MXPA04009493A - Valvula de compuerta de barril giratorio. - Google Patents

Valvula de compuerta de barril giratorio.

Info

Publication number
MXPA04009493A
MXPA04009493A MXPA04009493A MXPA04009493A MXPA04009493A MX PA04009493 A MXPA04009493 A MX PA04009493A MX PA04009493 A MXPA04009493 A MX PA04009493A MX PA04009493 A MXPA04009493 A MX PA04009493A MX PA04009493 A MXPA04009493 A MX PA04009493A
Authority
MX
Mexico
Prior art keywords
gate valve
rotary barrel
barrel gate
actuator
translating
Prior art date
Application number
MXPA04009493A
Other languages
English (en)
Inventor
Asbas Michael
Original Assignee
D2 In Line Solutions Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by D2 In Line Solutions Llc filed Critical D2 In Line Solutions Llc
Publication of MXPA04009493A publication Critical patent/MXPA04009493A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86493—Multi-way valve unit
    • Y10T137/86574—Supply and exhaust
    • Y10T137/86622—Motor-operated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86493—Multi-way valve unit
    • Y10T137/86718—Dividing into parallel flow paths with recombining
    • Y10T137/86743—Rotary
    • Y10T137/86751—Plug

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Sliding Valves (AREA)
  • Details Of Valves (AREA)

Abstract

Se describe una valvula (100) de compuerta de barril giratorio que incluye un cuerpo (102) y por lo menos un pasaje (104) a traves del cuerpo (102) que define una entrada (106) y una salida (108). Hay un primer accionador (110) para hacer girar el cuerpo (102), un segundo accionador (112) para trasladar el cuerpo (102) y una porcion de sellado (116) sobre el cuerpo (102) que sella el cuerpo (102) con respecto a una abertura (140) a una camara (12) adyacente al cuerpo (102).
MXPA04009493A 2002-03-29 2003-03-27 Valvula de compuerta de barril giratorio. MXPA04009493A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US36881802P 2002-03-29 2002-03-29
PCT/US2003/009311 WO2003085301A1 (en) 2002-03-29 2003-03-27 Rotary barrel gate valve

Publications (1)

Publication Number Publication Date
MXPA04009493A true MXPA04009493A (es) 2005-12-12

Family

ID=28791905

Family Applications (2)

Application Number Title Priority Date Filing Date
MXPA04009494A MXPA04009494A (es) 2002-03-29 2003-03-27 Sistema y metodo de procesamiento continuo en linea alimentado por gravedad.
MXPA04009493A MXPA04009493A (es) 2002-03-29 2003-03-27 Valvula de compuerta de barril giratorio.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
MXPA04009494A MXPA04009494A (es) 2002-03-29 2003-03-27 Sistema y metodo de procesamiento continuo en linea alimentado por gravedad.

Country Status (6)

Country Link
US (5) US20030213432A1 (es)
EP (2) EP1490527A1 (es)
AU (2) AU2003220541A1 (es)
CA (2) CA2480820A1 (es)
MX (2) MXPA04009494A (es)
WO (2) WO2003085156A1 (es)

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US20060191145A1 (en) 2001-08-24 2006-08-31 Waddington North America, Inc. Metallized cutlery and tableware and method therefor
WO2003085156A1 (en) * 2002-03-29 2003-10-16 D2 In-Line Solutions, Llc Gravity-fed in-line continuous processing system and method
JP2010511271A (ja) * 2006-11-30 2010-04-08 ネオバルブ テクノロジーズ，インコーポレイテッド 屋外型高出力発光ダイオード照明設備
US7806641B2 (en) * 2007-08-30 2010-10-05 Ascentool, Inc. Substrate processing system having improved substrate transport system
US8408858B2 (en) * 2007-08-30 2013-04-02 Ascentool International Limited Substrate processing system having improved substrate transport system
WO2009123266A1 (ja) * 2008-04-03 2009-10-08 コニカミノルタホールディングス株式会社 撮像装置、および撮像装置の製造方法
US9297064B2 (en) * 2009-01-16 2016-03-29 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
US9051650B2 (en) 2009-01-16 2015-06-09 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
US10550474B1 (en) * 2010-02-26 2020-02-04 Quantum Innovations, Inc. Vapor deposition system
US20120064225A1 (en) * 2010-09-13 2012-03-15 Applied Materials, Inc. Spray deposition module for an in-line processing system
JP5731663B2 (ja) * 2011-10-28 2015-06-10 キヤノンアネルバ株式会社 真空処理装置
CN103273441B (zh) * 2013-05-23 2016-05-25 中原内配集团股份有限公司 一种热喷涂工装
IT201700090690A1 (it) * 2016-08-05 2019-02-04 Bonda Olga Foglio Procedimento e macchina per la produzione di forme di dosaggio
CN112899636B (zh) * 2021-01-28 2022-04-15 中国核动力研究设计院 反应堆用大长径比管材真空镀膜机的工件架及其镀膜机

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Also Published As

Publication number Publication date
US20030213929A1 (en) 2003-11-20
EP1490615A1 (en) 2004-12-29
US6983925B2 (en) 2006-01-10
CA2480823A1 (en) 2003-10-16
WO2003085301A1 (en) 2003-10-16
US20060283391A1 (en) 2006-12-21
EP1490527A1 (en) 2004-12-29
MXPA04009494A (es) 2005-12-12
AU2003218411A1 (en) 2003-10-20
CA2480820A1 (en) 2003-10-16
AU2003220541A1 (en) 2003-10-20
US20050058776A1 (en) 2005-03-17
WO2003085156A1 (en) 2003-10-16
US20030213432A1 (en) 2003-11-20
US20060251814A1 (en) 2006-11-09

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