KR950009958A - Board Cleaning Device - Google Patents

Board Cleaning Device Download PDF

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Publication number
KR950009958A
KR950009958A KR1019940020527A KR19940020527A KR950009958A KR 950009958 A KR950009958 A KR 950009958A KR 1019940020527 A KR1019940020527 A KR 1019940020527A KR 19940020527 A KR19940020527 A KR 19940020527A KR 950009958 A KR950009958 A KR 950009958A
Authority
KR
South Korea
Prior art keywords
disk brush
substrate
cleaning apparatus
brush
hollow shaft
Prior art date
Application number
KR1019940020527A
Other languages
Korean (ko)
Other versions
KR100299333B1 (en
Inventor
히로츠구 쿠마자와
후토시 시마이
히로요시 사고
시게미 후지야마
Original Assignee
나카네 히사시
도쿄 오카 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나카네 히사시, 도쿄 오카 고교 가부시키가이샤 filed Critical 나카네 히사시
Publication of KR950009958A publication Critical patent/KR950009958A/en
Application granted granted Critical
Publication of KR100299333B1 publication Critical patent/KR100299333B1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0288—Ultra or megasonic jets

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Coating Apparatus (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

본 발명은 세정을 단시간에 효과적으로 수행하는 기판세정장치에 관한 것으로, 모터(20)의 축에 고착한 풀리(21)와 중심축(19)의 상단에 고착한 풀리(22) 사이에 벨트(23)를 장설 하여 중공축(19)을 회전시키도록 하고, 이 중공축(19)의 하단에 디스크부러쉬(24)를 부착하고, 또한 중공축(19) 내에 디스크부러쉬(24) 내에 세정액을 공급하는 파이프(25)가 접해있고, 이 파이프(25)에는 튜브(26)로부터 세정액이 공급된다. 또한 디스크부러쉬(24)에서는 측방으로 브라켓(27), (27)이 연장되고, 이들 브라켓(27), (27)에 초음파 노즐(28), (28)을 부착하고, 이들 초음파 노즐(28), (28)에는 튜브(29), (29)를 거쳐 세정액을 공급하도록 되어 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus that effectively performs cleaning in a short time. ) To rotate the hollow shaft 19, attach the disk brush 24 to the lower end of the hollow shaft 19, and supply the cleaning liquid into the disk brush 24 in the hollow shaft 19. The pipe 25 abuts, and the cleaning liquid is supplied to the pipe 25 from the tube 26. In the disk brush 24, the brackets 27 and 27 extend laterally, and the ultrasonic nozzles 28 and 28 are attached to these brackets 27 and 27, and these ultrasonic nozzles 28 , 28 are supplied to the cleaning liquid via the tubes 29 and 29.

Description

기판세정장치Board Cleaning Device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 관한 기판세정장치의 전체 평면도,1 is an overall plan view of a substrate cleaning apparatus according to the present invention;

제2도는 디스크부러쉬와 초음파 노즐의 이동기구의 종단면도이고,2 is a longitudinal sectional view of the disk brush and the moving mechanism of the ultrasonic nozzle,

제3도는 디스크부러쉬와 초음파 노즐의 확대단면도이다.3 is an enlarged cross-sectional view of the disc brush and the ultrasonic nozzle.

Claims (2)

기판 표면에 존재하는 먼지를 배제하는 세정장치에 있어서, 이 세정장치는 기판을 회전시키는 테이블과, 이 테이블에 대하여 상대적인 수평위치가 가변되는 디스크부러쉬와, 이 디스크부러쉬와 일체적으로 이동함과 동시에 디스크부러쉬와 기판 표면사이에 세정수를 분출하는 초음파 노즐을 갖춘 것을 특징으로 하는 기판 세정장치.A cleaning apparatus for removing dust present on the surface of a substrate, the cleaning apparatus comprising a table for rotating the substrate, a disk brush whose horizontal position is changed relative to the table, and a disk brush that moves together with the disk brush. And an ultrasonic nozzle for ejecting the washing water between the disk brush and the substrate surface. 제1항에 있어서, 초음파 노즐은 디스크부러쉬를 중심으로 하여 대향하는 위치에 1쌍 이상을 설치하고, 각각의 즐에 인가하여 초음파 파장이 다른 것을 특징으로 하는 기판 세정장치.The substrate cleaning apparatus according to claim 1, wherein the ultrasonic nozzles are provided with one or more pairs at opposite positions centering on the disc brush, and applied to each bla, so that the ultrasonic waves are different. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940020527A 1993-09-16 1994-08-19 Board Cleaning Device KR100299333B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22975293A JP3155652B2 (en) 1993-09-16 1993-09-16 Substrate cleaning device
JP229752/1993 1993-09-16

