KR940025408A - 무전해 도금을 위한 예비처리 용액 - Google Patents
무전해 도금을 위한 예비처리 용액 Download PDFInfo
- Publication number
- KR940025408A KR940025408A KR1019940007399A KR19940007399A KR940025408A KR 940025408 A KR940025408 A KR 940025408A KR 1019940007399 A KR1019940007399 A KR 1019940007399A KR 19940007399 A KR19940007399 A KR 19940007399A KR 940025408 A KR940025408 A KR 940025408A
- Authority
- KR
- South Korea
- Prior art keywords
- acid
- pretreatment solution
- mol
- contained
- amount
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
희석제로서 물, 황산, 할라이드, 유기산을 함유하고 접착 촉진제로서 작용하며 에칭 부식을 발생시키지 않는 예비처리 용액은 수명이 길고 유리 직물 및 기판 수지 모두에 대하여 도금 구리의 우수한 접착성을 제공한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (6)
- 희석제로서, 물, 황산, 할라이드, 유기산을 함유하는 무전해 도금을 위한 예비처리 용액.
- 제 1 항에 있어서, 할라이드가 염화물 또는 블롬화물인 예비처리 용액.
- 제 1 항에 있어서, 유기산이 지방족 카르복실산 또는 방향족 카르복실산인 예비 처리 용액.
- 제 1 항에 있어서, 황산이 0.70∼2.50 몰/ℓ의 양으로 함유되고 있고, 할리드가 0.01∼6.0 몰/ℓ의 양으로 함유되고 있고 유기산이 0.005∼1.0 몰/ℓ의 양으로 함유되어 있는 예비처리 용액.
- 제 3 항에 있어서, 지방족 카르복실산이 락트산, 타르타르산, 시트르산, 옥살산, 숙신산, 아세트산, 포름산 또는 말산인 예비처리 용액.
- 제 3 항에 있어서, 방향족 카르복실산이 벤조산 또는 프탈산인 예비처리 용액.※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5083145A JPH06299360A (ja) | 1993-04-09 | 1993-04-09 | 無電解めっき用前処理液 |
JP93-83145 | 1993-04-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940025408A true KR940025408A (ko) | 1994-11-19 |
KR0145241B1 KR0145241B1 (ko) | 1998-10-01 |
Family
ID=13794063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940007399A KR0145241B1 (ko) | 1993-04-09 | 1994-04-08 | 무전해 도금을 위한 예비처리 용액 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5569321A (ko) |
JP (1) | JPH06299360A (ko) |
KR (1) | KR0145241B1 (ko) |
TW (1) | TW303391B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012079826A (ja) * | 2010-09-30 | 2012-04-19 | Fujifilm Corp | 搬送キャリア及びその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5113502B2 (ko) * | 1973-04-28 | 1976-04-30 | ||
JPS5232727B2 (ko) * | 1973-11-26 | 1977-08-23 | ||
DE2418654A1 (de) * | 1974-04-18 | 1975-11-06 | Langbein Pfanhauser Werke Ag | Verfahren zum stromlosen oberflaechenmetallisieren von kunststoffgegenstaenden und fuer die durchfuehrung des verfahrens geeignetes aktivierungsbad |
US4181750A (en) * | 1977-09-09 | 1980-01-01 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
JPS5949305B2 (ja) * | 1977-10-31 | 1984-12-01 | 株式会社日立製作所 | 化学めつき前処理方法 |
US4182784A (en) * | 1977-12-16 | 1980-01-08 | Mcgean Chemical Company, Inc. | Method for electroless plating on nonconductive substrates using palladium/tin catalyst in aqueous solution containing a hydroxy substituted organic acid |
US4863758A (en) * | 1982-05-26 | 1989-09-05 | Macdermid, Incorporated | Catalyst solutions for activating non-conductive substrates and electroless plating process |
JPS5949305A (ja) * | 1982-09-13 | 1984-03-21 | Mitsubishi Heavy Ind Ltd | タ−ビン保安装置用多重化油圧回路 |
JP2666470B2 (ja) * | 1989-05-09 | 1997-10-22 | 日立化成工業株式会社 | 無電解めっき法 |
US5254156A (en) * | 1989-05-09 | 1993-10-19 | Hitachi Chemical Company, Ltd. | Aqueous solution for activation accelerating treatment |
-
1993
- 1993-04-09 JP JP5083145A patent/JPH06299360A/ja active Pending
-
1994
- 1994-04-07 TW TW083103019A patent/TW303391B/zh active
- 1994-04-08 KR KR1019940007399A patent/KR0145241B1/ko not_active IP Right Cessation
- 1994-04-08 US US08/225,316 patent/US5569321A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH06299360A (ja) | 1994-10-25 |
US5569321A (en) | 1996-10-29 |
KR0145241B1 (ko) | 1998-10-01 |
TW303391B (ko) | 1997-04-21 |
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