KR950012505A - 기구부품 및 이 부품에 막을 형성하는 방법 - Google Patents

기구부품 및 이 부품에 막을 형성하는 방법 Download PDF

Info

Publication number
KR950012505A
KR950012505A KR1019940024926A KR19940024926A KR950012505A KR 950012505 A KR950012505 A KR 950012505A KR 1019940024926 A KR1019940024926 A KR 1019940024926A KR 19940024926 A KR19940024926 A KR 19940024926A KR 950012505 A KR950012505 A KR 950012505A
Authority
KR
South Korea
Prior art keywords
lower layer
forming
contact
plating process
mechanical
Prior art date
Application number
KR1019940024926A
Other languages
English (en)
Inventor
히사지 시노하라
소이치 오흐테
타다오 키타무라
토시오 코바야시
Original Assignee
나까사도 요시히꼬
후지덴끼 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나까사도 요시히꼬, 후지덴끼 가부시기가이샤 filed Critical 나까사도 요시히꼬
Publication of KR950012505A publication Critical patent/KR950012505A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H31/00—Air-break switches for high tension without arc-extinguishing or arc-preventing means
    • H01H31/02—Details
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Contacts (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacture Of Switches (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

1. 청구범위에 기재된 발명이 속한 기술분야
기구부품에 대한 무전해도금 및 열처리 기술
2. 발명이 해결하려고 하는 기술적 과제
접촉영역에 높은 표면압력을 장기간 받아도 균열 및 이에따른 녹이 발생하지 않으면서도 그 제조공정이 간단한 기구부품 및 그 부품에 세라믹막을 형성하는 방법을 제공하는 것.
3. 발명의 해결방법의 요지
본 발명의 목적을 달성하기 위한 기구부품은 상호 기계적으로 접촉하여 상대적으로 회전하거나 상대적으로 미끄럼접촉을 행하는 기구부품으로서, 이 기구부품들 중 하나 이상의 접촉면에는 무전해 니켈도금공정으로 형성된 하부층과, 이 하부층 위에 형성된 세라믹막이 형성된 것을 그 구성적 특징으로 한다.
4. 발명의 중요한 용도
진공차단기의 작동기구와 같은 전기장치의 기구부품으로서 사용된다.

Description

기구부품 및 이 부품에 막을 형성하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명이 적용되는 진공차단기의 작동기구를 도시하는 측면도.
제2도는 제2도의 요부확대도.
제3도는 본 발명에 따른 기구부품의 요부확대도.

Claims (9)

  1. 상호 기계적으로 접촉하여 상대적으로 회전하거나 상대적으로 미끄럼접촉을 행하는 기구부품에 있어서, 상기 기구부품들중 하나 이상의 접촉면에는 무전해 니켈도금공정으로 형성된 하부층과, 상기 하부층 위에 형성된 세라믹막이 형성된 것을 특징으로 하는 기구부품.
  2. 제1항에 있어서, 상기 하부층은 Ni-P도금으로 형성되는 것을 특징으로 하는 기구부품.
  3. 제1항에 있어서, 상기 하부층은 Ni-P도금으로 형성되는 것을 특징으로 하는 기구부품.
  4. 제1항에 있어서, 상기 하부층은 600℃ 이하, 바람직하게는 약 400℃의 오노에서 열처리가 되는 것을 특징으로 하는 기구부품.
  5. 상호 기계적으로 접촉하여 상대적으로 회전하거나 상대적으로 미끄럼접촉하는 기구부품 상에 막을 형성하는 막형성방법에 있어서, 무전해니켈도금공정에 의해 상기 기구부품의 접촉면에 하부층을 형성하는 단계와 600℃이하, 바람직하게는 약 400℃의 온도에서 기상성장법공정에 의해 상기 하부층에 세라믹막을 형성하는 단계를 구비하는 것을 특징으로 하는 막형성방법.
  6. 제5항에 있어서, 상기 하부층을 형성하는 상기 무전해니켈도금공정은 무전해 Ni-P도금공정인 것을 특징으로 하는 막형성방법.
  7. 제5항에 있어서, 상기 하부층을 형성하는 상기 무전해니켈도금공정은 Ni-B도금공정인 것을 특징으로 하는 막형성방법.
  8. 제5항에 있어서, 상기 세라믹층을 형성하는 상기 기상성장법의 공정은 물리적 기상성장법의 공정인 것을 특징으로 하는 막형성방법.
  9. 제5항에 있어서, 상기 세라믹층을 형성하는 상기 기상성장법의 공정은 플라즈마 화학적 기상성장법의 공정인 것을 특징으로 하는 막형성방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940024926A 1993-10-01 1994-09-30 기구부품 및 이 부품에 막을 형성하는 방법 KR950012505A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-245838 1993-10-01
JP5245838A JPH07102387A (ja) 1993-10-01 1993-10-01 機構部品およびその皮膜形成方法

Publications (1)

Publication Number Publication Date
KR950012505A true KR950012505A (ko) 1995-05-16

Family

ID=17139608

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940024926A KR950012505A (ko) 1993-10-01 1994-09-30 기구부품 및 이 부품에 막을 형성하는 방법

Country Status (4)

