KR960005747A - 개선된 지지 포스트를 구비한 미소-기계 장치 및 그 제조 방법과, 디지탈 미소-미러 장치 - Google Patents
개선된 지지 포스트를 구비한 미소-기계 장치 및 그 제조 방법과, 디지탈 미소-미러 장치 Download PDFInfo
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- KR960005747A KR960005747A KR1019950022444A KR19950022444A KR960005747A KR 960005747 A KR960005747 A KR 960005747A KR 1019950022444 A KR1019950022444 A KR 1019950022444A KR 19950022444 A KR19950022444 A KR 19950022444A KR 960005747 A KR960005747 A KR 960005747A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
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Abstract
본 발명의 목적은 미소-기계 장치(10)에 대해 개선된 지지 포스트(16,23,25)를 제공하는데 있다. 지지 포스트(16)의 외면을 한정하는 비어(34a)는 스페이서 층(34)내에서 에칭된다. 산화물 층(41)을 스페이서 층(34)상과 비어(34a)내에 정합적으로 침착시킨 후 스페이서 층(34)의 상부면까지 에치백하여 비어(34a)의 내면 상에 측벽 링(23a)을 남겨 놓는다. 다음에, 측벽링(23a)을 피복하기 위해 스페이서 층(34) 상과 비어(34a)내에 금속 층(61)을 침착시킨다. 다음에 이 금속 층(61)을 비어(34a)내에 지지 포스트 스템(23)이 형성되도록 에칭시킨다. 스페이서 층(34)이 제거되어 지지 포스트 스템(23)이 이 스템(23) 주변의 측벽 링(23a)이 남겨진다.
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본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1 및 제2도는 본 발명에 따라 제조된 디지탈 미소-미러 장치(DMD)의 도면이다.
Claims (20)
- 기계 소자용 지지 포스트들을 갖는 형의 개선된 미소-기계 장치에 있어서, 지지 포스트 스템과, 상기 스템의 외주면 둘레에 측벽링을 갖고 있는 포스트를 포함하며, 상기 스템은 나중에 제거될 스페이서 층에 있는 비어 내에 스템 물질을 침착시켜 형성되며, 상기 측벽 링은 상기 스템 물질의 침착 전에 상기 스페이서층상과 상기 비어 내에 산화물 층을 침착시키고 상기 산화물 층을 에칭 백 시킴으로써 형성되어지는 것을 특징으로 하는 개선된 미소-기계 장치.
- 제1항에 있어서, 상기 측벽 링은 상기 스템의 내면을 피복시키고, 상기 스템 물질을 침착 후에 상기 산화물 층을 침착시킴으로써 형성되어지는 것을 특징으로 하는 장치.
- 제1항에 있어서, 상기 스템은 상기 비어 내에 침착되어진 상기 스템 물질의 두 층으로 형성되며, 상기 측벽링은 상기 두 층 사이에 위치하는 것을 특징으로 하는 개선된 미소-기계 장치.
- 제1항에 있어서, 상기 지지 포스트의 내부 프로필은 상기 비어의 상부 엣지에서 원형으로 되어 있는 것을 특징으로 하는 개선된 미소-기계 장치.
- 제1항에 있어서, 상기 지지 포스트의 내부 프로필은 약간 볼록한 형태인 것을 특징으로 하는 개선된 미소-기계 장치.
- 제1항에 있어서, 상기 지지 포스트의 내부 프로필은 하부에서 90° 이상의 각을 갖는 것을 특징으로 하는 개선된 미소-기계 장치.
- 미소-기계 장치용 지지 포스트를 제조하는 개선된 방법에 있어서, 기판 상에 스페이서 층을 침착시키는 단계와, 지지 포스트의 외면을 각각 한정하고 있는 상기 스페이서 층 내의 비어들을 에칭하는 단계와, 상기스페이서 층상과 상기 비어들 내에, 상기 비어들의 내면과 거의 정합으로 피복되도록 산화물 층을 침착시키는 단계와, 상기 산화물 층을 상기 스페이서 층의 상부면까지 에칭백하는 단계로서, 상기 산화물 층에서 남아있는 측벽 링이 각 비어의 내면을 피복하게 되는 단계와, 상기 스페이서 층 상에, 상기 측벽 링의 내면을 피복하도록 포스트 금속 층을 침착시키는 단계와, 상기 지지 포스트가 형성되도록 상기 포스트 금속 층을 에칭하는 단계를 포함하는 것을 특징으로 하는 지지 포스트 제조 방법.
- 제7항에 있어서, 상기 산화물 층의 침착 단계는 실온에서 행해지는 것을 특징으로 하는 지지 포스트 제조 방법.
- 제7항에 있어서, 상기 산화물 층의 침착 단계는 실온과 120℃의 온도 사이에서 행해지는 것을 특징으로 하는 지지 포스트 제조 방법.
- 제7항에 있어서, 상기 산화물 층의 침착 단계는 플루오로트리에톡시시레인 원에 의해 산화물을 침착시켜 행해지는 것을 특징으로 하는 지지 포스트 제조 방법.
- 제7항에 있어서, 상기 침착 단계는 테트라메틸 실록산(TMDS)원에 의해 산화물을 침착시켜 행해지는 것을 특징으로 하는 지지 포스트 제조 방법.
- 제7항에 있어서, 상기 에칭 백 단계는 이방성 에칭으로 행해지는 것을 특징으로 하는 지지 포스트 제조 방법.
