KR960032592A - 반도체 제조 장치 - Google Patents

반도체 제조 장치 Download PDF

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Publication number
KR960032592A
KR960032592A KR1019950002249A KR19950002249A KR960032592A KR 960032592 A KR960032592 A KR 960032592A KR 1019950002249 A KR1019950002249 A KR 1019950002249A KR 19950002249 A KR19950002249 A KR 19950002249A KR 960032592 A KR960032592 A KR 960032592A
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KR
South Korea
Prior art keywords
gas
shower head
reaction
inlet
semiconductor manufacturing
Prior art date
Application number
KR1019950002249A
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English (en)
Other versions
KR0175002B1 (ko
Inventor
염계희
문종
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950002249A priority Critical patent/KR0175002B1/ko
Publication of KR960032592A publication Critical patent/KR960032592A/ko
Application granted granted Critical
Publication of KR0175002B1 publication Critical patent/KR0175002B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

유기 금속 화학 기상 증착법(Metal Organic Chemical Vapor Deposition MOCVD법) 장치에 사용되는 샤워 헤드에 관하여 개시한다. 본 발명은 반응관과, 상기 반응관에 반응기체를 유입할 수 있는 유입구와, 상기 반응가스의 유입구와 연결되고, 기체에 의해 온도조절되고 다수의 구멍을 통해 반응기체를 가열 배출할 수 있는 샤워 헤드와, 상기 샤워헤드의 대향하여 상기 반응기체가 반응할 수 있는 기판이 탑재될 수 있는 히터블럭을 구비한다. 본 발명에 의하면, 샤워 헤드의 온도를 질소기체를 이용하여 정확히 조절함으로써, 반도체 기판상에 증착되는 금속막을 균일하고 재현성 있고 비저항이 낮게 형성할 수 있다.

Description

반도체 제조 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도는 MOCVD법을 이용한 본 발명의 반도체 장치를 설명하기 위한 개략도이다.

Claims (2)

  1. 반응과; 상기 반응관에 반응기체를 유입할 수 있는 유입구; 상기 반응가스의 유입구와 연결되고, 기체에 의해 온도조절되고 다수의 구멍을 통해 반응기체를 가열 배출할 수 있는 샤워 헤드; 및 상기 샤워 헤드의 대향하여 상기 반응기체가 반응할 수 있는 기판이 탑재될 수 있는 히터블럭을 구비하는 것을 특징으로 하는 반도체 제조장치.
  2. 제1항에 있어서, 상기 기체는 질소기체를 사용하는 것을 특징으로 하는 반도체 제조 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950002249A 1995-02-08 1995-02-08 유기금속화학기상증착장치 KR0175002B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950002249A KR0175002B1 (ko) 1995-02-08 1995-02-08 유기금속화학기상증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950002249A KR0175002B1 (ko) 1995-02-08 1995-02-08 유기금속화학기상증착장치

Publications (2)

Publication Number Publication Date
KR960032592A true KR960032592A (ko) 1996-09-17
KR0175002B1 KR0175002B1 (ko) 1999-04-01

Family

ID=19407819

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950002249A KR0175002B1 (ko) 1995-02-08 1995-02-08 유기금속화학기상증착장치

Country Status (1)

Country Link
KR (1) KR0175002B1 (ko)

Also Published As

Publication number Publication date
KR0175002B1 (ko) 1999-04-01

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