MXPA03004335A - Composiciones curables por radiacion. - Google Patents

Composiciones curables por radiacion.

Info

Publication number
MXPA03004335A
MXPA03004335A MXPA03004335A MXPA03004335A MXPA03004335A MX PA03004335 A MXPA03004335 A MX PA03004335A MX PA03004335 A MXPA03004335 A MX PA03004335A MX PA03004335 A MXPA03004335 A MX PA03004335A MX PA03004335 A MXPA03004335 A MX PA03004335A
Authority
MX
Mexico
Prior art keywords
meth
acrylate
radiation curable
curable compositions
dissolution
Prior art date
Application number
MXPA03004335A
Other languages
English (en)
Inventor
Norazmi Alias
Original Assignee
Ucb Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ucb Sa filed Critical Ucb Sa
Publication of MXPA03004335A publication Critical patent/MXPA03004335A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Se describe una composicion foto-resistente que es un producto de esterificacion parcial de un copolimero de estireno y anhidrido maleico con (met)acrilato y cadenas laterales que contienen hidroxilo. Esta presente opcionalmente un (met) acrilato que contiene amida. Estas composiciones exhiben un adecuado balance entre velocidad de curado por W, propiedades de libertad de pegajosidad y disolucion de la composicion no curada por una solucion alcalina diluida.
MXPA03004335A 2000-11-17 2001-11-16 Composiciones curables por radiacion. MXPA03004335A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
MYPI20005414 2000-11-17
PCT/EP2001/013250 WO2002041078A2 (en) 2000-11-17 2001-11-16 Radiation curable compositions

Publications (1)

Publication Number Publication Date
MXPA03004335A true MXPA03004335A (es) 2004-05-04

Family

ID=19749489

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA03004335A MXPA03004335A (es) 2000-11-17 2001-11-16 Composiciones curables por radiacion.

Country Status (9)

Country Link
US (1) US20040039100A1 (es)
EP (1) EP1340124A2 (es)
JP (1) JP2004514172A (es)
KR (1) KR20040012680A (es)
CN (1) CN1478218A (es)
AU (1) AU2002220710A1 (es)
CA (1) CA2429173A1 (es)
MX (1) MXPA03004335A (es)
WO (1) WO2002041078A2 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7150506B2 (en) † 2003-09-29 2006-12-19 Haldex Brake Products Ab Control network for brake system
US9005853B2 (en) 2010-05-20 2015-04-14 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component
CN105884949A (zh) * 2014-12-02 2016-08-24 苏州瑞红电子化学品有限公司 一种以支化型光敏聚苯乙烯马来酸酐为基体树脂的光刻胶组合物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4284776A (en) * 1977-12-09 1981-08-18 Ppg Industries, Inc. Radiation curable Michael addition amine adducts of amide acrylate compounds
US4722947A (en) * 1985-08-05 1988-02-02 Pony Industries, Inc. Production of radiation curable partial esters of anhydride-containing copolymers
JP2585224B2 (ja) * 1986-07-03 1997-02-26 三井東圧化学株式会社 感光性樹脂組成物
US6045973A (en) * 1998-12-11 2000-04-04 Morton International, Inc. Photoimageable compositions having improved chemical resistance and stripping ability

Also Published As

Publication number Publication date
US20040039100A1 (en) 2004-02-26
CA2429173A1 (en) 2002-05-23
WO2002041078A2 (en) 2002-05-23
EP1340124A2 (en) 2003-09-03
JP2004514172A (ja) 2004-05-13
WO2002041078A3 (en) 2002-08-08
KR20040012680A (ko) 2004-02-11
CN1478218A (zh) 2004-02-25
AU2002220710A1 (en) 2002-05-27

Similar Documents

Publication Publication Date Title
JP2002348544A5 (es)
TW200502345A (en) Curable (meth)acrylate compositions
EP1227113A4 (en) LACTONE MODIFIED REACTIVE MONOMER COMPOSITION, ACRYLIC POLYOL RESINS PRODUCED WITH THE SAME, CURABLE RESIN COMPOSITIONS AND COATING COMPOSITIONS
DE60028256D1 (de) Druckempfindliche klebstoffe und sternblockpolymere und acrylpolymere enthaltende gegenstände
EP1057866A3 (en) Curable resin composition
NZ536106A (en) Preparation of polymers in a solid state
TW376466B (en) Positive photoresist composition for deep ultraviolet radiation and process for its use
DE69514222T2 (de) Acrylat polymerisationsverfahren
WO2001043700A3 (de) Verbesserte dentalmaterialien
HK1035199A1 (en) Polycyclic resist compositions with increased etchresistance
EP0976010A4 (en) AQUEOUS PHOTORESISTS CONSISTING OF URETHANE ACRYLATES -------------
WO2002022700A3 (en) Radiation curable dendritic oligomer of polymer
GB0314671D0 (en) Intumescent coating compositions
TW200719086A (en) Photosensitive resin composition, spacer for display panel and display panel
MXPA03004335A (es) Composiciones curables por radiacion.
EP0346486A4 (en) Resin composition and solder resist resin composition
EP1291718A3 (en) Photopolymerizable composition
DE69329290T2 (de) Druckempfindliche kleblatexzusammensetzungen
JPS55112211A (en) Anaerobically curable composition having photocurability
NZ333853A (en) Thermoformable cast poly(methacrylate) containing a catalytic chain transfer agent which is a cobalt chelate or a derivative
NO960130L (no) UV-herdbar blokk-kopolymerblanding
AU2002217050A1 (en) Curable compositions comprising an epoxidised unsaturated polyester and mineral fillers
EP1347014A3 (en) Infrared-photosensitive composition
TW200641043A (en) Polycarbonate resin composition
DE60230408D1 (de) Gegen weichmacher beständige druckempfindliche klebstoffzusammensetzung und klebeartikel

Legal Events

Date Code Title Description
GB Transfer or rights

Owner name: SURFACE SPECIALTIES, S.A.

FA Abandonment or withdrawal