KR980004645U - 웨이퍼 포토 공정용 노광시스템의 웨이퍼 스테이지 - Google Patents

웨이퍼 포토 공정용 노광시스템의 웨이퍼 스테이지

Info

Publication number
KR980004645U
KR980004645U KR2019960019177U KR19960019177U KR980004645U KR 980004645 U KR980004645 U KR 980004645U KR 2019960019177 U KR2019960019177 U KR 2019960019177U KR 19960019177 U KR19960019177 U KR 19960019177U KR 980004645 U KR980004645 U KR 980004645U
Authority
KR
South Korea
Prior art keywords
wafer
exposure system
photo process
wafer stage
stage
Prior art date
Application number
KR2019960019177U
Other languages
English (en)
Other versions
KR200141134Y1 (ko
Inventor
김수현
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019960019177U priority Critical patent/KR200141134Y1/ko
Publication of KR980004645U publication Critical patent/KR980004645U/ko
Application granted granted Critical
Publication of KR200141134Y1 publication Critical patent/KR200141134Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019960019177U 1996-06-29 1996-06-29 웨이퍼 포토 공정용 노광시스템의 웨이퍼 스테이지 KR200141134Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960019177U KR200141134Y1 (ko) 1996-06-29 1996-06-29 웨이퍼 포토 공정용 노광시스템의 웨이퍼 스테이지

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960019177U KR200141134Y1 (ko) 1996-06-29 1996-06-29 웨이퍼 포토 공정용 노광시스템의 웨이퍼 스테이지

Publications (2)

Publication Number Publication Date
KR980004645U true KR980004645U (ko) 1998-03-30
KR200141134Y1 KR200141134Y1 (ko) 1999-04-01

Family

ID=19460399

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960019177U KR200141134Y1 (ko) 1996-06-29 1996-06-29 웨이퍼 포토 공정용 노광시스템의 웨이퍼 스테이지

Country Status (1)

Country Link
KR (1) KR200141134Y1 (ko)

Also Published As

Publication number Publication date
KR200141134Y1 (ko) 1999-04-01

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