KR950018649A - 고속 디 엔드 아이 가공성이 우수한 2피스캔용 주석-알루미늄/알루미늄 이종도금강판 및 그 제조방법 - Google Patents

고속 디 엔드 아이 가공성이 우수한 2피스캔용 주석-알루미늄/알루미늄 이종도금강판 및 그 제조방법 Download PDF

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KR950018649A
KR950018649A KR1019930031359A KR930031359A KR950018649A KR 950018649 A KR950018649 A KR 950018649A KR 1019930031359 A KR1019930031359 A KR 1019930031359A KR 930031359 A KR930031359 A KR 930031359A KR 950018649 A KR950018649 A KR 950018649A
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South Korea
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aluminum
tin
steel sheet
plated
plated steel
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KR1019930031359A
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KR960009196B1 (ko
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강창진
전재호
신정철
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백덕현
한국신철강기술연구조합
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C13/00—Alloys based on tin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

본 발명은 주석-알루미늄 합금을 강판의 한쪽면에 도금시키고 강판의 다른면에는 알루미늄을 도금하여 주석사용량을 줄이고 고속제관가공이 용이하도록 한 D＆I 캔용 주석-알루미늄/알루미늄 이종도금강판과 그 제조방법에 관한 것으로, 2피스캔의 D＆I 가공공정에서의 금형과의 접촉되는 도금면은 주석-알루미늄 합금을 도금하여 고체윤활 역할을 부여하고 펀치와 접촉되는 도금면은 펀치와 접촉마찰력이 큰 알루미늄 도금층으로하여 고가인 주석사용량을 줄이고 고속제관작업을 용이하게 하는 것이 본 발명의 특징이다.
이와 같은 주석-알루미늄 합금도금층은 고체윤활 효과가 주석도금층과 비슷할 뿐만아니라 알루미늄의 열전달 특성이 뛰어나 주석-알루미늄 합금도금층의 고속 가공에 도금층의 융착 및 탈락현상을 주석도금층보다 줄일 수 있다.

Description

고속 디 엔드 아이 가공성이 우수한 2피스캔용 주석-알루미늄/알루미늄 이종도금강판 및 그 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. 디 엔드 아이(D＆I)캔용 진공증착 이종도금강판에 있어서, 일면에는 부착량 0.54-5.40g/㎡의 알루미늄 도금층이, 다른 일면에는 부착량 1.5-10g/㎡이고 주석함량 40-95wt%의 주석-알루미늄 합금 도금층이 증착된 디 엔드 아이 캔용 주석-알루미늄/알루미늄 이종도금강판.
  2. 제1항에 있어서, 알루미늄도금층의 부착량이 1.5-2.7g/㎡이고, 주석-알루미늄 합금 도금층이 주석함량 60-70wt%이고, 부착량이 2.4-3.0g/㎡인 디 엔드 아이 캔용 주석-알루미늄/알루미늄 이종도금강판.
  3. 디 엔드 아이(D＆I)캔용 진공증착 이종도금강판의 제조방법에 있어서, 진공조내 2개의 증발원에 알루미늄과 주석함량 40-95wt%의 알루미늄과 주석의 혼합물을 각각 채우고, 강판의 일면에 기판온도 200-350℃에서 부착량 0.54-5.4g/㎡의 알루미늄을 증착시킨 다음 강판의 다른 일면에 기판온도 50-200℃에서 부착량 1.5-10g/㎡이고 주석함량 40-95wt%의 주석-알루미늄 합금도금층을 증착시키는 디 엔드 아이 캔용 주석-알루미늄/알루미늄 이종도금강판의 제조방법.
  4. 제3항에 있어서, 알루미늄 증착시 기판온도 250-350℃에서 알루미늄 도금층을 1.5-2.7g/㎡ 증착시키고 주석-알루미늄 증착시 기판온도 100-150℃에서 주석함량 60-70wt%의 주석-알루미늄 합금 도금층을 2.4-3.0g/㎡ 증착시키는 디 엔드 아이 캔용 주석-알루미늄/알루미늄 이종도금강판의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930031359A 1993-12-30 1993-12-30 고속 디 엔드 아이 가공성이 우수한 2피스캔용 주석-알루미늄/알루미늄 이종도금강판 및 그 제조방법 KR960009196B1 (ko)

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Application Number Priority Date Filing Date Title
KR1019930031359A KR960009196B1 (ko) 1993-12-30 1993-12-30 고속 디 엔드 아이 가공성이 우수한 2피스캔용 주석-알루미늄/알루미늄 이종도금강판 및 그 제조방법

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Application Number Priority Date Filing Date Title
KR1019930031359A KR960009196B1 (ko) 1993-12-30 1993-12-30 고속 디 엔드 아이 가공성이 우수한 2피스캔용 주석-알루미늄/알루미늄 이종도금강판 및 그 제조방법

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KR960009196B1 KR960009196B1 (ko) 1996-07-16

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