KR970008468A - 스테이지 구동 제어장치 - Google Patents

스테이지 구동 제어장치 Download PDF

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Publication number
KR970008468A
KR970008468A KR1019960027171A KR19960027171A KR970008468A KR 970008468 A KR970008468 A KR 970008468A KR 1019960027171 A KR1019960027171 A KR 1019960027171A KR 19960027171 A KR19960027171 A KR 19960027171A KR 970008468 A KR970008468 A KR 970008468A
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South Korea
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freedom
degree
gravity
center
stage
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KR1019960027171A
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English (en)
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마사테루 도쿠나가
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오노 시게오
니콘 가부시키가이샤
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Publication of KR970008468A publication Critical patent/KR970008468A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
    • G05B19/21—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device
    • G05B19/23—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device for point-to-point control
    • G05B19/231—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device for point-to-point control the positional error is used to control continuously the servomotor according to its magnitude
    • G05B19/234—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device for point-to-point control the positional error is used to control continuously the servomotor according to its magnitude with current or torque feedback only
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/37—Measurements
    • G05B2219/37275—Laser, interferometer
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/42—Servomotor, servo controller kind till VSS
    • G05B2219/42034—Pi regulator
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49274—Four linear actuators to position x y table

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
  • Human Computer Interaction (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

본 발명의 목적은 스테이지를 자유도보다 많은 수의 구동 수단에 의해 구동하는 경우에 제어 수단(제어기) 상호간의 간섭을 효과적으로 방지하는 것이다.
스테이지(10)의 위치가 간섭계(20,22,24)에 의해 검출되면 변환수단(26)에서는 간섭계로 검출한 정보를 스테이지의 무게중심의 자유도마다의 위치 및 속도 정보로 변환한다. 자유도마다의 PI 제어기(54,56,58)에서는 무게중심의 0방향, Y방향, X방향의 위치 편차의 속도 변환값과 무게중심의 각각의 방향의 속도와의 차인 각각의 방향의 속도 편차에 의거해서 무게중심의 운동에 필요한 자유도마다의 제어량을(비례+적분) 동작에 의해 구한다. 변환 수단(60)에서는 제어기 (54,56,58)의 출력을 입력하고, 모터(12,14,16,18)의 각각에서 발생해야 할 제어량으로 변환되고 변환후의 제어량을 각 모터에 지령값으로서 부여한다.

Description

스테이지 구동 제어장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 1실시예에 관한 스테이지 구도 제어장치의 구성을 도시하는 블록도.

Claims (3)

  1. 하나 이상의 자유도를 가지며 상기 자유도보다 많은 수의 구동 수단으로 구동되는 스테이지를 구동 제어하는 스테이지 구동 제어장치에 있어서, 상기 스테이지의 위치를 검출하는 위치 검출 수단과; 상기 위치 검출 수단에서 검출된 정보를 상기 스테이지 무게 중심의 자유도마다의 위치 및 속도중의 적어도 어느 한쪽의 정보로 변환하는 제1의 변환 수단과; 무게 중심의 자유도마다의 목표 위치와 상기 제1의 변환 수단으로 변환된 무게 중심의 자유도마다의 위치와의 차인 자유도마다의 위치 편차와, 무게 중심의 자유도마다의 목표 속도와 상기 제1의 변환 수단으로 변환된 무게중심의 자유도마다의 속도와의 차인 자유도마다의 속도 편차의 어느 한쪽 이상에 의거해서 무게 중심의 운동에 필요한 자유도마다의 제어량을 비례 동작 또는 (비례+적분) 동작에 의해 구하는 자유도마다의 제어 수단과; 상기 모든 자유도마다의 제어 수단의 출력을 입력하고, 상기 각 구동 수단마다 발생해야할 제어량으로 변환하고, 변환후의 제어량을 상기 각 구동 수단에 지령값으로서 부여하는 제2의 변환 수단을 구비하는 것을 특징으로 하는 스테이지 구동 제어장치.
  2. 제1항에 있어서, 상기 자유도마다의 제어 수단은, 상기 무게중심의 자유도마다의 위치 편차의 속도 변환 값과 상기 제1의 변환 수단에서 변환된 무게 중심의 자유도마다의 속도와의 차에 의거하여 무게 중심의 운동에 필요한 자유도마다의 제어량을 (비례+적분)동작에 의해 구하는 것을 특징으로 하는 스테이지 구동 제어장치.
  3. 제1항 또는 제2항에 있어서, 상기 제1의 변환 수단은 지연시간의 보상계를 구비하는 것을 특징으로 하느 스테이지 구동 제어장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960027171A 1995-07-11 1996-07-05 스테이지 구동 제어장치 KR970008468A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7198183A JPH0927443A (ja) 1995-07-11 1995-07-11 ステージ駆動制御装置
JP95-198183 1995-07-11

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KR970008468A true KR970008468A (ko) 1997-02-24

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US (1) US5883702A (ko)
JP (1) JPH0927443A (ko)
KR (1) KR970008468A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100626280B1 (ko) * 1999-12-31 2006-09-22 엘지.필립스 엘시디 주식회사 진공증착장비의 서스셉터 구동 장치

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JP3907252B2 (ja) * 1996-12-05 2007-04-18 キヤノン株式会社 露光装置およびデバイス製造方法ならびにステージ装置および原点出し方法
US6151100A (en) * 1996-12-12 2000-11-21 Canon Kabushiki Kaisha Positioning system
US6260282B1 (en) * 1998-03-27 2001-07-17 Nikon Corporation Stage control with reduced synchronization error and settling time
JPH11354417A (ja) * 1998-06-11 1999-12-24 Canon Inc 走査型露光装置およびこれを用いたデバイス製造方法ならびにステージ制御装置
JP3796367B2 (ja) * 1999-03-09 2006-07-12 キヤノン株式会社 ステージ制御方法、露光方法、露光装置およびデバイス製造方法
US6405659B1 (en) 2000-05-01 2002-06-18 Nikon Corporation Monolithic stage
JP3870066B2 (ja) * 2000-12-27 2007-01-17 サンエー技研株式会社 基板位置決め装置および露光装置
GB2379735A (en) * 2001-09-14 2003-03-19 Qinetiq Ltd Method and apparatus for controlling the growth of thin film during deposition process by measuring the rate of change of optical thickness of the thin-film
EP1335248A1 (en) 2002-02-12 2003-08-13 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2003993A (nl) * 2009-01-22 2010-07-26 Asml Netherlands Bv Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object.
EP2336838A1 (en) 2009-12-15 2011-06-22 Robert Bosch GmbH Method and control device for aligning a stage in an electro chemical pattern reproduction process
JP6253312B2 (ja) * 2012-09-10 2017-12-27 キヤノン株式会社 制御装置、制御装置を備えるアクチュエータ、画像振れ補正装置、交換用レンズ、撮像装置、及び自動ステージ

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JP2658051B2 (ja) * 1987-05-15 1997-09-30 株式会社ニコン 位置合わせ装置，該装置を用いた投影露光装置及び投影露光方法
JP2535366B2 (ja) * 1988-01-09 1996-09-18 ファナック株式会社 産業用ロボットの動作能力確認方法と装置
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US5477304A (en) * 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
DE69315318D1 (de) * 1992-12-07 1998-01-02 Koninkl Philips Electronics Nv Steuerungseinrichtung
JPH06332538A (ja) * 1993-05-19 1994-12-02 Fanuc Ltd 柔軟なサーボ制御方法
JP3184044B2 (ja) * 1994-05-24 2001-07-09 キヤノン株式会社 微動位置決め制御装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100626280B1 (ko) * 1999-12-31 2006-09-22 엘지.필립스 엘시디 주식회사 진공증착장비의 서스셉터 구동 장치

Also Published As

Publication number Publication date
JPH0927443A (ja) 1997-01-28
US5883702A (en) 1999-03-16

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