KR960029408A - 칼라 필터용 광중합성 조성물 - Google Patents

칼라 필터용 광중합성 조성물 Download PDF

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Publication number
KR960029408A
KR960029408A KR1019960000892A KR19960000892A KR960029408A KR 960029408 A KR960029408 A KR 960029408A KR 1019960000892 A KR1019960000892 A KR 1019960000892A KR 19960000892 A KR19960000892 A KR 19960000892A KR 960029408 A KR960029408 A KR 960029408A
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South Korea
Prior art keywords
coating film
optical density
compound
color filter
less
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KR1019960000892A
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English (en)
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KR100312474B1 (ko
Inventor
도시유끼 우라도
신고 이께다
에쓰고 히노
신 가와나
다께시 오오모리
고지 모리
Original Assignee
미우라 아끼라
미쓰비시가가꾸 가부시끼가이샤
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Priority claimed from JP18389895A external-priority patent/JP3894584B2/ja
Application filed by 미우라 아끼라, 미쓰비시가가꾸 가부시끼가이샤 filed Critical 미우라 아끼라
Publication of KR960029408A publication Critical patent/KR960029408A/ko
Priority to KR1020010037723A priority Critical patent/KR100332723B1/ko
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Publication of KR100312474B1 publication Critical patent/KR100312474B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)

Abstract

하나 이상의 에틸렌 불포화 이중 결합을 갖는 화합물 광중합 개시제 그리고 적색, 녹색 또는 청색 착색제를 함유하고, 1㎛ 이하 두께의 건조 필름을 갖는 코팅 필름으로 형성되었을 때 1.1 이상의 광학 밀도를 갖는 칼라 필터용 광중합성 조성물.

Description

칼라 필터용 광중합성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 하나 이상의 에틸렌계 불포화 이중 결합을 갖는 화합물, 광중합 개시제 그리고 적색, 녹색 또는 청색 착색제를 함유하고, 1㎛ 이하 두께의 건조 필름을 갖는 코팅 필름으로 형성되었을 때 1.1 이상의 광학 밀도를 갖는 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  2. 하나 이상의 에틸렌계 불포화 이중 결합을 갖는 화합물, 광중합 개시제 그리고 흑색 착색제를 함유하고, 1㎛ 이하 두께의 건조 필름을 갖는 코팅 필름으로 형성되었을 때 2.5 이상의 광학 밀도를 갖는 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  3. 제2항에 있어서, 코팅 필름의 광학 밀도가 2.8 이상이고 1시간 동안 230℃에서 코팅 필름의 열처리에 의한 광학 밀도의 감소가 5% 이하인 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  4. 제2항에 있어서, 코팅 필름의 광학 밀도가 2.8 이상이고 25℃에서, 25분 동안 N-메틸피롤리돈 내에 코팅 필름을 침적한 후의 광학 밀도의 감소가 5% 이하인 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  5. 제2항에 있어서, 코팅 필름의 광학 밀도가 2.8 이상이고, 10℃, 상대 습도 100%에서, 3시간 동안 코팅 필름을 압력 가마 시험을 수행한 다음 JS K 5400에 따라 크로스 컷 테이프법(cross cut tape method) 및/또는 X 컷 테이프법(X cut tape method)에 의해 부착력을 평가할 때, 평가치가 8포인트 이상인 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  6. 제2항에 있어서, 코팅 필름의 광학 밀도가 2.8 이상이고 열 방출 가스 크로마토그래피로 230℃까지 측정하였을때 검출된 휘발성 성분이 0.1% 이하인 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  7. 제2항 내지 제6항 중의 어느 한 항에 있어서, 고체 함량 농도로 40중량% 이상의 카본 블랙을 흑색 착색제로 함유하는 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  8. 하나 이상의 에틸렌계 불포화 이중 결합을 갖는 화합물, 티타노센 화합물 및 착색제를 함유하는 것을 특징으로 하는 칼라 필터용 광중합성 조성물.
  9. 제8항에 있어서, 알킬아미노 화합물 및/또는 헥사아릴비이미다졸 화합물을 더 함유하는 것을 특징으로 하는 칼라 필터용 광중합성 화합물.
  10. 제8항 또는 제9항에 있어서, 방향족 메르캅토 화합물을 더 함유하는 것을 특징으로 하는 칼라 필터용 광중합성 화합물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960000892A 1995-01-17 1996-01-17 칼라필터용광중합성조성물 KR100312474B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020010037723A KR100332723B1 (ko) 1995-01-17 2001-06-28 칼라 필터용 광중합성 조성물

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP489995 1995-01-17
JP95-4899 1995-01-17
JP18389895A JP3894584B2 (ja) 1995-07-20 1995-07-20 カラーフィルター用ブラックマトリックス
JP95-183898 1995-07-20
JP19065695 1995-07-26
JP95-190656 1995-07-26
JP95-200789 1995-08-07
JP20078995 1995-08-07

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KR100312474B1 KR100312474B1 (ko) 2002-10-04

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US (1) US5863678A (ko)
EP (1) EP0723167A3 (ko)
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CN105175315B (zh) 2009-03-23 2018-08-28 巴斯夫欧洲公司 光致抗蚀剂组合物
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JP5757925B2 (ja) 2011-08-31 2015-08-05 富士フイルム株式会社 着色組成物、並びに、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子
JP6113181B2 (ja) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN104284888B (zh) 2012-05-09 2017-10-27 巴斯夫欧洲公司 肟酯光敏引发剂
CN103033978B (zh) * 2012-12-14 2015-04-29 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示装置
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JP6530410B2 (ja) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
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CN104530313B (zh) * 2014-12-15 2018-12-25 京东方科技集团股份有限公司 染料化合物及其制备方法、着色剂、感光树脂组合物、滤光片
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KR102067857B1 (ko) * 2016-04-08 2020-01-17 주식회사 엘지화학 잉크젯 프린팅을 이용한 베젤 패턴의 형성 방법
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
JP2023517304A (ja) 2020-03-04 2023-04-25 ベーアーエスエフ・エスエー オキシムエステル光開始剤

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JPH05313009A (ja) * 1992-05-12 1993-11-26 Toppan Printing Co Ltd 顔料分散型カラーフィルターおよび感光性樹脂組成物
GB2273101B (en) * 1992-11-10 1997-03-05 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition
EP0619520B1 (en) * 1993-04-09 1996-01-31 Mitsubishi Chemical Corporation Photopolymerizable composition
JP3195480B2 (ja) * 1993-12-09 2001-08-06 富士写真フイルム株式会社 遮光性感光性樹脂組成物、遮光性感光性転写材料及び遮光膜の形成方法

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EP0723167A3 (en) 1997-04-02
US5863678A (en) 1999-01-26
EP0723167A2 (en) 1996-07-24
KR100312474B1 (ko) 2002-10-04

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