KR960025321U - 반도체 웨이퍼 세척장치 - Google Patents

반도체 웨이퍼 세척장치

Info

Publication number
KR960025321U
KR960025321U KR2019940034384U KR19940034384U KR960025321U KR 960025321 U KR960025321 U KR 960025321U KR 2019940034384 U KR2019940034384 U KR 2019940034384U KR 19940034384 U KR19940034384 U KR 19940034384U KR 960025321 U KR960025321 U KR 960025321U
Authority
KR
South Korea
Prior art keywords
cleaning device
semiconductor wafer
wafer cleaning
semiconductor
wafer
Prior art date
Application number
KR2019940034384U
Other languages
English (en)
Other versions
KR0119270Y1 (ko
Inventor
정호기
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940034384U priority Critical patent/KR0119270Y1/ko
Publication of KR960025321U publication Critical patent/KR960025321U/ko
Application granted granted Critical
Publication of KR0119270Y1 publication Critical patent/KR0119270Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR2019940034384U 1994-12-16 1994-12-16 반도체 웨이퍼 세척장치 KR0119270Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940034384U KR0119270Y1 (ko) 1994-12-16 1994-12-16 반도체 웨이퍼 세척장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940034384U KR0119270Y1 (ko) 1994-12-16 1994-12-16 반도체 웨이퍼 세척장치

Publications (2)

Publication Number Publication Date
KR960025321U true KR960025321U (ko) 1996-07-22
KR0119270Y1 KR0119270Y1 (ko) 1998-08-01

Family

ID=19401647

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940034384U KR0119270Y1 (ko) 1994-12-16 1994-12-16 반도체 웨이퍼 세척장치

Country Status (1)

Country Link
KR (1) KR0119270Y1 (ko)

Also Published As

Publication number Publication date
KR0119270Y1 (ko) 1998-08-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
O032 Opposition [utility model]: request for opposition
O131 Decision on opposition [utility model]
O072 Maintenance of registration after opposition [utility model]: final registration of opposition
LAPS Lapse due to unpaid annual fee