AU2002220710A1 - Radiation curable compositions - Google Patents

Radiation curable compositions

Info

Publication number
AU2002220710A1
AU2002220710A1 AU2002220710A AU2071002A AU2002220710A1 AU 2002220710 A1 AU2002220710 A1 AU 2002220710A1 AU 2002220710 A AU2002220710 A AU 2002220710A AU 2071002 A AU2071002 A AU 2071002A AU 2002220710 A1 AU2002220710 A1 AU 2002220710A1
Authority
AU
Australia
Prior art keywords
radiation curable
curable compositions
compositions
radiation
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002220710A
Inventor
Norazmi Alias
Kris Verschueren
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UCB SA
Original Assignee
UCB SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UCB SA filed Critical UCB SA
Publication of AU2002220710A1 publication Critical patent/AU2002220710A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
AU2002220710A 2000-11-17 2001-11-16 Radiation curable compositions Abandoned AU2002220710A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
MYPI20005414 2000-11-17
MYPI20005414 2000-11-17
PCT/EP2001/013250 WO2002041078A2 (en) 2000-11-17 2001-11-16 Radiation curable compositions

Publications (1)

Publication Number Publication Date
AU2002220710A1 true AU2002220710A1 (en) 2002-05-27

Family

ID=19749489

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002220710A Abandoned AU2002220710A1 (en) 2000-11-17 2001-11-16 Radiation curable compositions

Country Status (9)

Country Link
US (1) US20040039100A1 (en)
EP (1) EP1340124A2 (en)
JP (1) JP2004514172A (en)
KR (1) KR20040012680A (en)
CN (1) CN1478218A (en)
AU (1) AU2002220710A1 (en)
CA (1) CA2429173A1 (en)
MX (1) MXPA03004335A (en)
WO (1) WO2002041078A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7150506B2 (en) † 2003-09-29 2006-12-19 Haldex Brake Products Ab Control network for brake system
KR102148279B1 (en) * 2010-05-20 2020-08-26 히타치가세이가부시끼가이샤 Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component
CN105884949A (en) * 2014-12-02 2016-08-24 苏州瑞红电子化学品有限公司 Photoresist composition with branched photosensitive polystyrene-maleic anhydride as matrix resin

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4284776A (en) * 1977-12-09 1981-08-18 Ppg Industries, Inc. Radiation curable Michael addition amine adducts of amide acrylate compounds
US4722947A (en) * 1985-08-05 1988-02-02 Pony Industries, Inc. Production of radiation curable partial esters of anhydride-containing copolymers
JP2585224B2 (en) * 1986-07-03 1997-02-26 三井東圧化学株式会社 Photosensitive resin composition
US6045973A (en) * 1998-12-11 2000-04-04 Morton International, Inc. Photoimageable compositions having improved chemical resistance and stripping ability

Also Published As

Publication number Publication date
KR20040012680A (en) 2004-02-11
MXPA03004335A (en) 2004-05-04
EP1340124A2 (en) 2003-09-03
CN1478218A (en) 2004-02-25
CA2429173A1 (en) 2002-05-23
JP2004514172A (en) 2004-05-13
US20040039100A1 (en) 2004-02-26
WO2002041078A3 (en) 2002-08-08
WO2002041078A2 (en) 2002-05-23

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