DE4410114A1 - Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung - Google Patents

Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung

Info

Publication number
DE4410114A1
DE4410114A1 DE4410114A DE4410114A DE4410114A1 DE 4410114 A1 DE4410114 A1 DE 4410114A1 DE 4410114 A DE4410114 A DE 4410114A DE 4410114 A DE4410114 A DE 4410114A DE 4410114 A1 DE4410114 A1 DE 4410114A1
Authority
DE
Germany
Prior art keywords
target
elements
cobalt
intermetallic phases
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE4410114A
Other languages
German (de)
English (en)
Inventor
Martin Dr Weigert
Kwei Teng
Bruce Dr Gehmann
Martin Dr Schlott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WC Heraus GmbH and Co KG
Original Assignee
Leybold Materials GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Materials GmbH filed Critical Leybold Materials GmbH
Priority to DE4410114A priority Critical patent/DE4410114A1/de
Priority to DE59405713T priority patent/DE59405713D1/de
Priority to EP94112342A priority patent/EP0659901B1/de
Priority to TW083109819A priority patent/TW275131B/zh
Priority to GB9422161A priority patent/GB2285269B/en
Priority to SG1995000382A priority patent/SG42750A1/en
Priority to US08/356,109 priority patent/US5728279A/en
Priority to KR1019940035181A priority patent/KR950018628A/ko
Priority to MYPI94003420A priority patent/MY111460A/en
Priority to JP6334937A priority patent/JPH0827570A/ja
Publication of DE4410114A1 publication Critical patent/DE4410114A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
DE4410114A 1993-12-20 1994-03-24 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung Withdrawn DE4410114A1 (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
DE4410114A DE4410114A1 (de) 1993-12-20 1994-03-24 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung
DE59405713T DE59405713D1 (de) 1993-12-20 1994-08-08 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung
EP94112342A EP0659901B1 (de) 1993-12-20 1994-08-08 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung
TW083109819A TW275131B (cs) 1993-12-20 1994-10-22
GB9422161A GB2285269B (en) 1993-12-20 1994-11-03 Target for magnetron cathode sputtering system consisting of a cobalt-base alloy
SG1995000382A SG42750A1 (en) 1993-12-20 1994-11-03 Target for magnetron cathode sputtering system consisting of a cobalt-base alloy
US08/356,109 US5728279A (en) 1993-12-20 1994-12-15 Cobalt base alloy target for a magnetron cathode sputtering system
KR1019940035181A KR950018628A (ko) 1993-12-20 1994-12-19 코발트를 기초로한 합금으로 된 마그네트론 캐소드 스퍼터링(magnetron cathode sputtering) 장치용 타켓
MYPI94003420A MY111460A (en) 1993-12-20 1994-12-20 Target for magnetron cathode sputtering system consisting of a cobalt-base alloy
JP6334937A JPH0827570A (ja) 1993-12-20 1994-12-20 マグネトロン−陰極スパッタ装置用ターゲット及びその製法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4343440 1993-12-20
DE4410114A DE4410114A1 (de) 1993-12-20 1994-03-24 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung

Publications (1)

Publication Number Publication Date
DE4410114A1 true DE4410114A1 (de) 1995-06-22

Family

ID=6505507

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4410114A Withdrawn DE4410114A1 (de) 1993-12-20 1994-03-24 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung
DE59405713T Expired - Lifetime DE59405713D1 (de) 1993-12-20 1994-08-08 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE59405713T Expired - Lifetime DE59405713D1 (de) 1993-12-20 1994-08-08 Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung

Country Status (4)

Country Link
KR (1) KR950018628A (cs)
DE (2) DE4410114A1 (cs)
MY (1) MY111460A (cs)
TW (1) TW275131B (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001077403A1 (de) * 2000-04-07 2001-10-18 Unaxis Materials Ag Sputtertarget auf der basis eines metalles oder einer metalllegierung und verfahren zu dessen herstellung

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102659491B1 (ko) * 2021-08-12 2024-04-23 한국과학기술연구원 배선 재료용 저저항 필름의 제조 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0535314A1 (en) * 1991-08-30 1993-04-07 Mitsubishi Materials Corporation Platinum-cobalt alloy sputtering target and method for manufacturing same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0535314A1 (en) * 1991-08-30 1993-04-07 Mitsubishi Materials Corporation Platinum-cobalt alloy sputtering target and method for manufacturing same

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
HANSEN, Max: Constitution of Binary Alloys, McGraw-Hill Book Company, Inc., New York, Toronto, London, 1958, S.510 *
N.N.: Cobalt Monograph, Centre D`Information Du Cobalt, Brussels, 1960, S.198,199,214-231 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001077403A1 (de) * 2000-04-07 2001-10-18 Unaxis Materials Ag Sputtertarget auf der basis eines metalles oder einer metalllegierung und verfahren zu dessen herstellung

Also Published As

Publication number Publication date
DE59405713D1 (de) 1998-05-20
TW275131B (cs) 1996-05-01
MY111460A (en) 2000-05-31
KR950018628A (ko) 1995-07-22

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Legal Events

Date Code Title Description
OM8 Search report available as to paragraph 43 lit. 1 sentence 1 patent law
8141 Disposal/no request for examination