KR940016915A - Method of manufacturing thin film transistor - Google Patents

Method of manufacturing thin film transistor Download PDF

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Publication number
KR940016915A
KR940016915A KR1019920026230A KR920026230A KR940016915A KR 940016915 A KR940016915 A KR 940016915A KR 1019920026230 A KR1019920026230 A KR 1019920026230A KR 920026230 A KR920026230 A KR 920026230A KR 940016915 A KR940016915 A KR 940016915A
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KR
South Korea
Prior art keywords
semiconductor layer
etch stopper
thin film
film transistor
etching
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KR1019920026230A
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Korean (ko)
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KR100290919B1 (en
Inventor
오의열
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이헌조
주식회사 금성사
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Application filed by 이헌조, 주식회사 금성사 filed Critical 이헌조
Priority to KR1019920026230A priority Critical patent/KR100290919B1/en
Priority to JP33202893A priority patent/JP3537854B2/en
Priority to US08/174,208 priority patent/US5610082A/en
Priority to DE4344897A priority patent/DE4344897B4/en
Priority to CN 93119958 priority patent/CN1033252C/en
Priority to FR9315834A priority patent/FR2700062B1/en
Publication of KR940016915A publication Critical patent/KR940016915A/en
Application granted granted Critical
Publication of KR100290919B1 publication Critical patent/KR100290919B1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thin Film Transistor (AREA)

Abstract

본 발명은 박막트랜지스터에 관한 것으로 공정을 줄일 수 있고 특성 및 수율을 향상시킬 수 있도록한 박막트랜지스터 제조방법에 관한 것이다.The present invention relates to a thin film transistor and to a method for manufacturing a thin film transistor to reduce the process and improve the characteristics and yield.

종래에 박막트랜지스터 제조방법에 있어서는 반도체층 폭이 게이트 전극 폭보다 크게 되어 TFT-LCD구동시 백라이트에 의해 반도체층에 전자가 여기되므로 박막트랜지스터의 누설전류가 증가하여 온/오프 비가 감소되므로 LCD의 특성이 저하되고 공정이 복잡했다.In the conventional thin film transistor manufacturing method, the width of the semiconductor layer is larger than the gate electrode width, and electrons are excited to the semiconductor layer by the backlight during TFT-LCD driving. Therefore, the leakage current of the thin film transistor increases and the on / off ratio is reduced. It was degraded and the process was complicated.

본 발명은 게이트 전극이 형성된 기판위에 게이트 절연막 반도체층 에치스토퍼층이 차례로 반도체층의 폭이 게이트 전극 폭보다 작게 형성하여 불순물 반도체층과 소오스/드레인 전극을 형성한 것이다. 따라서 공정이 줄어들고 특성 및 수율이 향상된다.According to the present invention, an impurity semiconductor layer and a source / drain electrode are formed by sequentially forming a gate insulating film semiconductor layer etch stopper layer on a substrate on which a gate electrode is formed so that the width of the semiconductor layer is smaller than the gate electrode width. This reduces processes and improves properties and yields.

Description

박막트랜지스터 제조방법Method of manufacturing thin film transistor

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 3 도는 본 발명의 박막트랜지스터 단면도, 제 4 도는 본 발명의 박막트랜지스터 공정 단면도, 제 5 도는 본 발명 다른 실시예의 박막트랜지스터 공정 단면도.3 is a cross-sectional view of a thin film transistor of the present invention, FIG. 4 is a cross-sectional view of a thin film transistor process of the present invention, and FIG. 5 is a cross-sectional view of a thin film transistor process of another embodiment of the present invention.

