process of producing those
MY133305A (en) Polishing composition
MY166770A (en) Manufacturing method of magnetic disk substrate
MY156414A (en) Cleaning agent for electronic material
AU2002345752A1 (en) High amount of beneficial components in the top of a substrates
TW200617150A (en) Polishing composition
TW200511422A (en) Treatment or processing of substrate surfaces
MY158519A (en) Method of manufacturing a glass substrate for a magnetic disk
HK1143194A1 (en) Method to electrodeposit metals using ionic liquids in the presence of an additive
ATE463053T1 (de) Herstellungsverfahren für eine schutzschicht für hochtemperaturbelastete, chromoxidbildende substrate
CN101912855B (zh) 蓝宝石衬底材料抛光后表面洁净方法
TW200745316A (en) Copper-based metal polishing compositions and polishing process
TW200609336A (en) Polishing composition and substrate polishing method
TW200517772A (en) Method of making photomask blank substrates
SG151235A1 (en) Glass substrate for magnetic disc and manufacturing method thereof
CN105368398A (zh) Led蓝宝石衬底加工用新型金刚石磨料及其制备方法
TW200717713A (en) Advanced forming method and structure of a semiconductor device
IL178084A (en) A process to create a substrate coated with a semiconductor
TW200613535A (en) A texturing composition