KR960008997A - 패턴 형성방법 및 이 방법을 이용한 반도체 디바이스 제조방법 - Google Patents

패턴 형성방법 및 이 방법을 이용한 반도체 디바이스 제조방법

Info

Publication number
KR960008997A
KR960008997A KR1019950026459A KR19950026459A KR960008997A KR 960008997 A KR960008997 A KR 960008997A KR 1019950026459 A KR1019950026459 A KR 1019950026459A KR 19950026459 A KR19950026459 A KR 19950026459A KR 960008997 A KR960008997 A KR 960008997A
Authority
KR
South Korea
Prior art keywords
semiconductor device
pattern forming
device manufacturing
forming method
pattern
Prior art date
Application number
KR1019950026459A
Other languages
English (en)
Other versions
KR100377206B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR960008997A publication Critical patent/KR960008997A/ko
Application granted granted Critical
Publication of KR100377206B1 publication Critical patent/KR100377206B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70125—Use of illumination settings tailored to particular mask patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950026459A 1994-08-26 1995-08-24 패턴형성방법및이방법을이용한반도체디바이스제조방법 KR100377206B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-202619 1994-08-26
JP20261994 1994-08-26

Publications (2)

Publication Number Publication Date
KR960008997A true KR960008997A (ko) 1996-03-22
KR100377206B1 KR100377206B1 (ko) 2003-06-09

Family

ID=16460381

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950026459A KR100377206B1 (ko) 1994-08-26 1995-08-24 패턴형성방법및이방법을이용한반도체디바이스제조방법

Country Status (4)

Country Link
EP (1) EP0698824B1 (ko)
KR (1) KR100377206B1 (ko)
DE (1) DE69519143T2 (ko)
SG (2) SG48693A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122478A (ja) * 1993-10-27 1995-05-12 Sony Corp パターン投影方法
KR20000016498A (ko) * 1996-06-10 2000-03-25 다니엘 제이. 설리반 생산환경을 위한 홀로그래픽 패터닝방법 및 공구
US6930754B1 (en) 1998-06-30 2005-08-16 Canon Kabushiki Kaisha Multiple exposure method
WO2005015314A2 (en) * 2003-07-30 2005-02-17 Carl Zeiss Smt Ag An illumination system for microlithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02138491A (ja) 1988-11-15 1990-05-28 Dowa Mining Co Ltd 微細電解銅粉末の製造方法
JP3245882B2 (ja) * 1990-10-24 2002-01-15 株式会社日立製作所 パターン形成方法、および投影露光装置
JP3102076B2 (ja) * 1991-08-09 2000-10-23 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
DE4303028C2 (de) 1992-02-03 1997-08-14 Hitachi Ltd Projektionsbelichtungsgerät
US5309198A (en) * 1992-02-25 1994-05-03 Nikon Corporation Light exposure system
DE69418131D1 (de) * 1993-03-01 1999-06-02 Gen Signal Corp Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat
JPH07122478A (ja) * 1993-10-27 1995-05-12 Sony Corp パターン投影方法

Also Published As

Publication number Publication date
EP0698824A3 (en) 1996-03-06
SG48693A1 (en) 1998-05-18
EP0698824A2 (en) 1996-02-28
DE69519143T2 (de) 2001-04-05
DE69519143D1 (de) 2000-11-23
KR100377206B1 (ko) 2003-06-09
SG67481A1 (en) 1999-09-21
EP0698824B1 (en) 2000-10-18

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20110302

Year of fee payment: 9

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