MX2019011472A - Metodo para revelar termicamente precursores de relieve. - Google Patents

Metodo para revelar termicamente precursores de relieve.

Info

Publication number
MX2019011472A
MX2019011472A MX2019011472A MX2019011472A MX2019011472A MX 2019011472 A MX2019011472 A MX 2019011472A MX 2019011472 A MX2019011472 A MX 2019011472A MX 2019011472 A MX2019011472 A MX 2019011472A MX 2019011472 A MX2019011472 A MX 2019011472A
Authority
MX
Mexico
Prior art keywords
relief precursor
heated
cycle
development medium
contacted
Prior art date
Application number
MX2019011472A
Other languages
English (en)
Inventor
Peter Fronczkiewicz
Andrew Knapp
Torben Wendland
Martin Kunz
Original Assignee
Flint Group Germany Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Flint Group Germany Gmbh filed Critical Flint Group Germany Gmbh
Publication of MX2019011472A publication Critical patent/MX2019011472A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/055—Thermographic processes for producing printing formes, e.g. with a thermal print head
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

Un método para revelar térmicamente un precursor de relieve que comprende una capa de soporte y una capa de fotopolímero que tiene porciones curadas y no curadas que comprenden los pasos de: (a) fijar el precursor de relieve con la capa de soporte adyacente a un soporte móvil; (b) mover repetidamente el soporte con el precursor de relieve fijado sobre el mismo en una pluralidad de ciclos de movimiento; (c) calentar el precursor de relieve a una temperatura suficiente para hacer que las porciones no curadas de la capa de fotopolímero se reblandezcan o licuen; (d) poner en contacto el precursor de relieve con un medio de revelado para permitir que el material licuado de las porciones no curadas sea adherido y removido por el medio de revelado; en donde el calentamiento y la puesta en contacto se llevan a cabo en los ciclos A, B, C o D, cada uno correspondiendo a un solo ciclo de movimiento de tal manera que (i) en un ciclo A, el precursor de relieve se calienta con mayor potencia de calentamiento y no pone en contacto el precursor de relieve con el medio de revelado; (ii) en un ciclo B, el precursor de relieve se calienta con mayor potencia de calentamiento y se pone en contacto con el medio de revelado; (iii) en un ciclo C, el precursor de relieve no se calienta o se calienta con menor potencia de calentamiento y se pone en contacto con el medio de revelado; (iv) en un ciclo D, el precursor de relieve no se calienta o se calienta con menor potencia de calentamiento y no se pone en contacto con el medio de revelado; en donde el ciclo B se lleva a cabo una vez o más y al menos uno de los ciclos A, C o D se lleva a cabo una vez o más.
MX2019011472A 2018-09-26 2019-09-25 Metodo para revelar termicamente precursores de relieve. MX2019011472A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP18196988.2A EP3629089A1 (en) 2018-09-26 2018-09-26 Method for thermally developing relief precursors

Publications (1)

Publication Number Publication Date
MX2019011472A true MX2019011472A (es) 2020-08-13

Family

ID=63685779

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2019011472A MX2019011472A (es) 2018-09-26 2019-09-25 Metodo para revelar termicamente precursores de relieve.

Country Status (7)

Country Link
US (1) US11718085B2 (es)
EP (1) EP3629089A1 (es)
JP (2) JP7475122B2 (es)
CN (1) CN110955121B (es)
BR (1) BR102019019798A2 (es)
CA (1) CA3056832A1 (es)
MX (1) MX2019011472A (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024175566A1 (en) 2023-02-20 2024-08-29 Xsys Germany Gmbh System and methods for developing a relief precursor to obtain a relief structure

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Also Published As

Publication number Publication date
JP2024038226A (ja) 2024-03-19
US20200094541A1 (en) 2020-03-26
US11718085B2 (en) 2023-08-08
JP7475122B2 (ja) 2024-04-26
CN110955121B (zh) 2024-05-28
JP2020079926A (ja) 2020-05-28
EP3629089A1 (en) 2020-04-01
CN110955121A (zh) 2020-04-03
BR102019019798A2 (pt) 2020-12-29
CA3056832A1 (en) 2020-03-26

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