KR970077236A - Planarization method of optical path control device - Google Patents

Planarization method of optical path control device Download PDF

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Publication number
KR970077236A
KR970077236A KR1019960017803A KR19960017803A KR970077236A KR 970077236 A KR970077236 A KR 970077236A KR 1019960017803 A KR1019960017803 A KR 1019960017803A KR 19960017803 A KR19960017803 A KR 19960017803A KR 970077236 A KR970077236 A KR 970077236A
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KR
South Korea
Prior art keywords
optical path
planarizing
layer
forming
path adjusting
Prior art date
Application number
KR1019960017803A
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Korean (ko)
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KR100207429B1 (en
Inventor
정재혁
Original Assignee
배순훈
대우전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 배순훈, 대우전자 주식회사 filed Critical 배순훈
Priority to KR1019960017803A priority Critical patent/KR100207429B1/en
Priority to US08/716,761 priority patent/US5789264A/en
Priority to JP26684596A priority patent/JP3764540B2/en
Publication of KR970077236A publication Critical patent/KR970077236A/en
Application granted granted Critical
Publication of KR100207429B1 publication Critical patent/KR100207429B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

본 발명은 액츄에이터의 토폴러지를 개선하기 위한 광로 조절 장치의 평탄화 방법에 관한 것으로서, 복수개의 능동 소자가 매트릭스 구조로 형성된 구동 기판의 상부에 보호층을 형성시키는 제1단계와, 상기 보호층의 상부에 식각 스톱층을 형성시키는 제2단계와, 상기 식각 스톱층의 상부에 폴리머로 이루어진 평탄화층을 형성시키는 제3단계와, 상기 평탄화층의 상부를 화학적 기계 연마 공정에 의하여 평탄화 하는 제4단계로 이루어진 방법이나 광로 조절 장치의 액츄에이터가 형성될 부분을 평탄화 함으로써, 액츄에이터의 상부 전극을 평탄한 상태로 제공할 수 있을 뿐만 아니라 소정 형성의 액츄에이터를 형성시킬 때 액티브 매트릭스를 구성하는 식각스톱층이 화학적 손상을 받는 것을 방지시켜서 광로 조절 장치의 성능 및 신뢰성을 향상시킨다.The present invention relates to a method of planarizing an optical path adjusting apparatus for improving a topology of an actuator, the method comprising: a first step of forming a protective layer on a driving substrate having a plurality of active elements formed in a matrix structure; A third step of forming a planarization layer made of polymer on the etching stop layer, and a fourth step of planarizing the upper portion of the planarization layer by a chemical mechanical polishing process The upper electrode of the actuator can be provided in a flat state by flattening the part where the actuator of the optical path adjusting device is to be formed, as well as the etching stop layer constituting the active matrix when forming the predetermined actuator, Thereby improving the performance and reliability of the optical path adjusting device.

Description

광로 조절 장치의 평탄화 방법Planarization method of optical path control device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제3도 (가) 내지 (라)는 본 발명에 따른 광로 조절 장치의 평탄화 방법을 순차적으로 도시한 공정도.FIGS. 3 (a) through 3 (d) are process drawings sequentially illustrating a planarizing method of an optical path adjusting apparatus according to the present invention;

Claims (5)

액츄에이터의 토플러지를 개선하기 위한 광로 조절 장치의 평탄화 방법에 있어서, 복수개의 능동 소자가 매트릭스 구조로 형성된 구동 기판의 상부에 보호층을 형성시키는 제1단계; 상기 보호층의 상부에 식각 스톱층을 형성시키는 제2단계; 상기 식각 스톱층의 상부에 폴리머로 이루어진 평탄화층을 형성시키는 제3단계와; 상기 평탄화층의 상부를 화학적 기계 연마 공정에 의하여 평탄화 하는 제4단계로 이루어진 광로 조절 장치의 평탄화 방법을 제공한다.A method for planarizing an optical path adjusting apparatus for improving a tofler paper of an actuator, comprising: a first step of forming a protective layer on a drive substrate having a plurality of active elements formed in a matrix structure; A second step of forming an etch stop layer on the protective layer; A third step of forming a planarization layer made of polymer on the etching stop layer; And a fourth step of planarizing an upper portion of the planarization layer by a chemical mechanical polishing process. 제1항에 있어서, 상기 평탄화층은, 점성이 60%이상인 폴리머로 이루어진 것을 특징으로 하는 광로 조절장치의 평탄화 방법.The planarizing method of an optical path adjusting apparatus according to claim 1, wherein the planarization layer is made of a polymer having a viscosity of 60% or more. 제2항에 있어서, 상기 평탄화층은, 아쿠폴로(ACCUFLO)로 이루어진 것을 특징으로 하는 광로 조절 장치의 평탄화 방법.3. The method of claim 2, wherein the planarizing layer comprises an ACCUFLO. 제2항 또는 제3항에 있어서, 상기 평탄화층은, 스핀 온 폴리머(SOP)공정에 의해서 이루어지는 것을 특징으로 하는 광로 조절 장치의 평탄화 방법.The flattening method according to claim 2 or 3, wherein the flattening layer is formed by a spin-on-polymer (SOP) process. 제2항 또는 제3항에 있어서, 상기 평탄화층은, 화학 기계 연마 공정에 의하여 평탄화되는 것을 특징으로 하는 광로 조절 장치의 평탄화 방법.The planarizing method of an optical path adjusting apparatus according to claim 2 or 3, wherein the planarizing layer is planarized by a chemical mechanical polishing process. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960017803A 1996-03-27 1996-05-23 Method for flatening ray control device KR100207429B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019960017803A KR100207429B1 (en) 1996-05-23 1996-05-23 Method for flatening ray control device
US08/716,761 US5789264A (en) 1996-03-27 1996-09-23 Method for manufacturing a thin film actuated mirror having a flat light reflecting surface
JP26684596A JP3764540B2 (en) 1996-03-27 1996-10-08 Manufacturing method of M × N thin film actuated mirror array for optical projection system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960017803A KR100207429B1 (en) 1996-05-23 1996-05-23 Method for flatening ray control device

Publications (2)

Publication Number Publication Date
KR970077236A true KR970077236A (en) 1997-12-12
KR100207429B1 KR100207429B1 (en) 1999-07-15

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Application Number Title Priority Date Filing Date
KR1019960017803A KR100207429B1 (en) 1996-03-27 1996-05-23 Method for flatening ray control device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101674236B1 (en) * 2012-04-19 2016-11-08 주식회사 엘지화학 Apparatus and method for forming flatness of glass substrate

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