KR950007176A - 사파이어 면 위의 산화 아연 압전 결정막 - Google Patents
사파이어 면 위의 산화 아연 압전 결정막 Download PDFInfo
- Publication number
- KR950007176A KR950007176A KR1019940019168A KR19940019168A KR950007176A KR 950007176 A KR950007176 A KR 950007176A KR 1019940019168 A KR1019940019168 A KR 1019940019168A KR 19940019168 A KR19940019168 A KR 19940019168A KR 950007176 A KR950007176 A KR 950007176A
- Authority
- KR
- South Korea
- Prior art keywords
- zinc oxide
- crystal film
- piezoelectric crystal
- oxide piezoelectric
- acoustic wave
- Prior art date
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 title claims abstract 32
- 239000013078 crystal Substances 0.000 title claims abstract 16
- 239000011787 zinc oxide Substances 0.000 title claims abstract 16
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 229910052594 sapphire Inorganic materials 0.000 claims abstract 4
- 239000010980 sapphire Substances 0.000 claims abstract 4
- 238000004544 sputter deposition Methods 0.000 claims abstract 3
- 239000011701 zinc Substances 0.000 claims abstract 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract 3
- 238000010897 surface acoustic wave method Methods 0.000 claims 5
- 238000010586 diagram Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/91—Product with molecular orientation
Abstract
R면 사파이어 기판위에 산화 아연 압전 결정막을 스퍼터링 법에 의해 에피택셜 성장 시킬 때, 타켓으로서 Cu를 Zn과 Cu와의 합계에 대하여 4.5wt%이하 함유하는 것을 이용하여 산화 아연 압전 결정막에 Cu를 함유시킨다.
이것에 의해 배향성이 우수한 산화 아연 압전 결정막을 얻는 일이 가능하다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 관련있는 SAW 기판을 도해적으로 도시한 사시도,
제2도는 RF 마그네트론 스퍼터링 장치를 도해적으로 도시한 단면도,
제3도는 회절 최대 반치수폭의 정의를 설명하기 위한 도면.
Claims (10)
- 사파이어의 (0112)면과 실질적으로 평행한 표면위에 에피택셜 성장된(1120)면의 산화 아연 압전 결정막에 있어서, Cu를 Zn과 Cu와의 합계에 대해서, 4.5wt%이하 함유하는 것을 특징으로 하는 산화 아연 압전 결정막.
- 제1항에 있어서, Cu를 0.4~4.0wt% 함유하는 것을 특징으로 하는 산화 아연 압전 결정막.
- 제2항에 있어서, Cu를 0.6~3.0wt% 함유하는 것을 특징으로 하는 산화 아연 압전 결정막.
- 제3항에 있어서, Cu를 0.9~2.0wt% 함유하는 것을 특징으로 하는 산화 아연 압전 결정막.
- 제1항에 있어서, 스퍼터링법에 의해 형성된 것을 특징으로 하는 산화 아연 압전 결정막.
- 탄성표면과 디바이스를 위한 탄성 표면파 기판에 있어서, (0112)면과 실질적으로 평행한 표면을 갖는(0112)면 컷트 사파이어 기판 및 상기 사파이어 기판의 표면위에 에피택셜 성장된(1120)면의 산화 아연 압전 결정막을 구비하며, 상기 산화아연 압전 결정막을 Cu를, Zn과 Cu와의 합계에 대하여 4.5wt%이하 함유하는 것을 특징으로 하는 탄성 표면파 기판.
- 제6항에 있어서, 상기 산화 아연 압전 결정막은 Cu를 0.4~4.0wt% 함유하는 것을 특징으로 하는 탄성 표면파 기판.
- 제7항에 있어서, 상기 산화 아연 압전 결정막은 Cu를 0.6~3.0wt% 함유하는 것을 특징으로 하는 탄성 표면파 기판.
- 제8항에 있어서, 상기 산화 아연 압전 결정막은 Cu를 0.9~2.0wt% 함유하는 것을 특징으로 하는 탄성 표면파 기판.
