KR970052694A - Wafer cleaning method - Google Patents
Wafer cleaning method Download PDFInfo
- Publication number
- KR970052694A KR970052694A KR1019950065692A KR19950065692A KR970052694A KR 970052694 A KR970052694 A KR 970052694A KR 1019950065692 A KR1019950065692 A KR 1019950065692A KR 19950065692 A KR19950065692 A KR 19950065692A KR 970052694 A KR970052694 A KR 970052694A
- Authority
- KR
- South Korea
- Prior art keywords
- ultrapure water
- wafer
- cleaning
- isopropyl alcohol
- cleaning method
- Prior art date
Links
Abstract
본 발명은 초순수 세정시 이소프로필 알콜을 초순수 세정조에 보충을 하여 웨이퍼상에 흡착된 케미칼과 초순수 세정전에 표면장력을 완화시켜 초순수의 세정효과를 향상시킬 수 있다.The present invention can replenish isopropyl alcohol in an ultrapure water cleaning tank during ultrapure water cleaning to relax the surface tension before cleaning the chemicals adsorbed on the wafer and ultrapure water, thereby improving the cleaning effect of ultrapure water.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950065692A KR970052694A (en) | 1995-12-29 | 1995-12-29 | Wafer cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950065692A KR970052694A (en) | 1995-12-29 | 1995-12-29 | Wafer cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970052694A true KR970052694A (en) | 1997-07-29 |
Family
ID=66624234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950065692A KR970052694A (en) | 1995-12-29 | 1995-12-29 | Wafer cleaning method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970052694A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6329268B1 (en) | 1997-11-28 | 2001-12-11 | Nec Corporation | Semiconductor cleaning method |
KR100546190B1 (en) * | 1998-09-23 | 2006-04-12 | 주식회사 하이닉스반도체 | Semiconductor device manufacturing method |
KR100595140B1 (en) * | 2004-12-31 | 2006-06-30 | 동부일렉트로닉스 주식회사 | Wafer cleaning method for effective removal of chemical residue |
-
1995
- 1995-12-29 KR KR1019950065692A patent/KR970052694A/en not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6329268B1 (en) | 1997-11-28 | 2001-12-11 | Nec Corporation | Semiconductor cleaning method |
KR100348917B1 (en) * | 1997-11-28 | 2003-01-06 | 닛본 덴기 가부시끼가이샤 | Method for manufacturing semiconductor device |
KR100546190B1 (en) * | 1998-09-23 | 2006-04-12 | 주식회사 하이닉스반도체 | Semiconductor device manufacturing method |
KR100595140B1 (en) * | 2004-12-31 | 2006-06-30 | 동부일렉트로닉스 주식회사 | Wafer cleaning method for effective removal of chemical residue |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |