KR970004976A - 플라즈마의 검침을 위한 샘플러 - Google Patents

플라즈마의 검침을 위한 샘플러 Download PDF

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Publication number
KR970004976A
KR970004976A KR1019960020721A KR19960020721A KR970004976A KR 970004976 A KR970004976 A KR 970004976A KR 1019960020721 A KR1019960020721 A KR 1019960020721A KR 19960020721 A KR19960020721 A KR 19960020721A KR 970004976 A KR970004976 A KR 970004976A
Authority
KR
South Korea
Prior art keywords
sampler
plasma
reading
Prior art date
Application number
KR1019960020721A
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English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR970004976A publication Critical patent/KR970004976A/ko

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means
KR1019960020721A 1995-06-07 1996-06-07 플라즈마의 검침을 위한 샘플러 KR970004976A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/472,433 US5565737A (en) 1995-06-07 1995-06-07 Aliasing sampler for plasma probe detection

Publications (1)

Publication Number Publication Date
KR970004976A true KR970004976A (ko) 1997-01-29

Family

ID=23875493

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960020721A KR970004976A (ko) 1995-06-07 1996-06-07 플라즈마의 검침을 위한 샘플러

Country Status (7)

Country Link
US (1) US5565737A (ko)
EP (1) EP0753876B1 (ko)
JP (1) JPH08339896A (ko)
KR (1) KR970004976A (ko)
CN (1) CN1156827A (ko)
DE (1) DE69617549T2 (ko)
IL (1) IL117567A (ko)

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KR970042996A (ko) * 1995-12-15 1997-07-26 성재갑 다용도 세정제 조성물

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US6873114B2 (en) * 2002-09-26 2005-03-29 Lam Research Corporation Method for toolmatching and troubleshooting a plasma processing system
US6919689B2 (en) * 2002-09-26 2005-07-19 Lam Research Corporation Method for toolmatching and troubleshooting a plasma processing system
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WO2006076357A2 (en) * 2005-01-11 2006-07-20 Innovation Engineering, Llc Method of detecting rf power delivered to a load and complex impedance of the load
US7602127B2 (en) * 2005-04-18 2009-10-13 Mks Instruments, Inc. Phase and frequency control of a radio frequency generator from an external source
US8102954B2 (en) * 2005-04-26 2012-01-24 Mks Instruments, Inc. Frequency interference detection and correction
US7477711B2 (en) * 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements
KR101306612B1 (ko) * 2005-06-10 2013-09-11 버드 테크놀로지 그룹 인크. 반도체 플라즈마 발생 시스템들에서 전력 흐름을 분석하는시스템 및 방법
EP1753011B1 (de) * 2005-08-13 2012-10-03 HÜTTINGER Elektronik GmbH + Co. KG Verfahren zur Erzeugung von Ansteuersignalen für HF-Leistungsgeneratoren
DE102006031046A1 (de) 2006-07-05 2008-01-10 Rohde & Schwarz Gmbh & Co. Kg Anordnung zum Bestimmen der Betriebkenngrößen eines Hochfrequenz-Leistungsverstärkers
DE102006031053A1 (de) * 2006-07-05 2008-01-10 Rohde & Schwarz Gmbh & Co. Kg Anordnung zum Bestimmen der Betriebskenngrößen eines Hochfrequenz-Leistungsverstärkers
DE102006052061B4 (de) * 2006-11-04 2009-04-23 Hüttinger Elektronik Gmbh + Co. Kg Verfahren zur Ansteuerung von zumindest zwei HF-Leistungsgeneratoren
US7777567B2 (en) 2007-01-25 2010-08-17 Mks Instruments, Inc. RF power amplifier stability network
DE102007056468A1 (de) * 2007-11-22 2009-06-04 Hüttinger Elektronik Gmbh + Co. Kg Messsignalverarbeitungseinrichtung und Verfahren zur Verarbeitung von zumindest zwei Messsignalen
US8213885B2 (en) * 2008-04-11 2012-07-03 Nautel Limited Impedance measurement in an active radio frequency transmitter
UY31825A (es) * 2008-05-13 2010-01-05 Res And Innovation Inc Método de iniciación para descarga de plasma luminiscente anormal en un medio de fase líquida y dispositivo para su implementación
ITRM20080304A1 (it) * 2008-06-11 2009-12-12 Univ Palermo Dispositivo portatile per la rilevazione di scariche parziali
CN101839951B (zh) * 2009-03-20 2013-03-27 中芯国际集成电路制造(上海)有限公司 射频发生器测试方法及设备
US8513939B2 (en) * 2010-10-12 2013-08-20 Applied Materials, Inc. In-situ VHF voltage sensor for a plasma reactor
JP6456298B2 (ja) 2012-12-18 2019-01-23 トゥルンプフ ヒュッティンガー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＴＲＵＭＰＦ Ｈｕｅｔｔｉｎｇｅｒ ＧｍｂＨ ＋ Ｃｏ． ＫＧ アーク消弧方法及び電力変換器を備えた電力供給システム
JP6629071B2 (ja) 2012-12-18 2020-01-15 トゥルンプフ ヒュッティンガー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＴＲＵＭＰＦ Ｈｕｅｔｔｉｎｇｅｒ ＧｍｂＨ ＋ Ｃｏ． ＫＧ 高周波電力を発生させるための方法及び負荷に電力を供給するための電力変換器を備えた電力供給システム
US9107284B2 (en) * 2013-03-13 2015-08-11 Lam Research Corporation Chamber matching using voltage control mode
DE102015212242A1 (de) 2015-06-30 2017-01-05 TRUMPF Hüttinger GmbH + Co. KG Verfahren zum Abtasten eines mit einem Plasmaprozess in Beziehung stehenden Signalgemischs
JP7108623B2 (ja) * 2017-02-16 2022-07-28 アプライド マテリアルズ インコーポレイテッド 高温環境において高周波電力を測定するための電圧－電流プローブ、及び電圧－電流プローブを較正する方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970042996A (ko) * 1995-12-15 1997-07-26 성재갑 다용도 세정제 조성물

Also Published As

Publication number Publication date
US5565737A (en) 1996-10-15
JPH08339896A (ja) 1996-12-24
EP0753876A3 (en) 1999-01-13
IL117567A0 (en) 1996-07-23
DE69617549T2 (de) 2002-07-04
DE69617549D1 (de) 2002-01-17
IL117567A (en) 1998-12-27
CN1156827A (zh) 1997-08-13
EP0753876B1 (en) 2001-12-05
EP0753876A2 (en) 1997-01-15

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