- 제6항에 있어서, 상기 산화 아연 압전 결정막은 스퍼터링법에 의해 형성되어진 것을 특징으로 하는 탄성표면파 기판.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21509193A JP3085043B2 (ja) | 1993-08-05 | 1993-08-05 | サファイア面上の酸化亜鉛圧電結晶膜 |
JP93-215091 | 1993-08-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950007176A true KR950007176A (ko) | 1995-03-21 |
Family
ID=16666608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940019168A KR950007176A (ko) | 1993-08-05 | 1994-08-03 | 사파이어 면 위의 산화 아연 압전 결정막 |
Country Status (6)
Country | Link |
---|---|
US (2) | US5569548A (ko) |
EP (1) | EP0638999B1 (ko) |
JP (1) | JP3085043B2 (ko) |
KR (1) | KR950007176A (ko) |
CN (1) | CN1050246C (ko) |
DE (1) | DE69414491T2 (ko) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6127768A (en) * | 1997-05-09 | 2000-10-03 | Kobe Steel Usa, Inc. | Surface acoustic wave and bulk acoustic wave devices using a Zn.sub.(1-X) Yx O piezoelectric layer device |
US6242080B1 (en) * | 1997-07-09 | 2001-06-05 | Canon Kabushiki Kaisha | Zinc oxide thin film and process for producing the film |
US6674098B1 (en) * | 1999-07-26 | 2004-01-06 | National Institute Of Advanced Industrial Science And Technology | ZnO compound semiconductor light emitting element |
KR100343949B1 (ko) * | 2000-01-26 | 2002-07-24 | 한국과학기술연구원 | 상온에서 작동하는 자외선 수광, 발광소자용 ZnO박막의 제조 방법 및 그를 위한 장치 |
DE60038820D1 (de) | 2000-03-27 | 2008-06-19 | Sumitomo Electric Industries | Zinkoxid-halbleitermaterial |
US6887243B2 (en) | 2001-03-30 | 2005-05-03 | Triage Medical, Inc. | Method and apparatus for bone fixation with secondary compression |
US6511481B2 (en) | 2001-03-30 | 2003-01-28 | Triage Medical, Inc. | Method and apparatus for fixation of proximal femoral fractures |
JP2003063893A (ja) * | 2001-06-15 | 2003-03-05 | Murata Mfg Co Ltd | ZnO/サファイア基板及びその製造方法 |
US6793678B2 (en) | 2002-06-27 | 2004-09-21 | Depuy Acromed, Inc. | Prosthetic intervertebral motion disc having dampening |
ES2336551T3 (es) | 2002-07-19 | 2010-04-14 | Interventional Spine, Inc. | Dispositivo de fijacion de la columna vertebral. |
JP4385607B2 (ja) | 2003-01-29 | 2009-12-16 | セイコーエプソン株式会社 | 表面弾性波素子、周波数フィルタ、発振器、電子回路並びに電子機器 |
JP2004297359A (ja) | 2003-03-26 | 2004-10-21 | Seiko Epson Corp | 表面弾性波素子、周波数フィルタ、発振器、電子回路、及び電子機器 |
JP2006094140A (ja) * | 2004-09-24 | 2006-04-06 | Murata Mfg Co Ltd | 圧電共振子及びその製造方法、圧電フィルタ並びにデュプレクサ |
US7648523B2 (en) * | 2004-12-08 | 2010-01-19 | Interventional Spine, Inc. | Method and apparatus for spinal stabilization |
US7857832B2 (en) | 2004-12-08 | 2010-12-28 | Interventional Spine, Inc. | Method and apparatus for spinal stabilization |
WO2007123496A1 (en) | 2006-04-25 | 2007-11-01 | National University Of Singapore | Method of zinc oxide film grown on the epitaxial lateral overgrowth gallium nitride template |
WO2008070863A2 (en) | 2006-12-07 | 2008-06-12 | Interventional Spine, Inc. | Intervertebral implant |
US7998176B2 (en) | 2007-06-08 | 2011-08-16 | Interventional Spine, Inc. | Method and apparatus for spinal stabilization |
US8900307B2 (en) | 2007-06-26 | 2014-12-02 | DePuy Synthes Products, LLC | Highly lordosed fusion cage |
WO2009092102A1 (en) | 2008-01-17 | 2009-07-23 | Synthes Usa, Llc | An expandable intervertebral implant and associated method of manufacturing the same |
WO2009124269A1 (en) | 2008-04-05 | 2009-10-08 | Synthes Usa, Llc | Expandable intervertebral implant |
US9526620B2 (en) | 2009-03-30 | 2016-12-27 | DePuy Synthes Products, Inc. | Zero profile spinal fusion cage |
US9393129B2 (en) | 2009-12-10 | 2016-07-19 | DePuy Synthes Products, Inc. | Bellows-like expandable interbody fusion cage |
US9592063B2 (en) | 2010-06-24 | 2017-03-14 | DePuy Synthes Products, Inc. | Universal trial for lateral cages |
US8979860B2 (en) | 2010-06-24 | 2015-03-17 | DePuy Synthes Products. LLC | Enhanced cage insertion device |
WO2012003175A1 (en) | 2010-06-29 | 2012-01-05 | Synthes Usa, Llc | Distractible intervertebral implant |
US9402732B2 (en) | 2010-10-11 | 2016-08-02 | DePuy Synthes Products, Inc. | Expandable interspinous process spacer implant |
