MX2016013608A - Modo de transmision/reflexion optica en el control de la velocidad de deposicion in-situ para la fabricacion de elemento informatico integrado (ice). - Google Patents

Modo de transmision/reflexion optica en el control de la velocidad de deposicion in-situ para la fabricacion de elemento informatico integrado (ice).

Info

Publication number
MX2016013608A
MX2016013608A MX2016013608A MX2016013608A MX2016013608A MX 2016013608 A MX2016013608 A MX 2016013608A MX 2016013608 A MX2016013608 A MX 2016013608A MX 2016013608 A MX2016013608 A MX 2016013608A MX 2016013608 A MX2016013608 A MX 2016013608A
Authority
MX
Mexico
Prior art keywords
deposition rate
optical transmission
rate control
reflection mode
computational unit
Prior art date
Application number
MX2016013608A
Other languages
English (en)
Inventor
M Price James
B Nayak Aditya
l perkins David
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016013608A publication Critical patent/MX2016013608A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Se proveen sistemas y métodos para controlar una velocidad de deposición durante la fabricación de una película delgada. Un sistema provisto puede incluir una cámara, una fuente de material contenida en la cámara, un componente eléctrico para activar la fuente de material, un soporte de sustrato que da soporte al apilamiento de múltiples capas y al menos una muestra testigo. El sistema también puede incluir un dispositivo de medida y una unidad computacional. La fuente de material provee una capa de material al apilamiento de múltiples capas y a la muestra testigo a una velocidad de deposición controlada al menos de forma parcial por el componente eléctrico y con base en un valor de corrección obtenido en tiempo real por la unidad computacional. En algunas modalidades, el valor de corrección se basa en un valor medido provisto por el dispositivo de medida y un valor calculado provisto por la unidad computacional de acuerdo con un modelo.
MX2016013608A 2014-05-08 2014-05-08 Modo de transmision/reflexion optica en el control de la velocidad de deposicion in-situ para la fabricacion de elemento informatico integrado (ice). MX2016013608A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2014/037277 WO2015171149A1 (en) 2014-05-08 2014-05-08 Optical transmission/reflection mode in-situ deposition rate control for ice fabrication

Publications (1)

Publication Number Publication Date
MX2016013608A true MX2016013608A (es) 2017-02-02

Family

ID=54392809

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016013608A MX2016013608A (es) 2014-05-08 2014-05-08 Modo de transmision/reflexion optica en el control de la velocidad de deposicion in-situ para la fabricacion de elemento informatico integrado (ice).

Country Status (5)

Country Link
US (1) US9657391B2 (es)
EP (1) EP3102716A4 (es)
BR (1) BR112016020156A2 (es)
MX (1) MX2016013608A (es)
WO (1) WO2015171149A1 (es)

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US9905425B2 (en) * 2014-04-24 2018-02-27 Halliburton Energy Services, Inc. Engineering the optical properties of an integrated computational element by ion implantation
EP3102716A4 (en) 2014-05-08 2017-08-16 Halliburton Energy Services, Inc. Optical transmission/reflection mode in-situ deposition rate control for ice fabrication
JP6269576B2 (ja) * 2015-05-25 2018-01-31 横河電機株式会社 多成分ガス分析システム及び方法
US10317337B2 (en) 2016-05-27 2019-06-11 Halliburton Energy Services, Inc. Reverse design technique for optical processing elements
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US10577929B2 (en) 2016-09-22 2020-03-03 Halliburton Energy Services, Inc. Method to improve multivariate optical computing with an add-on integrated computational element
WO2018056976A1 (en) 2016-09-22 2018-03-29 Halliburton Energy Services, Inc. Methods and systems for obtaining high-resolution spectral data of formation fluids from optical computing device measurements
JP6800800B2 (ja) * 2017-04-06 2020-12-16 株式会社ニューフレアテクノロジー 成長速度測定装置および成長速度検出方法
GB2561865A (en) 2017-04-25 2018-10-31 Univ Of The West Of Scotland Apparatus and methods for depositing durable optical coatings
FR3074906B1 (fr) * 2017-12-07 2024-01-19 Saint Gobain Procede et dispositif de determination automatique de valeurs d'ajustement de parametres de fonctionnement d'une ligne de depot
WO2019221758A1 (en) * 2018-05-18 2019-11-21 Halliburton Energy Services, Inc. Determination of downhole formation fluid contamination and certain component concentrations
WO2020005203A1 (en) * 2018-06-25 2020-01-02 Halliburton Energy Services, Inc. In situ density control during fabrication of thin film materials
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JP6737944B1 (ja) * 2019-07-16 2020-08-12 株式会社神戸製鋼所 機械学習方法、機械学習装置、機械学習プログラム、通信方法、及び成膜装置
EP3869534A1 (en) * 2020-02-20 2021-08-25 Bühler Alzenau GmbH In-situ etch rate or deposition rate measurement system
JP7806393B2 (ja) * 2021-03-30 2026-01-27 セイコーエプソン株式会社 分子線エピタキシャル成長装置
KR20240047842A (ko) * 2022-10-05 2024-04-12 서울대학교산학협력단 기계학습이 적용된 자동화된 박막 증착 시스템 및 박막 증착 방법

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Also Published As

Publication number Publication date
EP3102716A1 (en) 2016-12-14
BR112016020156A2 (pt) 2018-05-08
US9657391B2 (en) 2017-05-23
US20160130696A1 (en) 2016-05-12
EP3102716A4 (en) 2017-08-16
WO2015171149A1 (en) 2015-11-12

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