KR970030365A - Manufacturing method of optical path control device - Google Patents

Manufacturing method of optical path control device Download PDF

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Publication number
KR970030365A
KR970030365A KR1019950046578A KR19950046578A KR970030365A KR 970030365 A KR970030365 A KR 970030365A KR 1019950046578 A KR1019950046578 A KR 1019950046578A KR 19950046578 A KR19950046578 A KR 19950046578A KR 970030365 A KR970030365 A KR 970030365A
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KR
South Korea
Prior art keywords
forming
layer
metal layer
lower electrode
pad
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KR1019950046578A
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Korean (ko)
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KR100207403B1 (en
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남윤우
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배순훈
대우전자 주식회사
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Priority to KR1019950046578A priority Critical patent/KR100207403B1/en
Publication of KR970030365A publication Critical patent/KR970030365A/en
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Publication of KR100207403B1 publication Critical patent/KR100207403B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)

Abstract

본 발명은 광로 조절 장치의 제조 방법에 관한 것으로, 전기적 접점 단자로 작용하는 패드가 매트릭스 구조로 형성된 구동 기판상에 금속층을 형성시키고 패터닝시켜서 상기 구동 기판의 일부를 노출시키는 단계와, 상기 구동 기판상에 보호층, 스톱층, 희생층 및 멤브레인을 순차적으로 형성시키고 패터닝시켜서 콘택홀을 형성시키는 단계와, 상기 멤브레인상에 하부 전극을 형성시키는 단계와, 상기 하부 전극상에 변형부 및 상부 전극을 형성시키는 단계와, 상기 희생층을 제거함으로서 캔틸레버 형상의 액츄에이터를 형성시키는 단계로 이루어지며 이에 의해서 열처리에 의한 상기 변형부의 수축율을 저하시켜서 크랙 발생을 방지시킨다.The present invention relates to a method for manufacturing an optical path control device, the method comprising: exposing a portion of the drive substrate by forming and patterning a metal layer on a drive substrate having a pad formed as an electrical contact terminal having a matrix structure; Forming a contact hole by sequentially forming and patterning a protective layer, a stop layer, a sacrificial layer and a membrane on the substrate, forming a lower electrode on the membrane, and forming a deformable portion and an upper electrode on the lower electrode. And a step of forming a cantilever-shaped actuator by removing the sacrificial layer, thereby reducing the shrinkage of the deformable portion by heat treatment to prevent cracking.

Description

광로 조절장치의 제조방법Manufacturing method of optical path control device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도(a) 내지 (d)는 본 발명에 따라서 광로 조절 장치를 제작하기 위한 방법을 순차적으로 도시한 공정도.3 (a) to (d) are process diagrams sequentially showing a method for manufacturing an optical path control apparatus according to the present invention.

Claims (9)

전기적 접점 단자로 작용하는 패드(320)가 매트릭스 구조로 형성된 구동 기판(310)상에 금속층(321)을 형성시키고 패터닝시켜서 상기 구동 기판(310)의 일부를 노출시키는 제1단계와, 상기 구동 기판(310)상에 보호층(3l1), 스톱층(312), 희생층(330) 및 멤브레인(342)을 순차적으로 형성시키고 패터닝시켜서 콘택홀(350)을 형성시키는 제2단계와, 상기 멤브레인(342)상에 하부 전극(343)을 형성시키는 제3단계와, 상기 하부 전극(343)상에 변형부(344) 및 상부 전극(345)을 형성시키는 제4단계와, 그리고 상기 희생층(330)을 제거함으로서 캔틸레버 형성의 액츄에이터(340)를 형성시키는 제5단계로 이루어진 것을 특징으로 하는 광로 조절 장치의 제조 방법.A first step of exposing a portion of the driving substrate 310 by forming and patterning a metal layer 321 on the driving substrate 310 having a matrix structure having a pad 320 serving as an electrical contact terminal; Forming a contact hole 350 by sequentially forming and patterning a protective layer 311, a stop layer 312, a sacrificial layer 330, and a membrane 342 on the 310, and the membrane ( A third step of forming the lower electrode 343 on the 342, a fourth step of forming the deformable portion 344 and the upper electrode 345 on the lower electrode 343, and the sacrificial layer 330 And a fifth step of forming an actuator (340) of cantilever formation by removing a). 제l항에 있어서, 상기 금속층(321)은 상기 패드(320)상에 잔존하는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 1, wherein the metal layer (321) remains on the pad (320). 제2항에 있어서, 상기 금속층(321)은 상기 패드(320)를 구성하는 물질과 동일한 물질로 이루어져 있는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 2, wherein the metal layer (321) is made of the same material as the material constituting the pad (320). 제3항에 있어서, 상기 금슥층(321)은 텅스텐으로 이루어져 있는 것을 특징으로 하는 광로 조절 장치의 제조 방법.4. The method of claim 3, wherein the metallization layer (321) is made of tungsten. 제1항에 있어서, 상기 금속층(321)의 패턴을 통하여 상기 구동 기판(310) 및 상기 패드(320)의 일부가 노출되는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 1, wherein a portion of the driving substrate (310) and the pad (320) is exposed through the pattern of the metal layer (321). 제1항에 있어서, 상기 제2단계는 상기 보호층(311)을 평탄화시키는 공정을 부가적으로 포함하고 있는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 1, wherein the second step further comprises a step of planarizing the protective layer (311). 제6항에 있어서, 상기 보호층(311)은 화학 기계 연마 공정에 의하여 평탄화되는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 6, wherein the protective layer (311) is planarized by a chemical mechanical polishing process. 제1항에 있어서, 상기 하부 전극(343)은 상기 콘택홀(H)을 통하여 상기 금속층(321)과 전기적으로 연결되는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 1, wherein the lower electrode (343) is electrically connected to the metal layer (321) through the contact hole (H). 제1항에 있어서, 상기 제3단계는 상기 금속층(321)과 전기적으로 연결된 상기 하부 전극(343)을 화소 단위로 형성시키는 공정을 부가적으로 포함하고 있는 것을 특징으로 하는 광로 조절 장치의 제조 방법.The method of claim 1, wherein the third step further includes forming the lower electrode 343 electrically connected to the metal layer 321 in pixel units. . ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950046578A 1995-11-30 1995-11-30 Fabrication method for lightpath modulation device KR100207403B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950046578A KR100207403B1 (en) 1995-11-30 1995-11-30 Fabrication method for lightpath modulation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950046578A KR100207403B1 (en) 1995-11-30 1995-11-30 Fabrication method for lightpath modulation device

Publications (2)

Publication Number Publication Date
KR970030365A true KR970030365A (en) 1997-06-26
KR100207403B1 KR100207403B1 (en) 1999-07-15

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