KR950001864A - 비정질 경질 탄소막 및 그 제조 방법 - Google Patents
비정질 경질 탄소막 및 그 제조 방법 Download PDFInfo
- Publication number
- KR950001864A KR950001864A KR1019940012985A KR19940012985A KR950001864A KR 950001864 A KR950001864 A KR 950001864A KR 1019940012985 A KR1019940012985 A KR 1019940012985A KR 19940012985 A KR19940012985 A KR 19940012985A KR 950001864 A KR950001864 A KR 950001864A
- Authority
- KR
- South Korea
- Prior art keywords
- carbon film
- amorphous hard
- hard carbon
- nitrogen
- substrate
- Prior art date
Links
- 229910021385 hard carbon Inorganic materials 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract 10
- 229910052799 carbon Inorganic materials 0.000 claims abstract 10
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract 9
- 239000010703 silicon Substances 0.000 claims abstract 9
- 239000000758 substrate Substances 0.000 claims abstract 8
- 239000002994 raw material Substances 0.000 claims abstract 7
- 238000000151 deposition Methods 0.000 claims abstract 6
- 238000000034 method Methods 0.000 claims abstract 6
- 230000008021 deposition Effects 0.000 claims abstract 3
- 238000010884 ion-beam technique Methods 0.000 claims abstract 2
- 229910000838 Al alloy Inorganic materials 0.000 claims 1
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 229910000640 Fe alloy Inorganic materials 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000000446 fuel Substances 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- -1 nitrogen containing compound Chemical class 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 150000003961 organosilicon compounds Chemical class 0.000 claims 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02M—SUPPLYING COMBUSTION ENGINES IN GENERAL WITH COMBUSTIBLE MIXTURES OR CONSTITUENTS THEREOF
- F02M59/00—Pumps specially adapted for fuel-injection and not provided for in groups F02M39/00 -F02M57/00, e.g. rotary cylinder-block type of pumps
- F02M59/44—Details, components parts, or accessories not provided for in, or of interest apart from, the apparatus of groups F02M59/02 - F02M59/42; Pumps having transducers, e.g. to measure displacement of pump rack or piston
- F02M59/445—Selection of particular materials
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05C—INDEXING SCHEME RELATING TO MATERIALS, MATERIAL PROPERTIES OR MATERIAL CHARACTERISTICS FOR MACHINES, ENGINES OR PUMPS OTHER THAN NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES
- F05C2203/00—Non-metallic inorganic materials
- F05C2203/06—Silicon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05C—INDEXING SCHEME RELATING TO MATERIALS, MATERIAL PROPERTIES OR MATERIAL CHARACTERISTICS FOR MACHINES, ENGINES OR PUMPS OTHER THAN NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES
- F05C2203/00—Non-metallic inorganic materials
- F05C2203/08—Ceramics; Oxides
- F05C2203/0804—Non-oxide ceramics
- F05C2203/0808—Carbon, e.g. graphite
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
탄소, 규소 및 질소를 원료로 하여 플라즈마 또는 이온 비임을 사용해서 기재상에 증착시켜서 된 규소 및 질소를 함유하는 비정질 경질 탄소막을 제공한다. 또한, 탄소 원료, 규소 원료 및 질소 원료를 기재가 설치된 증착실내에 도입하여 상기 기재상에 탄소막을 증착시킴을 특징으로 하는 규소와 질소를 함유하는 비정질 경질 탄소막을 기판상에 증착시키는 방법도 제공한다. 상기 비정질 경질 탄소막으로 피복한 접동부분을 가진 기계부품 및 기계부품의 접동부분 표면에 상기 탄소막을 피복하는 비정질 경질 탄소막의 이용 방법도 아울러 제공한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 실시예 1 에 사용된 평행 평판형 RF플라즈마 CVD법의 장치의 개략설명도, 제 2 도는 실시예 1 의 비정질 경질 탄소막에 대해서의 라만 분광 광도계에 의해 측정된 스펙트럼을 나타낸 도면, 제 3 도는 실시예1 및 비교예 1의 비정질 경질 탄소막에 대해서의 마모 시험 결과를 나타낸 도면.
Claims (13)
- 기재상에 증착시킨 비정질 경질 탄소막으로서 더욱이 규소와 질소를 함유하는 비정질 경질 탄소막.
- 제 1 항에 있어서, 탄소막중의 수소의 함유량이 약 0.5~5.0×1022원자/㎤인 비정질 경질 탄소막.
- 제 1 항 또는 제 2 항 있어서, 탄소막중의 규소의 함유량이 약 10~35원자%인 비정질 경질 탄소막.
