KR970053009A - 바이폴라 접합 트랜지스터 제조방법 - Google Patents

바이폴라 접합 트랜지스터 제조방법

Info

Publication number
KR970053009A
KR970053009A KR1019950069560A KR19950069560A KR970053009A KR 970053009 A KR970053009 A KR 970053009A KR 1019950069560 A KR1019950069560 A KR 1019950069560A KR 19950069560 A KR19950069560 A KR 19950069560A KR 970053009 A KR970053009 A KR 970053009A
Authority
KR
South Korea
Prior art keywords
bipolar junction
junction transistor
transistor manufacturing
manufacturing
bipolar
Prior art date
Application number
KR1019950069560A
Other languages
English (en)
Other versions
KR100325448B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR1019950069560A priority Critical patent/KR100325448B1/ko
Publication of KR970053009A publication Critical patent/KR970053009A/ko
Application granted granted Critical
Publication of KR100325448B1 publication Critical patent/KR100325448B1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8248Combination of bipolar and field-effect technology
    • H01L21/8249Bipolar and MOS technology
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1004Base region of bipolar transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
KR1019950069560A 1995-12-30 1995-12-30 바이폴라 접합 트랜지스터 제조방법 KR100325448B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950069560A KR100325448B1 (ko) 1995-12-30 1995-12-30 바이폴라 접합 트랜지스터 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950069560A KR100325448B1 (ko) 1995-12-30 1995-12-30 바이폴라 접합 트랜지스터 제조방법

Publications (2)

Publication Number Publication Date
KR970053009A true KR970053009A (ko) 1997-07-29
KR100325448B1 KR100325448B1 (ko) 2002-07-27

Family

ID=37478222

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950069560A KR100325448B1 (ko) 1995-12-30 1995-12-30 바이폴라 접합 트랜지스터 제조방법

Country Status (1)

Country Link
KR (1) KR100325448B1 (ko)

Also Published As

Publication number Publication date
KR100325448B1 (ko) 2002-07-27

Similar Documents

Publication Publication Date Title
KR960012575A (ko) 반도체 장치 제조 방법
DE69631098D1 (de) Halbleiterstrukturen
DE69625265D1 (de) Halbleiterstrukturen
DE59610316D1 (de) Halbleiteranordnungen zur strombegrenzung
KR960012574A (ko) 반도체장치 제조방법
KR970004082A (ko) InAlAs-InGaAlAs 이질접합 이극 트랜지스터 반도체 장치
IT1283156B1 (it) Giunzione tubolare
KR960009213A (ko) 개량된 바이폴라 트랜지스터 및 그 제조 방법
DE69429127D1 (de) Heteroübergang-Bipolartransistor
FR2736468B1 (fr) Transistor bipolaire a structure optimisee
FI954241A (fi) Puolijohdelaitteen valmistusmenetelmä
DE69528203D1 (de) Transistor
DE69627789D1 (de) Verzweigungsweiche
DE69406722D1 (de) Heteroübergang-Bipolartransistor
KR970004056A (ko) 초고속 쌍극성 트랜지스터 및 그 제조 방법
KR970053009A (ko) 바이폴라 접합 트랜지스터 제조방법
DK0735590T3 (da) Bipolær siliciumtransistor
KR960015716A (ko) 반도체에피택셜성정방법
DE69615536D1 (de) Mos transistor
KR970003714A (ko) 모스 트랜지스터 제조 방법
KR960027799U (ko) 바이폴라 트랜지스터
NO180813B (no) Green-gaffel
KR970003476A (ko) 반도체 소자의 접합 영역 형성방법
KR920008958A (ko) 바이폴라 트랜지스터 제조방법
KR970003716A (ko) 모스 트랜지스터의 제조방법

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20060118

Year of fee payment: 5

LAPS Lapse due to unpaid annual fee