KR960025257U - 반도체 제조장비의 배기시스템 - Google Patents

반도체 제조장비의 배기시스템

Info

Publication number
KR960025257U
KR960025257U KR2019940033805U KR19940033805U KR960025257U KR 960025257 U KR960025257 U KR 960025257U KR 2019940033805 U KR2019940033805 U KR 2019940033805U KR 19940033805 U KR19940033805 U KR 19940033805U KR 960025257 U KR960025257 U KR 960025257U
Authority
KR
South Korea
Prior art keywords
exhaust system
semiconductor manufacturing
manufacturing equipment
equipment
semiconductor
Prior art date
Application number
KR2019940033805U
Other languages
English (en)
Other versions
KR0118692Y1 (ko
Inventor
유충근
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940033805U priority Critical patent/KR0118692Y1/ko
Publication of KR960025257U publication Critical patent/KR960025257U/ko
Application granted granted Critical
Publication of KR0118692Y1 publication Critical patent/KR0118692Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019940033805U 1994-12-13 1994-12-13 반도체 제조장비의 배기시스템 KR0118692Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940033805U KR0118692Y1 (ko) 1994-12-13 1994-12-13 반도체 제조장비의 배기시스템

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940033805U KR0118692Y1 (ko) 1994-12-13 1994-12-13 반도체 제조장비의 배기시스템

Publications (2)

Publication Number Publication Date
KR960025257U true KR960025257U (ko) 1996-07-22
KR0118692Y1 KR0118692Y1 (ko) 1998-08-01

Family

ID=19401108

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940033805U KR0118692Y1 (ko) 1994-12-13 1994-12-13 반도체 제조장비의 배기시스템

Country Status (1)

Country Link
KR (1) KR0118692Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030053283A (ko) * 2001-12-22 2003-06-28 동부전자 주식회사 반도체 소자용 산화막 증착 시스템

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030053283A (ko) * 2001-12-22 2003-06-28 동부전자 주식회사 반도체 소자용 산화막 증착 시스템

Also Published As

Publication number Publication date
KR0118692Y1 (ko) 1998-08-01

Similar Documents

Publication Publication Date Title
KR960015805A (ko) 반도체 장치의 제조 방법
KR970007234U (ko) 반도체 제조장비의 배기장치
KR960025257U (ko) 반도체 제조장비의 배기시스템
KR970015299U (ko) 반도체 제조장비의 배기장치
KR970059820U (ko) 반도체 제조용 확산설비의 배기장치
KR980005307U (ko) 반도체 제조장비의 배기장치
KR970003177U (ko) 반도체 제조장비의 배기장치
KR960009211A (ko) 반도체장치의 제조방법
KR970046597U (ko) 웨이퍼 제조장비의 배기장치
KR970052833U (ko) 반도체 제조 장치
KR970052859U (ko) 반도체 제조 장치의 개스배기 시스템
KR970046646U (ko) 반도체제조시스템의 배기장치
KR970064156U (ko) 반도체소자 제조설비의 배기덕트
KR970046897U (ko) 반도체 제조장비의 히터블럭
KR970025807U (ko) 반도체설비의 가스 배기장치
KR960019080U (ko) 반도체 제조장비용 냉각장치
KR970052816U (ko) 반도체 제조 장치
KR970052819U (ko) 반도체 제조 장치
KR980005306U (ko) 반도체 제조장비의 반응로
KR980005382U (ko) 반도체 제조장비의 반응로
KR950031468U (ko) 반도체 노광장비의 조명계
KR950028703U (ko) 반도체 장치
KR970011213U (ko) 반도체 제조용 장치
KR960015587U (ko) 반도체 소자의 제조장비
KR970003208U (ko) 드라이 에칭 장비의 배기장치

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090223

Year of fee payment: 12

EXPY Expiration of term