KR970007501A - - Google Patents

Info

Publication number
KR970007501A
KR970007501A KR19960027236A KR19960027236A KR970007501A KR 970007501 A KR970007501 A KR 970007501A KR 19960027236 A KR19960027236 A KR 19960027236A KR 19960027236 A KR19960027236 A KR 19960027236A KR 970007501 A KR970007501 A KR 970007501A
Authority
KR
South Korea
Application number
KR19960027236A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR970007501A publication Critical patent/KR970007501A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
KR19960027236A 1995-07-06 1996-07-05 KR970007501A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17071595A JP3487383B2 (ja) 1995-07-06 1995-07-06 露光装置及びそれを用いる素子製造方法

Publications (1)

Publication Number Publication Date
KR970007501A true KR970007501A (ko) 1997-02-21

Family

ID=15910060

Family Applications (1)

Application Number Title Priority Date Filing Date
KR19960027236A KR970007501A (ko) 1995-07-06 1996-07-05

Country Status (3)

Country Link
US (1) US5894341A (ko)
JP (1) JP3487383B2 (ko)
KR (1) KR970007501A (ko)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092722A (ja) * 1996-09-18 1998-04-10 Nikon Corp 露光装置
IL132432A0 (en) * 1997-04-18 2001-03-19 Nikon Corp An exposure apparatus exposure method using the same and method of manufacture of circuit device
US6563565B2 (en) * 1997-08-27 2003-05-13 Nikon Corporation Apparatus and method for projection exposure
KR100274605B1 (ko) * 1997-12-05 2000-12-15 윤종용 웨이퍼 노광설비의 칩 레벨링 장치
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
EP1069600A4 (en) * 1998-03-24 2002-11-20 Nikon Corp ILLUMINATOR, EXPOSURE METHOD AND APPARATUS, METHOD FOR MANUFACTURING SAID DEVICE
WO1999052130A1 (fr) * 1998-04-07 1999-10-14 Nikon Corporation Procede d'exposition, appareil d'exposition, son procede de production, dispositif et son procede de fabrication
JPH11307430A (ja) 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
US6760124B1 (en) * 2000-03-22 2004-07-06 Hewlett-Packard Development Company, L.P. Software determination of led brightness and exposure
US6970811B1 (en) * 2000-03-22 2005-11-29 Hewlett-Packard Development Company, L.P. Hardware modeling of LED relative brightness
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
JP4230676B2 (ja) * 2001-04-27 2009-02-25 株式会社東芝 露光装置の照度むらの測定方法、照度むらの補正方法、半導体デバイスの製造方法及び露光装置
JP4174307B2 (ja) 2002-12-02 2008-10-29 キヤノン株式会社 露光装置
JP2005128238A (ja) * 2003-10-23 2005-05-19 Tadahiro Omi マスクリピータ、パターン描画装置、及びグレースケール手法
US7663734B2 (en) 2003-04-11 2010-02-16 Tadahiro Ohmi Pattern writing system and pattern writing method
JP2009510792A (ja) * 2005-10-04 2009-03-12 カール・ツァイス・エスエムティー・アーゲー リソグラフィ装置及び制御方法
JP4756984B2 (ja) * 2005-10-07 2011-08-24 キヤノン株式会社 露光装置、露光装置の制御方法およびデバイスの製造方法
US8411270B2 (en) * 2008-01-17 2013-04-02 International Business Machines Corporation Monitoring stage alignment and related stage and calibration target
US8201994B2 (en) * 2008-08-22 2012-06-19 The Boeing Company Flexible thermal cycle test equipment for concentrator solar cells
US20120063485A1 (en) * 2011-03-28 2012-03-15 Primestar Solar, Inc. Thermal endurance testing apparatus and methods for photovoltaic modules
WO2016031068A1 (ja) * 2014-08-29 2016-03-03 ギガフォトン株式会社 レーザ装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376581A (en) * 1979-12-20 1983-03-15 Censor Patent- Und Versuchs-Anstalt Method of positioning disk-shaped workpieces, preferably semiconductor wafers
JPS587618A (ja) * 1981-07-07 1983-01-17 Canon Inc 測光回路の温度補償方式
US4712910A (en) * 1984-01-05 1987-12-15 Nippon Kogaku K.K. Exposure method and apparatus for semiconductor fabrication equipment
JPS60158626A (ja) * 1984-01-30 1985-08-20 Canon Inc 半導体露光装置
JPS6119129A (ja) * 1984-07-05 1986-01-28 Nippon Kogaku Kk <Nikon> 投影光学装置
JPH0810124B2 (ja) * 1987-07-03 1996-01-31 株式会社ニコン 露光装置
EP0357423B1 (en) * 1988-09-02 1995-03-15 Canon Kabushiki Kaisha An exposure apparatus
KR930004897B1 (ko) * 1989-01-17 1993-06-09 스미도모덴기고오교오 가부시기가이샤 광센서
JPH03139634A (ja) * 1989-10-26 1991-06-13 Brother Ind Ltd 画像形成装置
JP3049775B2 (ja) * 1990-12-27 2000-06-05 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
US5266792A (en) * 1991-10-28 1993-11-30 Simmonds Precision Products, Inc. Temperature compensated optical detector
US5329336A (en) * 1992-07-06 1994-07-12 Nikon Corporation Exposure method and apparatus
US5581324A (en) * 1993-06-10 1996-12-03 Nikon Corporation Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors

Also Published As

Publication number Publication date
JPH0922120A (ja) 1997-01-21
JP3487383B2 (ja) 2004-01-19
US5894341A (en) 1999-04-13

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application