KR960029378A - 절연 필름의 비아 홀의 형성방법 및 절연 필름의 절단 방법 - Google Patents
절연 필름의 비아 홀의 형성방법 및 절연 필름의 절단 방법 Download PDFInfo
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- KR960029378A KR960029378A KR1019940040716A KR19940040716A KR960029378A KR 960029378 A KR960029378 A KR 960029378A KR 1019940040716 A KR1019940040716 A KR 1019940040716A KR 19940040716 A KR19940040716 A KR 19940040716A KR 960029378 A KR960029378 A KR 960029378A
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- South Korea
- Prior art keywords
- film
- layer
- film comprises
- laser beam
- filler
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract 31
- 239000000945 filler Substances 0.000 claims 8
- 239000002245 particle Substances 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 6
- 239000004809 Teflon Substances 0.000 claims 4
- 229920006362 Teflon® Polymers 0.000 claims 4
- 239000003822 epoxy resin Substances 0.000 claims 4
- 229920000647 polyepoxide Polymers 0.000 claims 4
- 229920001721 polyimide Polymers 0.000 claims 4
- 239000009719 polyimide resin Substances 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- 238000002835 absorbance Methods 0.000 claims 2
- 238000010521 absorption reaction Methods 0.000 claims 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 claims 2
- 238000004544 sputter deposition Methods 0.000 claims 2
- 230000008016 vaporization Effects 0.000 claims 2
- 238000009834 vaporization Methods 0.000 claims 2
- 238000002604 ultrasonography Methods 0.000 claims 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/16—Removal of by-products, e.g. particles or vapours produced during treatment of a workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/486—Via connections through the substrate with or without pins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/12—Copper or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/14—Titanium or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/18—Dissimilar materials
- B23K2103/26—Alloys of Nickel and Cobalt and Chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0112—Absorbing light, e.g. dielectric layer with carbon filler for laser processing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/015—Fluoropolymer, e.g. polytetrafluoroethylene [PTFE]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0285—Using ultrasound, e.g. for cleaning, soldering or wet treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1377—Protective layers
- H05K2203/1388—Temporary protective conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
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- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Formation Of Insulating Films (AREA)
Abstract
유기 절연 필름에 비아 홀(via holes)을 형성하거나 필름을 절단하는 방법은 필름의 소정의 부분을 레이저 빔에 노출시켜노출부분이 변형되거나 분해될 때까지 필름의 노출 부분의 온도를 상승시키는 단계 및 필름을 초음파에 적용시켜 변형되거나 분해된 부분이 분산되도록 하는 단계를 포함한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (28)
- 유기 절연 필름의 소정의 부분을 레이저 빔에 노출시켜 노출부분이 변형되거나 분해될 때까지 필름의 노출부분의 온도를 상승시키는 단계 및 필름을 초음파에 적용시켜 변형되거나 분해된 부분을 분산시켜 비아 홀(via holes)을형성하는 단계를 포함하는 유기 절연 필름의 비아 홀의 형성방법.
- 제1항에 있어서, 레이저 빔이 가시광선 또는 근적외선인 방법.
- 제1항에 있어서, 레이저 빔에 대한 흡광도가 큰 층을 형성하는 단계를 추가로 포함하는 방법.
- 제3항에 있어서, 층이 스퍼터링(sputtering)에 의해 형성되는 방법.
- 제3항에 있어서, 층이 기화에 의해 형성되는 방법.
- 제3항에 있어서, 층이 화학적 증착에 의해 형성되는 방법.
- 제3항에 있어서, 층이, 나트륨 나프탈렌을 포함하는 액체에 필름을 적용시킴으로써 형성되는 방법.
- 제1항에 있어서, 레이저 빔이 필름의 흡수 파장을 갖는 방법.
- 제1항에 있어서, 필름이 테플론 수지 기재와 유리 입자 충전재를 포함하는 방법.
- 제1항에 있어서, 필름이 폴리이미드 수지를 포함하는 방법.
- 제1항에 있어서, 필름이 에폭시 수지를 포함하는 방법.
- 제1항에 있어서, 필름이 에폭시 수지 기재와 절연 화합물 입자의 충전재를 포함하는 방법.