- 제 1 항에 있어서, 탄소막중의 질소 함유량이 약 0.1~10원자%인 비정질 경질 탄소막.
- 제 1 항에 있어서, 기재가 철 합금 또는 알루미늄 합금제의 기계부품인 비정질 경질 탄소막.
- 제 1 항에 있어서, 비정질 경질 탄소막의 비커스 경도가 2000~5000인 비정질 경질 탄소막.
- 제 1 항에 있어서, 탄소막의 막두께가 0.1~30㎛인 비정질 경질 탄소막.
- 탄소 원료, 규소 원료 및 질소 원료를 기재를 설치한 증착실에 도입하여 상기 기재상에 규소 및 질소를 함유하는 비정질 경질 탄소막을 증착시키는 비정질 경질 탄소막 증착 방법.
- 제 8 항에 있어서, 탄소 원료가 탄화 수소이고 규소 원료가 유기규소 화합물이며 질소 원료가 질소 또는 질소 함유 화합물인 방법.
- 제 8 항에 있어서,증착을 플라즈마 도는 이온 비임을 사용하여 실시하는 방법.
- 접동부분을 가진 기계부품으로서 적어도 상기 접동부분을 제 1 항 기재의 비정질 경질 탄소막으로 피복한 기계부품.
- 제11항에 있어서, 접동부분을 가진 기계부품이 콤프레서 또는 연료 분사 펌프의 접동부품인 기계부품.
- 기계부품의 접동부분의 표면에 비정질 경질 탄소막을 증착시키는 제 1 항 기계의 비정질 경질 탄소막의 이용 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP93-166439 | 1993-06-11 | ||
JP16643993 | 1993-06-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950001864A true KR950001864A (ko) | 1995-01-04 |
KR0134942B1 KR0134942B1 (ko) | 1998-06-15 |
Family
ID=15831429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940012985A KR0134942B1 (ko) | 1993-06-11 | 1994-06-09 | 비정질 경질 탄소막 및 그 제조 방법 |
Country Status (3)
Country | Link |
---|---|
US (2) | US5616374A (ko) |
KR (1) | KR0134942B1 (ko) |
DE (1) | DE4420262C2 (ko) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6410144B2 (en) * | 1995-03-08 | 2002-06-25 | Southwest Research Institute | Lubricious diamond-like carbon coatings |
EP1067210A3 (en) * | 1996-09-06 | 2002-11-13 | Sanyo Electric Co., Ltd. | Method for providing a hard carbon film on a substrate and electric shaver blade |
DE19707232A1 (de) * | 1997-02-24 | 1998-08-27 | Betonwerk C Schmidt Gmbh Abt C | Spinnring und Läufer für Ringspinnmaschinen |
US6802457B1 (en) | 1998-09-21 | 2004-10-12 | Caterpillar Inc | Coatings for use in fuel system components |
US6416865B1 (en) * | 1998-10-30 | 2002-07-09 | Sumitomo Electric Industries, Ltd. | Hard carbon film and surface acoustic-wave substrate |
JP3555844B2 (ja) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
JP2003501555A (ja) * | 1999-06-08 | 2003-01-14 | ナムローゼ・フェンノートシャップ・ベーカート・ソシエテ・アノニム | ドープダイヤモンド状カーボン皮膜 |
CN1170003C (zh) * | 1999-06-18 | 2004-10-06 | 日新电机株式会社 | 碳膜及其形成方法以及碳膜被覆物品及其制造方法 |
US6715693B1 (en) * | 2000-02-15 | 2004-04-06 | Caterpillar Inc | Thin film coating for fuel injector components |
ES2256110T3 (es) | 2000-05-09 | 2006-07-16 | Kabushiki Kaisha Riken | Pelicula de carbono amorfo que contiene oxido. |
US6739238B2 (en) | 2000-11-20 | 2004-05-25 | Nissan Motor Co., Ltd. | Sliding structure for a reciprocating internal combustion engine and a reciprocating internal combustion engine using the sliding structure |
US7537835B2 (en) * | 2001-09-27 | 2009-05-26 | Kabushiki Kaisha Toyota Chuo Kenkyusho | High friction sliding member |
JP2003184883A (ja) | 2001-12-20 | 2003-07-03 | Nissan Motor Co Ltd | 軸受摺動部材 |
JP3555891B2 (ja) * | 2002-02-22 | 2004-08-18 | 新日本石油株式会社 | 低摩擦摺動材料及びこれに用いる潤滑油組成物 |
US6969198B2 (en) | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
EP1479946B1 (en) * | 2003-05-23 | 2012-12-19 | Nissan Motor Co., Ltd. | Piston for internal combustion engine |
JP4863152B2 (ja) | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | 歯車 |
EP1666573B1 (en) | 2003-08-06 | 2019-05-15 | Nissan Motor Company Limited | Low-friction sliding mechanism and method of friction reduction |
JP4973971B2 (ja) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
DE602004010207T2 (de) * | 2003-08-11 | 2008-09-25 | Nissan Motor Co., Ltd., Yokohama | Kraftstoffgeschmierte Vorrichtung |
JP2005090489A (ja) * | 2003-08-11 | 2005-04-07 | Nissan Motor Co Ltd | 内燃機関用バルブリフター |
EP1507088B1 (en) * | 2003-08-13 | 2007-08-29 | Nissan Motor Company, Limited | Structure for connecting piston to crankshaft |
