MD2173F2 - Dispozitiv pentru efectuarea procesului continuu de depunere electrolitica - Google Patents

Dispozitiv pentru efectuarea procesului continuu de depunere electrolitica Download PDF

Info

Publication number
MD2173F2
MD2173F2 MD99-0273A MD990273A MD2173F2 MD 2173 F2 MD2173 F2 MD 2173F2 MD 990273 A MD990273 A MD 990273A MD 2173 F2 MD2173 F2 MD 2173F2
Authority
MD
Moldova
Prior art keywords
current
drum
electrolytic deposition
operated drum
bands
Prior art date
Application number
MD99-0273A
Other languages
English (en)
Other versions
MD990273A (ro
MD2173G2 (ro
Inventor
Hans Josef May
Roland Schnettler
Michel Collard
Original Assignee
Circuit Foil Sa
Hans Josef May
Roland Schnettler
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Circuit Foil Sa, Hans Josef May, Roland Schnettler filed Critical Circuit Foil Sa
Publication of MD990273A publication Critical patent/MD990273A/ro
Publication of MD2173F2 publication Critical patent/MD2173F2/ro
Publication of MD2173G2 publication Critical patent/MD2173G2/ro

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0635In radial cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0671Selective plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Secondary Cells (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
MD99-0273A 1997-04-18 1998-04-11 Dispozitiv pentru efectuarea procesului continuu de depunere electrolitică MD2173G2 (ro)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19716369A DE19716369A1 (de) 1997-04-18 1997-04-18 Vorrichtung zum Durchführen kontinuierlicher elektrolytischer Abscheidungsprozesse
PCT/EP1998/002117 WO1998048083A2 (de) 1997-04-18 1998-04-11 Vorrichtung zum durchführen kontinuierlicher elektrolytischer abscheidungsprozesse

Publications (3)

Publication Number Publication Date
MD990273A MD990273A (ro) 2002-06-30
MD2173F2 true MD2173F2 (ro) 2003-05-31
MD2173G2 MD2173G2 (ro) 2003-11-30

Family

ID=7826990

Family Applications (1)

Application Number Title Priority Date Filing Date
MD99-0273A MD2173G2 (ro) 1997-04-18 1998-04-11 Dispozitiv pentru efectuarea procesului continuu de depunere electrolitică

Country Status (15)

Country Link
US (1) US6306268B1 (ro)
EP (1) EP0975825B1 (ro)
JP (1) JP3237762B2 (ro)
KR (1) KR100340349B1 (ro)
CN (1) CN1113984C (ro)
AT (1) ATE201724T1 (ro)
AU (1) AU7523898A (ro)
BR (1) BR9808683A (ro)
CA (1) CA2286813C (ro)
DE (2) DE19716369A1 (ro)
ES (1) ES2157661T3 (ro)
MD (1) MD2173G2 (ro)
PL (1) PL336496A1 (ro)
RU (1) RU2180021C2 (ro)
WO (1) WO1998048083A2 (ro)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD502Z (ro) * 2011-12-01 2012-11-30 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a tablei laminate subţiri din fier

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2258770C2 (ru) * 2003-06-02 2005-08-20 Вольхин Александр Иванович Способ изготовления металлической ленты электролизом и устройство для его осуществления
US20060163073A1 (en) * 2003-06-27 2006-07-27 Nobuhiro Higashihara Process for producing metal plating film, process for producing electronic part and plating film forming apparatus
NL1025446C2 (nl) * 2004-02-09 2005-08-10 Besi Plating B V Werkwijze en inrichting voor het elektrolytisch doen toenemen van de dikte van een elektrisch geleidend patroon op een dielektrische drager alsmede dielektrische drager.
FR2900161A1 (fr) * 2006-04-21 2007-10-26 Frederic Vacheron Installation de traitement de pieces, notamment par electrolyse
CN103732803A (zh) * 2010-12-23 2014-04-16 Fci公司 电镀方法和装置以及通过该方法获得的带材
RU2720288C2 (ru) * 2018-04-02 2020-04-28 федеральное государственное бюджетное образовательное учреждение высшего образования "Тольяттинский государственный университет" Способ изготовления фильтрующего элемента с металлической сеткой и устройства для его реализации

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE397490A (ro) * 1932-07-13
SU109530A1 (ru) * 1957-03-08 1957-11-30 М.А. Поляков Многобарабанный электролизер дл непрерывного получени катодного цинка
JPH07116636B2 (ja) * 1986-09-26 1995-12-13 川崎製鉄株式会社 ラジアル型めつきセル
US5069762A (en) 1991-01-18 1991-12-03 Usx Corporation Appartaus for improved current transfer in radial cell electroplating
RU2022062C1 (ru) * 1991-08-14 1994-10-30 Исаев Владимир Николаевич Устройство для нанесения селективно-локального гальванического покрытия на длинномерные ленты
DE4236927A1 (de) * 1992-10-31 1994-05-05 Hans Josef May Vorrichtung zum einseitigen elektrolytischen Beschichten von Metallbändern
FR2736364B1 (fr) * 1995-07-07 1997-08-08 Lorraine Laminage Dispositif de masquage de rives de bande metallique adapte a une cellule d'electrodeposition de type radial, pour la prevention des dendrites
TWI293897B (en) 2002-08-21 2008-03-01 Toray Industries Modified substrates and process for producing the same
JP6055598B2 (ja) 2012-02-17 2016-12-27 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP7116636B2 (ja) 2018-05-11 2022-08-10 信越ポリマー株式会社 導電性高分子分散液及びその製造方法、並びに導電性フィルムの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD502Z (ro) * 2011-12-01 2012-11-30 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a tablei laminate subţiri din fier

Also Published As

Publication number Publication date
KR100340349B1 (ko) 2002-06-12
RU2180021C2 (ru) 2002-02-27
PL336496A1 (en) 2000-07-03
MD990273A (ro) 2002-06-30
ES2157661T3 (es) 2001-08-16
JP2000510532A (ja) 2000-08-15
AU7523898A (en) 1998-11-13
EP0975825A2 (de) 2000-02-02
EP0975825B1 (de) 2001-05-30
DE59800799D1 (de) 2001-07-05
WO1998048083A3 (de) 1999-02-11
MD2173G2 (ro) 2003-11-30
CN1251624A (zh) 2000-04-26
US6306268B1 (en) 2001-10-23
BR9808683A (pt) 2000-07-11
CA2286813C (en) 2003-10-07
ATE201724T1 (de) 2001-06-15
DE19716369A1 (de) 1998-10-22
CA2286813A1 (en) 1998-10-29
WO1998048083A2 (de) 1998-10-29
JP3237762B2 (ja) 2001-12-10
CN1113984C (zh) 2003-07-09
KR20010006412A (ko) 2001-01-26

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