Country Link
JP (1) JPH07102387A (ko)
KR (1) KR950012505A (ko)
CN (1) CN1101383A (ko)
DE (1) DE4434302C2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6444083B1 (en) * 1999-06-30 2002-09-03 Lam Research Corporation Corrosion resistant component of semiconductor processing equipment and method of manufacturing thereof
JP2007157940A (ja) * 2005-12-02 2007-06-21 Nichia Chem Ind Ltd 発光装置および発光装置の製造方法
DE102008045381A1 (de) * 2008-09-02 2010-03-04 Schaeffler Kg Verschleiß- und korrosionshemmender Schichtverbund
CN101962760B (zh) * 2010-10-20 2012-08-01 北京科技大学 一种氮化铝陶瓷表面化学镀镍的方法
CN105714292B (zh) * 2016-04-14 2018-08-14 温州兰理工科技园有限公司 一种硬密封球阀密封副的表面硬化处理方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1542856A (en) * 1975-11-14 1979-03-28 Fulmer Res Inst Ltd Coated die and a method for the production thereof
CH639598A5 (de) * 1979-05-04 1983-11-30 Sulzer Ag Mit einer verschleiss- und korrosionsfesten wolframkarbid-schutzschicht versehener metallteil.
DE3116801C2 (de) * 1981-04-28 1985-01-24 Rosenthal Technik Ag, 8672 Selb Ventilscheibe
IT1182433B (it) * 1985-02-12 1987-10-05 Gevipi Ag Organi di tenuta in materiale duro aventi basso coefficiente di attrito
DE3509572C1 (de) * 1985-03-16 1986-07-10 Feldmühle AG, 4000 Düsseldorf Mit keramischen Werkstoffkomponenten beschichtetes Gleitelement und seine Verwendung
US4902535A (en) * 1987-12-31 1990-02-20 Air Products And Chemicals, Inc. Method for depositing hard coatings on titanium or titanium alloys
DE3829007A1 (de) * 1988-08-26 1990-03-01 Multi Arc Gmbh Verfahren zur plasmabeschichtung von gegenstaenden mit einem hartstoff
DE3832692A1 (de) * 1988-09-27 1990-03-29 Leybold Ag Dichtungselement mit einem absperrkoerper aus einem metallischen oder nichtmetallischen werkstoff und verfahren zum auftragen von hartstoffschichten auf den absperrkoerper
DE3837306C2 (de) * 1988-09-27 2002-05-16 Knut Enke Kolben und Kolbenstange für einen Schwingungsdämpfer in Kraftfahrzeugen
JP3017816B2 (ja) * 1991-02-20 2000-03-13 清原 まさ子 流体制御器

Also Published As

Publication number Publication date
JPH07102387A (ja) 1995-04-18
CN1101383A (zh) 1995-04-12
DE4434302A1 (de) 1995-04-13
DE4434302C2 (de) 1997-02-06

Similar Documents

Publication Publication Date Title
KR920000113A (ko) 수소화 알킬알루미늄을 사용함에 의한 주성분으로 알루미늄을 함유하는 금속 퇴적막의 형성방법
TW367602B (en) Manufacturing method for semiconductor apparatus
KR930018657A (ko) 반도체 소자의 제조방법
KR970063568A (ko) 낮은 유전상수 비정질 플루오르 카본막과 그 준비 방법
KR20040068462A (ko) 중합체 기지상에 베리어코팅을 증착하는 방법 및 그베리어코팅을 포함하는 조성물
KR900010952A (ko) 디바이스 제조 공정
ATE133249T1 (de) Aufdampf-heizvorrichtung
KR960026642A (ko) 반도체 집적회로의 제조방법 및 제조장치
KR950012505A (ko) 기구부품 및 이 부품에 막을 형성하는 방법
KR960034479A (ko) 산화물박막의 제조방법 및 그것에 사용되는 화학증착장치
FR2633642B1 (fr) Procede de realisation d'un film protecteur sur un substrat a base de magnesium, application a la protection des alliages de magnesium, substrats obtenus
KR840004938A (ko) 탄소섬유용 전구체 핏치 제조방법
KR960019505A (ko) 플라즈마에 의한 SOG(Spin-On Glass) 경화(Curing) 방법
Li et al. Systematic low temperature silicon bonding using pressure and temperature
WO2002021593A3 (en) Method of forming titanium nitride (tin) films using metal-organic chemical vapor deposition (mocvd)
US3211583A (en) Pyrolytic deposition of germanium
KR890011056A (ko) 반도체 장치의 제조방법
Masoero et al. 2.28 Current noise in W2O5− x films due to surface adsorption of water
Kim et al. Adhesion enhancement of electroless-deposited Cu on flexible polyimide substrate treated by O2 and N2/H2 inductively coupled plasmas
KR930008965A (ko) 다층의 게이트 산화막 제조방법
KR960026395A (ko) 반도체 소자의 도전층 형성방법
Kohno et al. Copper cladding on polymer surfaces by ionization-assisted deposition
KR900013587A (ko) 고융점금속 규화물박막을 가진 반도체장치의 제조방법
KR870009448A (ko) 박막형성방법
KR950021115A (ko) 반도체 소자의 전도막 형성방법

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application