JP4539205B2 (ja) * | 2003-08-21 | 2010-09-08 | 日産自動車株式会社 | 冷媒圧縮機 |
US7771821B2 (en) | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
EP1508611B1 (en) | 2003-08-22 | 2019-04-17 | Nissan Motor Co., Ltd. | Transmission comprising low-friction sliding members and transmission oil therefor |
FR2867247B1 (fr) * | 2004-03-05 | 2006-06-02 | Skf Ab | Dispositif de galet tendeur |
CN101133184A (zh) * | 2005-03-02 | 2008-02-27 | 株式会社荏原制作所 | 涂覆金刚石的轴承或密封结构及包含它们的流体机械 |
FR2891554B1 (fr) * | 2005-10-03 | 2008-01-11 | Hef Soc Par Actions Simplifiee | Revetement anti-corrosion a base de silicium, de carbone, d'hydrogene et d'azote. |
JP4784248B2 (ja) * | 2005-10-05 | 2011-10-05 | トヨタ自動車株式会社 | 摺動構造及び摺動方法 |
GB2452190B (en) | 2006-05-17 | 2011-12-28 | G & H Technologies Llc | Wear resistant depositied coating, method of coating deposition and applications therefor |
US8987039B2 (en) * | 2007-10-12 | 2015-03-24 | Air Products And Chemicals, Inc. | Antireflective coatings for photovoltaic applications |
US20090096106A1 (en) * | 2007-10-12 | 2009-04-16 | Air Products And Chemicals, Inc. | Antireflective coatings |
US8080324B2 (en) * | 2007-12-03 | 2011-12-20 | Kobe Steel, Ltd. | Hard coating excellent in sliding property and method for forming same |
JP2009155721A (ja) * | 2007-12-03 | 2009-07-16 | Kobe Steel Ltd | 摺動性に優れる硬質皮膜とその硬質皮膜の形成方法 |
KR101468666B1 (ko) * | 2011-06-06 | 2014-12-04 | 다이요 가가쿠 고교 가부시키가이샤 | 비정질 탄소막층에의 발수 발유층을 고정시키는 방법 및 해당 방법에 의해 형성된 적층체 |
US9054295B2 (en) | 2011-08-23 | 2015-06-09 | Micron Technology, Inc. | Phase change memory cells including nitrogenated carbon materials, methods of forming the same, and phase change memory devices including nitrogenated carbon materials |
DE102012219930A1 (de) | 2012-10-31 | 2014-04-30 | Federal-Mogul Burscheid Gmbh | Gleitelement, insbesondere Kolbenring, mit einer Beschichtung |
JP6453826B2 (ja) * | 2016-09-28 | 2019-01-16 | トヨタ自動車株式会社 | 摺動部材およびその製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2926080A1 (de) * | 1979-06-28 | 1981-01-08 | Philips Patentverwaltung | Mittel zur trockenschmierung |
JPS58126972A (ja) * | 1982-01-22 | 1983-07-28 | Sumitomo Electric Ind Ltd | ダイヤモンド被覆超硬合金工具 |
CA1232228A (en) * | 1984-03-13 | 1988-02-02 | Tatsuro Miyasato | Coating film and method and apparatus for producing the same |
DE3609456A1 (de) * | 1985-03-23 | 1986-10-02 | Canon K.K., Tokio/Tokyo | Waermeerzeugender widerstand und waermeerzeugendes widerstandselement unter benutzung desselben |
GB2175252B (en) * | 1985-03-25 | 1990-09-19 | Canon Kk | Thermal recording head |
JPH06952B2 (ja) * | 1985-04-18 | 1994-01-05 | 鐘淵化学工業株式会社 | 硬質カ−ボン膜 |
EP0221531A3 (en) * | 1985-11-06 | 1992-02-19 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | High heat conductive insulated substrate and method of manufacturing the same |
DD258341A3 (de) * | 1986-03-14 | 1988-07-20 | Hochvakuum Dresden Veb | Verfahren zur herstellung haftfester ic-schichten |
KR900008505B1 (ko) * | 1987-02-24 | 1990-11-24 | 세미콘덕터 에너지 라보라터리 캄파니 리미티드 | 탄소 석출을 위한 마이크로파 강화 cvd 방법 |
AU631037B2 (en) * | 1989-12-28 | 1992-11-12 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Hard and lubricant thin film of amorphous carbon-hydrogen-silicon, iron base metallic material coated therewith, and the process for producing the same |
US5393577A (en) * | 1990-06-19 | 1995-02-28 | Nec Corporation | Method for forming a patterned layer by selective chemical vapor deposition |
JP3071854B2 (ja) * | 1991-03-27 | 2000-07-31 | 株式会社半導体エネルギー研究所 | ダイヤモンド膜作製方法およびその評価方法 |
