MY118633A - Abrasive composition for polishing magnetic recording disk substrates - Google Patents
Abrasive composition for polishing magnetic recording disk substratesInfo
- Publication number
- MY118633A MY118633A MYPI20010276A MY118633A MY 118633 A MY118633 A MY 118633A MY PI20010276 A MYPI20010276 A MY PI20010276A MY 118633 A MY118633 A MY 118633A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic recording
- recording disk
- polishing
- abrasive composition
- disk substrates
- Prior art date
Links
Abstract
THE PRESENT INVENTION PROVIDES AN ABRASIVE COMPOSITION FOR POLISHING MAGNETIC RECORDING DISK SUBSTRATES THAT RESULTS IN A LOW SURFACE ROUGHNESS OF THE MAGNETIC RECORDING DISK, ALLOWS THE ATTAINING OF HIGH-DENSITY RECORDING WITHOUT THE OCCURRENCE OR PROTRUSIONS OF POLISHING SCRATCHES, AND ENABLES POLISHING TO BE PERFORMED AT AN ECONOMICAL SPEED. THE PRESENT INVENTION DISCLOSES AN ABRASIVE COMPOSITION FOR POLISHING MAGNETIC RECORDING DISK SUBSTRATES COMPRISING WATER, SILICON DIOXIDE, ANTIGELLING AGENT, ALUMINUM NITRATE AND HYDROGEN PEROXIDE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000013858A JP3877924B2 (en) | 2000-01-24 | 2000-01-24 | Magnetic disk substrate polishing composition |
Publications (1)
Publication Number | Publication Date |
---|---|
MY118633A true MY118633A (en) | 2004-12-31 |
Family
ID=18541393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20010276 MY118633A (en) | 2000-01-24 | 2001-01-22 | Abrasive composition for polishing magnetic recording disk substrates |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3877924B2 (en) |
CN (1) | CN1243070C (en) |
MY (1) | MY118633A (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4231632B2 (en) * | 2001-04-27 | 2009-03-04 | 花王株式会社 | Polishing liquid composition |
MY133305A (en) * | 2001-08-21 | 2007-11-30 | Kao Corp | Polishing composition |
JP4462599B2 (en) * | 2001-08-21 | 2010-05-12 | 花王株式会社 | Polishing liquid composition |
JP3875156B2 (en) * | 2002-08-07 | 2007-01-31 | 花王株式会社 | Roll-off reducing agent |
JP4202172B2 (en) * | 2003-03-31 | 2008-12-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
JP4891304B2 (en) * | 2008-10-23 | 2012-03-07 | 花王株式会社 | Manufacturing method of memory hard disk substrate |
JP6511039B2 (en) * | 2014-03-28 | 2019-05-08 | 山口精研工業株式会社 | Abrasive composition and method of polishing magnetic disk substrate |
MY186419A (en) * | 2014-03-28 | 2021-07-22 | Yamaguchi Seiken Kogyo Co Ltd | Polishing composition and method for polishing magnetic disk substrate |
JP6480139B2 (en) * | 2014-09-30 | 2019-03-06 | 株式会社フジミインコーポレーテッド | Polishing composition |
WO2017051770A1 (en) * | 2015-09-25 | 2017-03-30 | 山口精研工業株式会社 | Abrasive material composition and method for polishing magnetic disk substrate |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3825827B2 (en) * | 1996-01-30 | 2006-09-27 | 昭和電工株式会社 | Polishing composition, magnetic disk substrate polishing method, and manufacturing method |
JP3653133B2 (en) * | 1996-01-30 | 2005-05-25 | 昭和電工株式会社 | Polishing composition, magnetic disk substrate polishing method, and manufacturing method |
JPH10121034A (en) * | 1996-03-18 | 1998-05-12 | Showa Denko Kk | Composition for polishing magnetic disk substrate |
JPH10121035A (en) * | 1996-08-30 | 1998-05-12 | Showa Denko Kk | Composition for polishing magnetic disk substrate |
JP3457144B2 (en) * | 1997-05-21 | 2003-10-14 | 株式会社フジミインコーポレーテッド | Polishing composition |
US6149696A (en) * | 1997-11-06 | 2000-11-21 | Komag, Inc. | Colloidal silica slurry for NiP plated disk polishing |
-
2000
- 2000-01-24 JP JP2000013858A patent/JP3877924B2/en not_active Expired - Lifetime
-
2001
- 2001-01-22 MY MYPI20010276 patent/MY118633A/en unknown
- 2001-01-23 CN CN 01104631 patent/CN1243070C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3877924B2 (en) | 2007-02-07 |
CN1243070C (en) | 2006-02-22 |
JP2001207161A (en) | 2001-07-31 |
CN1309160A (en) | 2001-08-22 |
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