US8940052B2 (en) | 2012-07-26 | 2015-01-27 | DePuy Synthes Products, LLC | Expandable implant |
US20140067069A1 (en) | 2012-08-30 | 2014-03-06 | Interventional Spine, Inc. | Artificial disc |
US9522070B2 (en) | 2013-03-07 | 2016-12-20 | Interventional Spine, Inc. | Intervertebral implant |
US9522028B2 (en) | 2013-07-03 | 2016-12-20 | Interventional Spine, Inc. | Method and apparatus for sacroiliac joint fixation |
US11426290B2 (en) | 2015-03-06 | 2022-08-30 | DePuy Synthes Products, Inc. | Expandable intervertebral implant, system, kit and method |
US9913727B2 (en) | 2015-07-02 | 2018-03-13 | Medos International Sarl | Expandable implant |
EP3474782A2 (en) | 2016-06-28 | 2019-05-01 | Eit Emerging Implant Technologies GmbH | Expandable and angularly adjustable articulating intervertebral cages |
CN109688981A (zh) | 2016-06-28 | 2019-04-26 | Eit 新兴移植技术股份有限公司 | 可扩张的、角度可调整的椎间笼 |
US10537436B2 (en) | 2016-11-01 | 2020-01-21 | DePuy Synthes Products, Inc. | Curved expandable cage |
US10888433B2 (en) | 2016-12-14 | 2021-01-12 | DePuy Synthes Products, Inc. | Intervertebral implant inserter and related methods |
US10398563B2 (en) | 2017-05-08 | 2019-09-03 | Medos International Sarl | Expandable cage |
US11344424B2 (en) | 2017-06-14 | 2022-05-31 | Medos International Sarl | Expandable intervertebral implant and related methods |
US10940016B2 (en) | 2017-07-05 | 2021-03-09 | Medos International Sarl | Expandable intervertebral fusion cage |
US11446156B2 (en) | 2018-10-25 | 2022-09-20 | Medos International Sarl | Expandable intervertebral implant, inserter instrument, and related methods |
US11426286B2 (en) | 2020-03-06 | 2022-08-30 | Eit Emerging Implant Technologies Gmbh | Expandable intervertebral implant |
US11850160B2 (en) | 2021-03-26 | 2023-12-26 | Medos International Sarl | Expandable lordotic intervertebral fusion cage |
US11752009B2 (en) | 2021-04-06 | 2023-09-12 | Medos International Sarl | Expandable intervertebral fusion cage |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3664867A (en) * | 1969-11-24 | 1972-05-23 | North American Rockwell | Composite structure of zinc oxide deposited epitaxially on sapphire |
US3766041A (en) * | 1970-09-29 | 1973-10-16 | Matsushita Electric Ind Co Ltd | Method of producing piezoelectric thin films by cathodic sputtering |
GB1582317A (en) * | 1977-01-25 | 1981-01-07 | Murata Manufacturing Co | Piezoelectric crystalline films |
JPS5516554A (en) * | 1978-07-21 | 1980-02-05 | Toko Inc | Manufacture of thin film of zinc oxide |
JPS5797214A (en) * | 1980-12-08 | 1982-06-16 | Matsushita Electric Ind Co Ltd | Transducer for surface wave |
US5162690A (en) * | 1989-04-14 | 1992-11-10 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
JPH0314305A (ja) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | 弾性表面波装置の製造方法 |
JPH0340510A (ja) * | 1989-07-06 | 1991-02-21 | Murata Mfg Co Ltd | 弾性表面波装置 |
-
1993
- 1993-08-05 JP JP21509193A patent/JP3085043B2/ja not_active Expired - Fee Related
-
1994
- 1994-08-02 DE DE1994614491 patent/DE69414491T2/de not_active Expired - Lifetime
- 1994-08-02 US US08/284,889 patent/US5569548A/en not_active Expired - Lifetime
- 1994-08-02 EP EP19940112041 patent/EP0638999B1/en not_active Expired - Lifetime
- 1994-08-03 KR KR1019940019168A patent/KR950007176A/ko not_active Application Discontinuation
- 1994-08-05 CN CN94109460A patent/CN1050246C/zh not_active Expired - Fee Related
-
1995
- 1995-03-22 US US08/408,952 patent/US5532537A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1103513A (zh) | 1995-06-07 |
DE69414491D1 (de) | 1998-12-17 |
JPH0750436A (ja) | 1995-02-21 |
EP0638999B1 (en) | 1998-11-11 |
JP3085043B2 (ja) | 2000-09-04 |
US5532537A (en) | 1996-07-02 |
EP0638999A1 (en) | 1995-02-15 |
CN1050246C (zh) | 2000-03-08 |
DE69414491T2 (de) | 1999-05-06 |
US5569548A (en) | 1996-10-29 |
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Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 19980923 Effective date: 19990227 |