- 제1항에 있어서, 필름이 폴리이미드 수지 기재와 절연 화합물 입자의 충전재를 포함하는 방법.
- 제1항에 있어서, 필름이 테플론 수지 기재와 절연 화합물 입자의 충전재를 포함하는 방법.
- 유기 절연 필름의 소정의 부분을 레이저 빔에 노출시켜 노출부분이 변형되거나 분해될 때까지 필름의 노출부분의 온도를 상승시키는 단계 및 필름을 초음파에 적용시켜 변형되거나 분해된 부분을 분산시켜 필름을 절단하는 단계를 포함하는 유기 절연 필름의 절단 방법.
- 제15항에 있어서, 레이저 빔이 가시광선 또는 근적외선인 방법.
- 제15항에 있어서, 레이저 빔에 대한 흡광도가 큰 층을 형성하는 단계를 추가로 포함하는 방법.
- 제17항에 있어서, 층이 스퍼터링에 의해 형성되는 방법.
- 제17항에 있어서, 층이 기화에 의해 형성되는 방법.
- 제17항에 있어서, 층이 화학적 증착에 의해 형성되는 방법.
- 제17항에 있어서, 층이, 나트륨 나프탈렌을 포함하는 액체에 필름을 적용시킴으로써 형성되는 방법.
- 제15항에 있어서, 레이저 빔이 필름의 흡수 파장을 갖는 방법.
- 제15항에 있어서, 필름이 테플론 수지 기재의 유리 입자 충전재를 포함하는 방법.
- 제15항에 있어서, 필름이 폴리이미드 수지를 포함하는 방법.
- 제15항에 있어서, 필름이 에폭시 수지를 포함하는 방법.
- 제15항에 있어서, 필름이 에폭시 수지 기재와 절연 화합물 입자의 충전재를 포함하는 방법.
- 제15항에 있어서, 필름이 폴리이미드 수지 기재와 절연 화합물 입자의 충전재를 포함하는 방법.
- 제15항에 있어서, 필름이 테플론 수지 기재와 절연 화합물 입자의 충전재를 포함하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP93-337939 | 1993-12-28 | ||
JP33793993 | 1993-12-28 | ||
JP5083794 | 1994-03-22 | ||
JP94-050837 | 1994-03-22 | ||
JP94-174413 | 1994-07-26 | ||
JP6174413A JP2760288B2 (ja) | 1993-12-28 | 1994-07-26 | ビアホール形成法及びフィルム切断法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960029378A true KR960029378A (ko) | 1996-08-17 |
KR0139708B1 KR0139708B1 (en) | 1998-07-01 |
Family
ID=27294094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR94040716A KR0139708B1 (en) | 1993-12-28 | 1994-12-28 | Method of forming via holes in an insulation film and method of cutting the insulation film |
Country Status (4)
Country | Link |
---|---|
US (1) | US5628926A (ko) |
EP (1) | EP0661734B1 (ko) |
KR (1) | KR0139708B1 (ko) |
DE (1) | DE69424393T2 (ko) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5833759A (en) * | 1996-11-08 | 1998-11-10 | W. L. Gore & Associates, Inc. | Method for preparing vias for subsequent metallization |
US5910255A (en) * | 1996-11-08 | 1999-06-08 | W. L. Gore & Associates, Inc. | Method of sequential laser processing to efficiently manufacture modules requiring large volumetric density material removal for micro-via formation |
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US5302547A (en) * | 1993-02-08 | 1994-04-12 | General Electric Company | Systems for patterning dielectrics by laser ablation |
-
1994
- 1994-12-27 EP EP94120674A patent/EP0661734B1/en not_active Expired - Lifetime
- 1994-12-27 US US08/364,451 patent/US5628926A/en not_active Expired - Fee Related
- 1994-12-27 DE DE69424393T patent/DE69424393T2/de not_active Expired - Fee Related
- 1994-12-28 KR KR94040716A patent/KR0139708B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0661734B1 (en) | 2000-05-10 |
DE69424393D1 (de) | 2000-06-15 |
US5628926A (en) | 1997-05-13 |
KR0139708B1 (en) | 1998-07-01 |
EP0661734A3 (en) | 1996-11-06 |
EP0661734A2 (en) | 1995-07-05 |
DE69424393T2 (de) | 2001-02-15 |
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