US5541003A (en) * | 1991-10-31 | 1996-07-30 | Tdk Corporation | Articles having diamond-like protective thin film |
US5249554A (en) * | 1993-01-08 | 1993-10-05 | Ford Motor Company | Powertrain component with adherent film having a graded composition |
-
1994
- 1994-06-09 KR KR1019940012985A patent/KR0134942B1/ko not_active IP Right Cessation
- 1994-06-10 DE DE4420262A patent/DE4420262C2/de not_active Expired - Lifetime
-
1995
- 1995-06-07 US US08/486,571 patent/US5616374A/en not_active Expired - Fee Related
-
1996
- 1996-12-20 US US08/772,135 patent/US5843571A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5843571A (en) | 1998-12-01 |
DE4420262A1 (de) | 1994-12-15 |
US5616374A (en) | 1997-04-01 |
DE4420262C2 (de) | 1999-07-22 |
KR0134942B1 (ko) | 1998-06-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR950001864A (ko) | 비정질 경질 탄소막 및 그 제조 방법 | |
Tamor et al. | Raman ‘‘fingerprinting’’of amorphous carbon films | |
Weissmantel et al. | Preparation of hard coatings by ion beam methods | |
Kaufman et al. | Symmetry breaking in nitrogen-doped amorphous carbon: Infrared observation of the Raman-active G and D bands | |
Thärigen et al. | Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets | |
US7942111B2 (en) | Method and device for vacuum-coating a substrate | |
CA2110563A1 (en) | Powertrain component with adherent film having a graded composition | |
Miyake et al. | Improved microscratch hardness of ion‐plated carbon film by nitrogen inclusion evaluated by atomic force microscope | |
Ham et al. | Diamond‐like carbon films grown by a large‐scale direct current plasma chemical vapor deposition reactor: System design, film characteristics, and applications | |
Tanaka et al. | Hardness and structure of a-CNx films synthesized by chemical vapor deposition | |
Costa et al. | Effect of hydrogen incorporation on the mechanical properties of DLC films deposited by HiPIMS in DOMS mode | |
Tang et al. | Influence of hydrogen on the structure of amorphous carbon | |
Tanabe et al. | Characterization and modification of amorphous carbon films consisting of sp2 and sp3 bonds using magneto-plasma dynamic arc-jet | |
Škorić et al. | Structure, hardness and adhesion of thin coatings deposited by PVD, IBAD on nitrided steels | |
Damasceno et al. | Deposition and evaluation of DLC–Si protective coatings for polycarbonate materials | |
US20050000796A1 (en) | Method for the manufacture of an article and an article | |
Yamashita et al. | Cross-sectional transmission electron microscopy observations of c-BN films deposited on Si by ion-beam-assisted deposition | |
Lejeune et al. | Effect of air post contamination on mechanical properties of amorphous carbon nitride thin films | |
Chien et al. | Mechanical properties of amorphous boron carbon nitride films produced by dual gun sputtering | |
ATE246738T1 (de) | Kathodisches vakuum-bogenverdampfungsverfahren für die herstellung von verschleissfesten beschichtungen | |
Kuhr et al. | Hydrogen incorporation during nucleation and growth of c-BN films | |
Roth et al. | Large area and three-dimensional deposition of diamond-like carbon films for industrial applications | |
Kozłowski et al. | Properties of carbides, nitrides and carbonitrides based on Ti and Mo multicomponent layers | |
Valentini et al. | Deposition of hydrogenated amorphous carbon films from CH4/Ar plasmas: Ar dilution effects | |
Taki et al. | Amorphous carbon nitride hard coatings by multistep shielded arc ion plating |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20080108 Year of fee payment: 11 |
|
LAPS | Lapse due to unpaid annual fee |