MY111460A - Target for magnetron cathode sputtering system consisting of a cobalt-base alloy - Google Patents

Target for magnetron cathode sputtering system consisting of a cobalt-base alloy

Info

Publication number
MY111460A
MY111460A MYPI94003420A MYPI19943420A MY111460A MY 111460 A MY111460 A MY 111460A MY PI94003420 A MYPI94003420 A MY PI94003420A MY PI19943420 A MYPI19943420 A MY PI19943420A MY 111460 A MY111460 A MY 111460A
Authority
MY
Malaysia
Prior art keywords
target
cobalt
base alloy
cathode sputtering
magnetron cathode
Prior art date
Application number
MYPI94003420A
Other languages
English (en)
Inventor
Martin Weigert Dr
Teng Kwei
Martin Schlott Dr
Bruce Gehman Dr
Original Assignee
Heraeus Gmbh W C
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Gmbh W C filed Critical Heraeus Gmbh W C
Publication of MY111460A publication Critical patent/MY111460A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
MYPI94003420A 1993-12-20 1994-12-20 Target for magnetron cathode sputtering system consisting of a cobalt-base alloy MY111460A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4343440 1993-12-20
DE4410114A DE4410114A1 (de) 1993-12-20 1994-03-24 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung

Publications (1)

Publication Number Publication Date
MY111460A true MY111460A (en) 2000-05-31

Family

ID=6505507

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI94003420A MY111460A (en) 1993-12-20 1994-12-20 Target for magnetron cathode sputtering system consisting of a cobalt-base alloy

Country Status (4)

Country Link
KR (1) KR950018628A (cs)
DE (2) DE4410114A1 (cs)
MY (1) MY111460A (cs)
TW (1) TW275131B (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10017414A1 (de) * 2000-04-07 2001-10-11 Unaxis Materials Deutschland G Sputtertarget auf der Basis eines Metalls oder einer Metalllegierung und Verfahren zu dessen Herstellung
KR102659491B1 (ko) * 2021-08-12 2024-04-23 한국과학기술연구원 배선 재료용 저저항 필름의 제조 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5282946A (en) * 1991-08-30 1994-02-01 Mitsubishi Materials Corporation Platinum-cobalt alloy sputtering target and method for manufacturing same

Also Published As

Publication number Publication date
DE59405713D1 (de) 1998-05-20
KR950018628A (ko) 1995-07-22
DE4410114A1 (de) 1995-06-22
TW275131B (cs) 1996-05-01

Similar Documents

Publication Publication Date Title
AU8025091A (en) Process for producing cathodes for cathodic sputtering based on aluminium-silicon alloys
AU3055600A (en) Hypereutectic aluminium-silicon alloy product for semisolid forming
MY111460A (en) Target for magnetron cathode sputtering system consisting of a cobalt-base alloy
MX9703182A (es) Proceso y catalizador para la hidrogenacion directa de esteres carboxilicos.
GB1383995A (en) Heat treatment of nickel-chromium alloys
JPS5693849A (en) Bearing use aluminum alloy and production thereof
Murray Al--Mg(Aluminum--Magnesium)
AU3271184A (en) Continuously cast al base - si, mg alloy
Schlott et al. Target for magnetron sputtering of powder made from a cobalt based alloy
Williams Microstructural characteristics of Al-Li alloys
Jonas et al. A new approach to dynamic recrystallization
MY127691A (en) Film catalysts based on raney alloys and their preparation
Schlott et al. Target for magnetron cathode sputtering system consisting of a cobalt-base alloy
JPS5696712A (en) Synthesis of diamond
AU3271284A (en) Continuously cast al base - mg, cr alloys
Prima et al. Phase transformations at solidification of Ni-Zr-Mo alloys in Zr-ZrNi-Mo range[[Previously Titled: Phase transformaton on solidification of alloys in Zr-ZrNi-Mo region of the Ni-Zr-Mo system.]]
JPS5232812A (en) Method of producing a1 alloy and its sheet of excellent foorming prope rty
AU8048894A (en) Low temperature powder metallurgy for titanium and its alloys, methods, raw materials and apparatus for their production
Kajihara et al. Formation of fine grains by DIR in Ni phase of Cu/Ni/Cu diffusion couples
Krajewski Research of phase transformation in high-aluminium zinc foundry alloys modified by Ti addition
Okamoto In-Lu (indium-lutetium)
WOLF Anisothermal oxidation of titanium and its alloy[Final Scientific Report, 1 Oct. 1975- 31 Dec. 1977]
Kaibyshev et al. Crystallographic gliding and dynamic recrystallization related to local grain boundary migration. I. Experimental results
Xu et al. The Thermomechanical Behaviour of Cu--Al--Ni Single Crystals With Shape Memory
AARANSON et al. Observations of superledges formed on sideplates during precipitation of alpha from beta Ti-6 pct Al-4 pct V