KR960019070U - 웨이퍼 에지 노광장치 - Google Patents

웨이퍼 에지 노광장치

Info

Publication number
KR960019070U
KR960019070U KR2019940031154U KR19940031154U KR960019070U KR 960019070 U KR960019070 U KR 960019070U KR 2019940031154 U KR2019940031154 U KR 2019940031154U KR 19940031154 U KR19940031154 U KR 19940031154U KR 960019070 U KR960019070 U KR 960019070U
Authority
KR
South Korea
Prior art keywords
wafer edge
exposure equipment
edge exposure
equipment
wafer
Prior art date
Application number
KR2019940031154U
Other languages
English (en)
Other versions
KR200184786Y1 (ko
Inventor
홍종수
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940031154U priority Critical patent/KR200184786Y1/ko
Publication of KR960019070U publication Critical patent/KR960019070U/ko
Application granted granted Critical
Publication of KR200184786Y1 publication Critical patent/KR200184786Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019940031154U 1994-11-24 1994-11-24 웨이퍼 에지 노광장치 KR200184786Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940031154U KR200184786Y1 (ko) 1994-11-24 1994-11-24 웨이퍼 에지 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940031154U KR200184786Y1 (ko) 1994-11-24 1994-11-24 웨이퍼 에지 노광장치

Publications (2)

Publication Number Publication Date
KR960019070U true KR960019070U (ko) 1996-06-19
KR200184786Y1 KR200184786Y1 (ko) 2000-06-01

Family

ID=19398947

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940031154U KR200184786Y1 (ko) 1994-11-24 1994-11-24 웨이퍼 에지 노광장치

Country Status (1)

Country Link
KR (1) KR200184786Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100564094B1 (ko) * 1997-06-19 2006-07-06 에스브이지 리도그래피 시스템즈, 아이엔씨. 진공식 파편 제거 시스템

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100564094B1 (ko) * 1997-06-19 2006-07-06 에스브이지 리도그래피 시스템즈, 아이엔씨. 진공식 파편 제거 시스템

Also Published As

Publication number Publication date
KR200184786Y1 (ko) 2000-06-01

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