MD4280C1 - Способ роста структуры pInP-nCdS - Google Patents
Способ роста структуры pInP-nCdSInfo
- Publication number
- MD4280C1 MD4280C1 MDA20130062A MD20130062A MD4280C1 MD 4280 C1 MD4280 C1 MD 4280C1 MD A20130062 A MDA20130062 A MD A20130062A MD 20130062 A MD20130062 A MD 20130062A MD 4280 C1 MD4280 C1 MD 4280C1
- Authority
- MD
- Moldova
- Prior art keywords
- ncds
- pinp
- substrate
- growth method
- cdcl2
- Prior art date
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Изобретение относится к полупроводниковой технологии и может быть использовано для изготовления преобразователей солнечного излучения в электрическую энергию.Способ роста структуры pInP-nCdS включает размещение предварительно протравленной pInP подложки с кристаллографической ориентацией (100) и разориентацией 3…5° в направлении (110) в реактор, нагрев зоны роста подложки и стабилизацию температуры в диапазоне 400…450°C, распыление, в открытом потоке кислорода, растворов CdCl2 и SnCl4 c формированием на подложке слоя Cd2SnO4, затем распыление растворов CdCl2 и CS(NH2)2 с формированием на нем слоя nCdS.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MDA20130062A MD4280C1 (ru) | 2013-09-04 | 2013-09-04 | Способ роста структуры pInP-nCdS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MDA20130062A MD4280C1 (ru) | 2013-09-04 | 2013-09-04 | Способ роста структуры pInP-nCdS |
Publications (2)
Publication Number | Publication Date |
---|---|
MD4280B1 MD4280B1 (ru) | 2014-03-31 |
MD4280C1 true MD4280C1 (ru) | 2014-10-31 |
Family
ID=50685394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MDA20130062A MD4280C1 (ru) | 2013-09-04 | 2013-09-04 | Способ роста структуры pInP-nCdS |
Country Status (1)
Country | Link |
---|---|
MD (1) | MD4280C1 (ru) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD972Z (ru) * | 2015-02-19 | 2016-06-30 | Государственный Университет Молд0 | Способ роста структуры p+InP-p-InP-n+CdS для фотоэлектрических элементов |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD4510C1 (ru) * | 2016-06-23 | 2018-03-31 | Государственный Университет Молд0 | Способ роста структуры n+-p-p+ InP для солнечных батарей |
MD4554C1 (ru) * | 2017-10-18 | 2018-09-30 | Государственный Университет Молд0 | Способ повышения эфективности фотоэлектрических элементов на основе p+InP-p-InP-n+CdS |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD673F2 (ro) * | 1994-05-24 | 1995-11-30 | Univ De Stat Din Moldova | Procedeu de obtinere a straturilor InP Process for the InP layers production |
MD626F2 (en) * | 1994-01-13 | 1996-11-29 | Univ De Stat Din Moldova | The method of heterostructures making of p+InP-pInP/CdS and p+GaAs-pGaAs/CdS |
EP0962963A1 (en) * | 1997-08-27 | 1999-12-08 | Matsushita Electric Industrial Co., Ltd. | Silicon carbide substrate, process for producing the same, and semiconductor element containing silicon carbide substrate |
EP1157414A1 (en) * | 1999-12-16 | 2001-11-28 | Koninklijke Philips Electronics N.V. | Method of achieving higher inversion layer mobility in silicon carbide semiconductor devices |
EP1333482A2 (en) * | 2002-01-31 | 2003-08-06 | Osaka Prefecture | Method for manufacturing a semiconductor silicon carbide on insulator substrate (SOI) and apparatus therefore |
RU2008111514A (ru) * | 2005-08-26 | 2009-10-10 | Смольтек Аб (Se) | Межсоединения и теплорассеиватели на основе наноструктур |
MD151Z (ru) * | 2008-12-30 | 2010-09-30 | Государственный Университет Молд0 | Способ выращивания эпитаксиальных слоёв GaAs в горизонтальном реакторе |
-
2013
- 2013-09-04 MD MDA20130062A patent/MD4280C1/ru not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD626F2 (en) * | 1994-01-13 | 1996-11-29 | Univ De Stat Din Moldova | The method of heterostructures making of p+InP-pInP/CdS and p+GaAs-pGaAs/CdS |
MD673F2 (ro) * | 1994-05-24 | 1995-11-30 | Univ De Stat Din Moldova | Procedeu de obtinere a straturilor InP Process for the InP layers production |
EP0962963A1 (en) * | 1997-08-27 | 1999-12-08 | Matsushita Electric Industrial Co., Ltd. | Silicon carbide substrate, process for producing the same, and semiconductor element containing silicon carbide substrate |
EP1157414A1 (en) * | 1999-12-16 | 2001-11-28 | Koninklijke Philips Electronics N.V. | Method of achieving higher inversion layer mobility in silicon carbide semiconductor devices |
EP1333482A2 (en) * | 2002-01-31 | 2003-08-06 | Osaka Prefecture | Method for manufacturing a semiconductor silicon carbide on insulator substrate (SOI) and apparatus therefore |
RU2008111514A (ru) * | 2005-08-26 | 2009-10-10 | Смольтек Аб (Se) | Межсоединения и теплорассеиватели на основе наноструктур |
MD151Z (ru) * | 2008-12-30 | 2010-09-30 | Государственный Университет Молд0 | Способ выращивания эпитаксиальных слоёв GaAs в горизонтальном реакторе |
Non-Patent Citations (2)
Title |
---|
Pleşca V. N. Teza de doctorat "Realizarea joncţiunilor semiconductoare pe baza fosfurii de indiu şi cercetarea proprietăţilor fotoelectrice", 1995 * |
Yoshikawa A., Sakai Y. High efficiency n-CdS/p-InP solar cells prepared by the closespaced technique. Solid-State Electronics, 1977, Vol. 20, p. 133-137 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MD972Z (ru) * | 2015-02-19 | 2016-06-30 | Государственный Университет Молд0 | Способ роста структуры p+InP-p-InP-n+CdS для фотоэлектрических элементов |
Also Published As
Publication number | Publication date |
---|---|
MD4280B1 (ru) | 2014-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG4A | Patent for invention issued | ||
KA4A | Patent for invention lapsed due to non-payment of fees (with right of restoration) | ||
MM4A | Patent for invention definitely lapsed due to non-payment of fees |