Publications (2)

Publication Number Publication Date
KR950009958A true KR950009958A (en) 1995-04-26
KR100299333B1 KR100299333B1 (en) 2001-12-01

Family

ID=16897134

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940020527A KR100299333B1 (en) 1993-09-16 1994-08-19 Board Cleaning Device

Country Status (2)

Country Link
JP (1) JP3155652B2 (en)
KR (1) KR100299333B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6743723B2 (en) 1995-09-14 2004-06-01 Canon Kabushiki Kaisha Method for fabricating semiconductor device
KR100426184B1 (en) * 1996-11-29 2004-06-24 캐논 가부시끼가이샤 Method for manufacturing semiconductor device

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3630524B2 (en) * 1997-05-08 2005-03-16 大日本スクリーン製造株式会社 Substrate cleaning device
US6202658B1 (en) 1998-11-11 2001-03-20 Applied Materials, Inc. Method and apparatus for cleaning the edge of a thin disc
KR100333059B1 (en) * 1998-11-14 2002-10-25 삼성전자 주식회사 Method for washing of wafer and washing apparatus sane
JP2002540623A (en) * 1999-03-30 2002-11-26 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Semiconductor wafer cleaning apparatus and method
KR20010054422A (en) * 1999-12-06 2001-07-02 김광교 Cleaning apparatus
JP2001246331A (en) 2000-03-08 2001-09-11 Sharp Corp Cleaning device
KR100405449B1 (en) * 2000-10-30 2003-11-15 삼성전자주식회사 Cleaning apparatus for semiconducter wafer
US6904637B2 (en) 2001-10-03 2005-06-14 Applied Materials, Inc. Scrubber with sonic nozzle
US20030192577A1 (en) * 2002-04-11 2003-10-16 Applied Materials, Inc. Method and apparatus for wafer cleaning
KR20040029578A (en) * 2002-10-01 2004-04-08 주식회사 실트론 A device for cleaning wafer by a megasonic cleaner
US20050109371A1 (en) 2003-10-27 2005-05-26 Applied Materials, Inc. Post CMP scrubbing of substrates
US9646859B2 (en) * 2010-04-30 2017-05-09 Applied Materials, Inc. Disk-brush cleaner module with fluid jet
JP5955601B2 (en) * 2012-03-27 2016-07-20 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing apparatus and substrate processing method
CN103386406B (en) * 2013-08-08 2015-04-01 常州市科沛达超声工程设备有限公司 Double-side scrubbing equipment between wafer production processes
CN106040627A (en) * 2015-04-17 2016-10-26 光全球半导体有限公司 Wafer cleaning method and wafer cleaning device used therein
JP6933448B2 (en) * 2016-04-22 2021-09-08 株式会社荏原製作所 Substrate cleaning equipment
WO2017154673A1 (en) 2016-03-08 2017-09-14 株式会社荏原製作所 Substrate cleaning device, substrate cleaning method, substrate processing device, and substrate drying device
US20170271145A1 (en) * 2016-03-21 2017-09-21 Suss Microtec Photomask Equipment Gmbh & Co. Kg Method and an apparatus for cleaning substrates
CN107470194A (en) * 2017-09-18 2017-12-15 李刚 A kind of Cardiological respirator cleaning device
CN109712927A (en) * 2018-12-28 2019-05-03 天津洙诺科技有限公司 A kind of cleaning semiconductor chip machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6743723B2 (en) 1995-09-14 2004-06-01 Canon Kabushiki Kaisha Method for fabricating semiconductor device
KR100426184B1 (en) * 1996-11-29 2004-06-24 캐논 가부시끼가이샤 Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
JPH0786222A (en) 1995-03-31
KR100299333B1 (en) 2001-12-01
JP3155652B2 (en) 2001-04-16

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