KR980005307U - 반도체 제조장비의 배기장치 - Google Patents

반도체 제조장비의 배기장치

Info

Publication number
KR980005307U
KR980005307U KR2019960015781U KR19960015781U KR980005307U KR 980005307 U KR980005307 U KR 980005307U KR 2019960015781 U KR2019960015781 U KR 2019960015781U KR 19960015781 U KR19960015781 U KR 19960015781U KR 980005307 U KR980005307 U KR 980005307U
Authority
KR
South Korea
Prior art keywords
exhaust system
semiconductor manufacturing
manufacturing equipment
equipment
semiconductor
Prior art date
Application number
KR2019960015781U
Other languages
English (en)
Other versions
KR200148771Y1 (ko
Inventor
김정승
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019960015781U priority Critical patent/KR200148771Y1/ko
Publication of KR980005307U publication Critical patent/KR980005307U/ko
Application granted granted Critical
Publication of KR200148771Y1 publication Critical patent/KR200148771Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019960015781U 1996-06-14 1996-06-14 반도체 제조장비의 배기장치 KR200148771Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960015781U KR200148771Y1 (ko) 1996-06-14 1996-06-14 반도체 제조장비의 배기장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960015781U KR200148771Y1 (ko) 1996-06-14 1996-06-14 반도체 제조장비의 배기장치

Publications (2)

Publication Number Publication Date
KR980005307U true KR980005307U (ko) 1998-03-30
KR200148771Y1 KR200148771Y1 (ko) 1999-06-15

Family

ID=19458498

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960015781U KR200148771Y1 (ko) 1996-06-14 1996-06-14 반도체 제조장비의 배기장치

Country Status (1)

Country Link
KR (1) KR200148771Y1 (ko)

Also Published As

Publication number Publication date
KR200148771Y1 (ko) 1999-06-15

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