KR950014374A - Manufacturing method of full color thin film - Google Patents

Manufacturing method of full color thin film Download PDF

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Publication number
KR950014374A
KR950014374A KR1019930023958A KR930023958A KR950014374A KR 950014374 A KR950014374 A KR 950014374A KR 1019930023958 A KR1019930023958 A KR 1019930023958A KR 930023958 A KR930023958 A KR 930023958A KR 950014374 A KR950014374 A KR 950014374A
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KR
South Korea
Prior art keywords
metal wire
thin film
metal
manufacturing
substrate
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Application number
KR1019930023958A
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Korean (ko)
Other versions
KR960004270B1 (en
Inventor
정재인
이영백
Original Assignee
조말수
포항종합제철 주식회사
백덕현
재단법인산업과학기술연구소
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Priority to KR1019930023958A priority Critical patent/KR960004270B1/en
Publication of KR950014374A publication Critical patent/KR950014374A/en
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Publication of KR960004270B1 publication Critical patent/KR960004270B1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0068—Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

본 발명은 유리 또는 플라스틱과 같은 투명한 물질에 코팅되어 전류를 통과시킴으로서 색깔이 가역적으로 변화되는 전색 박막을 제조하는 방법에 관한 것으로서, 증발물질로서 산화물이 아닌 금속선을 이용하여 증착시킴으로써 제조공정이 간단하고 별도의 열처리공정을 필요로 하지 않고도 화학양론에 맞는 전색박막을 제조하고자 하는데, 그 목적이 있다.The present invention relates to a method for manufacturing a full-color thin film that is coated on a transparent material such as glass or plastic to pass a current, the color is reversibly changed by the deposition using a metal wire rather than an oxide as an evaporation material, The purpose of the present invention is to manufacture a thin film suited to the stoichiometry without the need for a separate heat treatment process.

본 발명은 유리 또는 플라스틱과 같은 투명한 물질에 코팅되어 전류인가 여부에 따라 색깔이 가역적을 변화되는 전색 박막을 제조함에 있어서, 증발물질로 금속선을 이용하된 금속선을 일정한 온도로 유지하고, 산화물 박막을 위해 산소개스를 주입하며, 금속선에 음의 바이오스전압을 인가하였으며, 개스 및 증발물의 이온화를 위한 이온화전극이 설치되어 별도의 열처리 공정을 거치지 않고도 원하는 화학양론에 가까운 전이금속 산화물 전색 박막의 제조방법을 그 요지로 한다.The present invention is to produce a full-color thin film coated with a transparent material such as glass or plastic to change the reversible color depending on whether the current, to maintain the metal wire using a metal wire as an evaporation material at a constant temperature, for the oxide thin film Oxygen gas is injected, a negative bios voltage is applied to the metal wire, and an ionization electrode for ionization of gas and evaporate is installed, and thus a method of manufacturing a transition metal oxide thin film close to a desired stoichiometry without undergoing a separate heat treatment process is proposed. Make a point.

Description

전색박막의 제조방법Manufacturing method of full color thin film

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도 : 본 발명이 적절하게 적용될 수 있는 증착장치의 개략도1 is a schematic diagram of a deposition apparatus to which the present invention can be suitably applied.

제2도 : 본 발명의 방법으로 제조한 산화텅스텐 박막의 액스선 광전자 스펙트럼FIG. 2: Axon Photoelectron Spectrum of a Tungsten Oxide Thin Film Prepared by the Method of the Present Invention

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

1 : 진공실 2 : 금속선1: vacuum chamber 2: metal wire

3 : 이온화전극 4 : 셔터3: ionization electrode 4: shutter

5 : 기판 6 : 기판홀더 및 가열장치5: substrate 6: substrate holder and heating device

7 : 금속선가열용 전원 8 : 금속선 바이어스용 전원7 power supply for metal wire heating 8 power supply for metal wire bias

9 : 이온화전극용 전원 10 : 개스도입구9: power supply for ionization electrode 10: gas inlet

Claims (2)

전색박막을 제조하는 방법에 있어서, 진공실 하부에 전이금속의 금속선과 이온화전극을 서로 마주보는 위치에 설치하고 상부에 기판을 장착하는 단계 ; 상기 전공실내의 진공도가 10-5토르 이하기 되도록 배기하는 단계 ; 진공도가 10-5토르에 도달하면 기판을 예비가열시키는 단계 ; 기판의 예비가열후 셔터가 닫힌 상태에서 금속선을 예열시키는 단계 ; 금속선의 예열후 순수산소 함유개스를 진공실내에 주입시키면서 이온화전극에 전압을 인가하는 단계 ; 이온화전극에 적절한 전압이 인가되면 금속선에 가해지는 전력을 서서히 증발시켜 산소개스를 이온화시키는 단계 ; 금속선에 가해지는 전력을 증발전력까지 증가시킴과 동시에 금속선에 바이어스 전압을 인가하여 금속선을 증발시키는 단계 ; 기판에 바이어스 전압을 인가하는 단계 ; 및 셔터를 열어 기판에 금속산화물을 증착시키는 단계를 포함하여 구성됨을 특징으로 하는 전색박막의 제조방법.Claims [1] A method of manufacturing an all-color thin film, the method comprising: installing a metal line of an transition metal and an ionization electrode in a position facing each other in a lower part of a vacuum chamber, and mounting a substrate on an upper portion thereof; Exhausting the vacuum in the major chamber to be 10 −5 Torr or less; Preheating the substrate when the degree of vacuum reaches 10 -5 Torr; Preheating the metal wire with the shutter closed after preheating the substrate; Applying a voltage to the ionization electrode while injecting pure oxygen-containing gas into the vacuum chamber after preheating the metal wire; Ionizing the oxygen gas by slowly evaporating the power applied to the metal wire when an appropriate voltage is applied to the ionization electrode; Increasing the power applied to the metal line to the evaporation power and simultaneously applying a bias voltage to the metal line to evaporate the metal line; Applying a bias voltage to the substrate; And depositing a metal oxide on the substrate by opening the shutter. 제1항에 있어서, 산소개스분압이 1∼10×10-4토르이고, 금속선의 온도가 금속선 물질 융점의 70∼90%되는 온도이고, 금속선에 가해지는 바이어스 전압이 100-300V이고, 그리고 이온화전극의 전압이 40∼100V인 것을 특징으로 하는 전색박막의 제조방법.The oxygen gas partial pressure is 1 to 10 x 10 -4 Torr, the temperature of the metal wire is 70 to 90% of the melting point of the metal wire material, the bias voltage applied to the metal wire is 100 to 300 V, and ionization. The voltage of the electrode is 40 to 100V, characterized in that the manufacturing method of the full-color thin film. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019930023958A 1993-11-11 1993-11-11 Method for making a electrochromic thin film KR960004270B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019930023958A KR960004270B1 (en) 1993-11-11 1993-11-11 Method for making a electrochromic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930023958A KR960004270B1 (en) 1993-11-11 1993-11-11 Method for making a electrochromic thin film

Publications (2)

Publication Number Publication Date
KR950014374A true KR950014374A (en) 1995-06-16
KR960004270B1 KR960004270B1 (en) 1996-03-30

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