- 제7항에 있어서, 상기 포스트 금속 층의 침착 단계는 스퍼터링에 의해 행해지는 것을 특징으로 하는 지지 포스트 제조 방법.
- 디지탈 미소-미러 장치에 있어서, 적어도 하나의 어드레스 전극, 지지 포스트, 상기 지지 포스트로부터 연장하는 힌지 및, 상기 힌지에 부착된 미러가 제조되어지는 기판을 포함하고 있으며, 상기 힌지는 인가된 힘을 받을시에 상기 미러를 틸트시틸 정도로 변형되어지며, 상기 지지 포스트는 나중에 제거될 스페이서 층내에서 에칭되어지는 비어에 물질을 침착시켜 형성되어지는 스템과 측벽 링으로 형성되어 지는 것을 특징으로 하는 디지탈 미소-미러 장치.
- 제14항에 있어서, 상기 측벽 링은 상기 지지 포스트의 외면에 위치해 있는 것을 특징으로 하는 디지탈 미소-미러 장치.
- 제14항에 있어서, 상기 측벽 링은 상기 스템으로 둘러싸여지는 상기 지지 포스트의 내면에 위치해 있는 것을 특징으로 하는 디지탈 미소-미러 장치.
- 제14항에 있어서, 상기 측벽 링은 산화물로 형성되어지는 것을 특징으로 하는 디지탈 미소-미러 장치.
- 제14항에 있어서, 상기 지지 포스트의 내부 프로필은 상기 비어의 상부 엣지에서 원형으로 되어 있는 것을 특징으로 하는 디지탈 미소-미러 장치.
- 제14항에 있어서, 상기 지지 포스트의 내부 프로필은 약간 볼록하게 되어 있는 것을 특징으로 하는 디지탈 미소-미러 장치.
- 제14항에 있어서, 상기 지지 포스트의 내부 프로필은 하부에서 90°이상의 각을 갖는 것을 특징으로 하는 디지탈 미소-미러 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/283,486 US5485304A (en) | 1994-07-29 | 1994-07-29 | Support posts for micro-mechanical devices |
US08/283,486 | 1994-07-29 |
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KR960005747A true KR960005747A (ko) | 1996-02-23 |
KR100413014B1 KR100413014B1 (ko) | 2004-03-25 |
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KR1019950022444A KR100413014B1 (ko) | 1994-07-29 | 1995-07-27 | 개선된지지포스트를구비한마이크로기계장치및그제조방법과,디지털마이크로미러장치 |
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US (3) | US5485304A (ko) |
EP (1) | EP0694801B1 (ko) |
JP (1) | JP3790285B2 (ko) |
KR (1) | KR100413014B1 (ko) |
DE (1) | DE69508160T2 (ko) |
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US4710732A (en) * | 1984-07-31 | 1987-12-01 | Texas Instruments Incorporated | Spatial light modulator and method |
US5061049A (en) | 1984-08-31 | 1991-10-29 | Texas Instruments Incorporated | Spatial light modulator and method |
US4662746A (en) | 1985-10-30 | 1987-05-05 | Texas Instruments Incorporated | Spatial light modulator and method |
US4793699A (en) * | 1985-04-19 | 1988-12-27 | Canon Kabushiki Kaisha | Projection apparatus provided with an electro-mechanical transducer element |
US4956610A (en) | 1988-02-12 | 1990-09-11 | Pgm Diversified Industries, Inc. | Current density measurement system by self-sustaining magnetic oscillation |
US5083857A (en) * | 1990-06-29 | 1992-01-28 | Texas Instruments Incorporated | Multi-level deformable mirror device |
US5202785A (en) * | 1991-12-20 | 1993-04-13 | Texas Instruments Incorporated | Method and device for steering light |
CA2085961A1 (en) * | 1991-12-23 | 1993-06-24 | William E. Nelson | Method and apparatus for steering light |
US5289172A (en) * | 1992-10-23 | 1994-02-22 | Texas Instruments Incorporated | Method of mitigating the effects of a defective electromechanical pixel |
JPH06260470A (ja) * | 1992-12-16 | 1994-09-16 | Texas Instr Inc <Ti> | パターンに作成された金属層の清浄化法 |
-
1994
- 1994-07-29 US US08/283,486 patent/US5485304A/en not_active Expired - Lifetime
-
1995
- 1995-06-07 US US08/476,959 patent/US5646768A/en not_active Expired - Lifetime
- 1995-06-07 US US08/476,961 patent/US5497262A/en not_active Expired - Lifetime
- 1995-07-25 DE DE69508160T patent/DE69508160T2/de not_active Expired - Lifetime
- 1995-07-25 EP EP95111689A patent/EP0694801B1/en not_active Expired - Lifetime
- 1995-07-27 KR KR1019950022444A patent/KR100413014B1/ko not_active IP Right Cessation
- 1995-07-28 JP JP19269095A patent/JP3790285B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100413014B1 (ko) | 2004-03-25 |
US5646768A (en) | 1997-07-08 |
US5485304A (en) | 1996-01-16 |
US5497262A (en) | 1996-03-05 |
EP0694801A2 (en) | 1996-01-31 |
JP3790285B2 (ja) | 2006-06-28 |
EP0694801B1 (en) | 1999-03-10 |
JPH0862518A (ja) | 1996-03-08 |
DE69508160D1 (de) | 1999-04-15 |
EP0694801A3 (en) | 1996-04-24 |
DE69508160T2 (de) | 1999-08-12 |
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