MX2019008979A - Dispositivo y metodo de recubrimiento para la fabricacion de articulos recubiertos. - Google Patents
Dispositivo y metodo de recubrimiento para la fabricacion de articulos recubiertos.Info
- Publication number
- MX2019008979A MX2019008979A MX2019008979A MX2019008979A MX2019008979A MX 2019008979 A MX2019008979 A MX 2019008979A MX 2019008979 A MX2019008979 A MX 2019008979A MX 2019008979 A MX2019008979 A MX 2019008979A MX 2019008979 A MX2019008979 A MX 2019008979A
- Authority
- MX
- Mexico
- Prior art keywords
- coating device
- targets
- workpiece
- rotating
- coated article
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J9/00—Piston-rings, e.g. non-metallic piston-rings, seats therefor; Ring sealings of similar construction
- F16J9/26—Piston-rings, e.g. non-metallic piston-rings, seats therefor; Ring sealings of similar construction characterised by the use of particular materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Pistons, Piston Rings, And Cylinders (AREA)
Abstract
Se proporciona un dispositivo de recubrimiento que puede controlar una distribución del espesor del recubrimiento a lo largo de la dirección circunferencial de un trabajo. El dispositivo de recubrimiento incluye un dispositivo de giro de trabajo (5) que sostiene múltiples trabajos (100) para rotar y girar los trabajos (100), un objetivo (3) que tiene una cara de emisión (3a) de la cual salen partículas como material de un recubrimiento formado 011 un circunferencial externo en cada uno de los trabajos (100), una fuente de energía (4) que suministra una corriente al objetivo (3) hace que las partículas salgan del objeto (3) y un accionador (23) que controla la energía. la fuente (4) para configurar la corriente actual en un periodo particular debe ser más alta que una salida de referencia, siendo el periodo particular al menos una parte de un periodo en el que una parte particular (102) del trabajo giratorio (100) hacia la emisión (3a).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017021968A JP6784608B2 (ja) | 2017-02-09 | 2017-02-09 | 成膜装置および成膜物の製造方法 |
PCT/JP2018/002837 WO2018147122A1 (ja) | 2017-02-09 | 2018-01-30 | 成膜装置および成膜物の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2019008979A true MX2019008979A (es) | 2019-10-09 |
Family
ID=63107469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2019008979A MX2019008979A (es) | 2017-02-09 | 2018-01-30 | Dispositivo y metodo de recubrimiento para la fabricacion de articulos recubiertos. |
Country Status (9)
Country | Link |
---|---|
US (1) | US11225711B2 (es) |
EP (1) | EP3564405B1 (es) |
JP (1) | JP6784608B2 (es) |
KR (1) | KR20190112067A (es) |
CN (1) | CN110268093B (es) |
BR (1) | BR112019016335A2 (es) |
MX (1) | MX2019008979A (es) |
PT (1) | PT3564405T (es) |
WO (1) | WO2018147122A1 (es) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019208551A1 (ja) * | 2018-04-27 | 2019-10-31 | 株式会社神戸製鋼所 | 成膜装置及び成膜方法 |
CN110760810B (zh) * | 2019-11-27 | 2022-04-08 | 中山凯旋真空科技股份有限公司 | 转架及具有其的镀膜设备 |
CN112481596B (zh) * | 2020-11-27 | 2022-01-14 | 厦门大学 | 一种工件旋转装置和离子束物理气相沉积装置 |
CN117305800B (zh) * | 2023-11-29 | 2024-02-13 | 长沙正圆动力科技有限责任公司 | 一种具有多维旋转架的活塞环镀膜机 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0682465U (ja) * | 1993-05-10 | 1994-11-25 | 株式会社リケン | 内燃機関用圧力リング |
JPH11200017A (ja) * | 1998-01-20 | 1999-07-27 | Nikon Corp | 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子 |
JP4680380B2 (ja) * | 2000-12-26 | 2011-05-11 | 株式会社リケン | ピストンリング及びその製造方法 |
JP4234652B2 (ja) * | 2004-08-26 | 2009-03-04 | 日本ピストンリング株式会社 | 皮膜形成用ワーク保持装置 |
US20070240982A1 (en) | 2005-10-17 | 2007-10-18 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Arc ion plating apparatus |
CN100381607C (zh) * | 2005-11-30 | 2008-04-16 | 吉林大学 | ZnO薄膜生长用光照MOCVD设备及其p型掺杂工艺 |
KR102083955B1 (ko) | 2010-06-25 | 2020-03-03 | 캐논 아네르바 가부시키가이샤 | 스퍼터링 장치, 박막증착 방법 및 컨트롤 디바이스 |
DE102013009369B4 (de) * | 2013-06-04 | 2015-05-07 | Federal-Mogul Burscheid Gmbh | Verfahren zur Herstellung eines Kolbenrings |
JP5664814B1 (ja) | 2014-06-24 | 2015-02-04 | 三菱マテリアル株式会社 | コーティング膜付き切削工具の成膜装置、切削工具用コーティング膜の成膜方法 |
-
2017
- 2017-02-09 JP JP2017021968A patent/JP6784608B2/ja active Active
-
2018
- 2018-01-30 PT PT187512397T patent/PT3564405T/pt unknown
- 2018-01-30 EP EP18751239.7A patent/EP3564405B1/en active Active
- 2018-01-30 MX MX2019008979A patent/MX2019008979A/es unknown
- 2018-01-30 BR BR112019016335-2A patent/BR112019016335A2/pt not_active Application Discontinuation
- 2018-01-30 US US16/483,478 patent/US11225711B2/en active Active
- 2018-01-30 KR KR1020197025078A patent/KR20190112067A/ko not_active Application Discontinuation
- 2018-01-30 WO PCT/JP2018/002837 patent/WO2018147122A1/ja unknown
- 2018-01-30 CN CN201880010245.9A patent/CN110268093B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP6784608B2 (ja) | 2020-11-11 |
US11225711B2 (en) | 2022-01-18 |
WO2018147122A1 (ja) | 2018-08-16 |
CN110268093B (zh) | 2021-07-30 |
JP2018127679A (ja) | 2018-08-16 |
US20200017956A1 (en) | 2020-01-16 |
EP3564405A4 (en) | 2020-11-04 |
CN110268093A (zh) | 2019-09-20 |
BR112019016335A2 (pt) | 2020-03-31 |
EP3564405A1 (en) | 2019-11-06 |
PT3564405T (pt) | 2021-04-26 |
KR20190112067A (ko) | 2019-10-02 |
EP3564405B1 (en) | 2021-03-31 |
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