Claims (5)

게이트 전극(2)에 패터닝된 유리기판(1)위에 게이트 절연막(3), 반도체층(4), 에치스토퍼층(5) 및 감광막(9)을 차례로 증착하는 제 1 공정과, 기판(1)쪽에서 배면 노광하여 감광막(9)을 패터닝한 후 에치스토퍼층(5)과 반도체층(4)을 동시에 테이퍼 식각하는 제 2 공정과, 전면에 불순물 반도체층(6)과 금속(10)을 증착하고 이 두층의 채널 부분을 선택적으로 제거하여 소오스/드레인 전극(7,8)을 형성하는 공정을 포함하여 이루어짐을 특징으로 하는 박막트랜지스터 제조방법.A first process of sequentially depositing a gate insulating film 3, a semiconductor layer 4, an etch stopper layer 5, and a photosensitive film 9 on the glass substrate 1 patterned on the gate electrode 2, and the substrate 1. A second step of tapering etching the etch stopper layer 5 and the semiconductor layer 4 at the same time after patterning the photosensitive film 9 by back exposure on the back side, and depositing the impurity semiconductor layer 6 and the metal 10 on the entire surface. And removing the channel portions of the two layers selectively to form source / drain electrodes (7,8). 제 1 항에 있어서, 반도체층(4)의 폭은 게이트 전극(2) 폭보다 작고, 에치스토퍼층(5)의 폭보다 크게 형성함을 특징으로 하는 박막트랜지스터 제조방법.A method according to claim 1, wherein the width of the semiconductor layer (4) is smaller than the width of the gate electrode (2) and larger than the width of the etch stopper layer (5). 제 1 항에 있어서, 에치스토퍼층(5)과 반도체층(4)을 테이퍼 식각한 뒤 반도체층(4) 표면에 n형 이온주입하여 불순물 반도체층(6)을 형성한뒤 그 위에 금속(10)을 증착하고 열처리하여 실리사이드로 된 소오스/드레인 전극(7,8)을 형성함을 특징으로 하는 박막트랜지스터 제조방법.The impurity semiconductor layer 6 according to claim 1, wherein the etch stopper layer 5 and the semiconductor layer 4 are tapered-etched and n-type ions are implanted into the surface of the semiconductor layer 4 to form the impurity semiconductor layer 6 thereon. And depositing and heat-treating to form a source / drain electrode (7, 8) made of silicide. 제 1 항에 있어서, 에치스토퍼층(5)과 반도체층(4)의 동시 테이퍼 식각은 BOE용액으로 에치스토퍼층(5)을 습식식각 하고 CF4+O2또는 C2ClF5+O2가스로 반도체층(4)을 건식식각함을 특징으로 하는 박막트랜지스터 제조방법.2. The simultaneous taper etching of the etch stopper layer (5) and the semiconductor layer (4) is performed by wet etching the etch stopper layer (5) with a BOE solution and using a CF 4 + O 2 or C 2 ClF 5 + O 2 gas. The method of manufacturing a thin film transistor, characterized in that the semiconductor layer 4 by dry etching. 제 1 항에 있어서, 에치스토퍼층(5)과 반도체층(4)의 동시 테이퍼 식각시 C2ClF5:SF6:O2=6:4:3 비율의 에칭가스를 사용하여 식각함을 특징으로 하는 박막트랜지스터 제조방법.The etching method according to claim 1, wherein the etching of the etch stopper layer 5 and the semiconductor layer 4 is performed using an etching gas having a ratio of C 2 ClF 5 : SF 6 : O 2 = 6: 4: 3. Thin film transistor manufacturing method. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920026230A 1992-12-29 1992-12-29 Method for manufacturing thin film transistor KR100290919B1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1019920026230A KR100290919B1 (en) 1992-12-29 1992-12-29 Method for manufacturing thin film transistor
JP33202893A JP3537854B2 (en) 1992-12-29 1993-12-27 Method for manufacturing thin film transistor
US08/174,208 US5610082A (en) 1992-12-29 1993-12-28 Method for fabricating thin film transistor using back light exposure
DE4344897A DE4344897B4 (en) 1992-12-29 1993-12-29 Process for the production of thin-film transistors
CN 93119958 CN1033252C (en) 1992-12-29 1993-12-29 Method for fabricating thin film transistor
FR9315834A FR2700062B1 (en) 1992-12-29 1993-12-29 Method for manufacturing a thin film transistor.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920026230A KR100290919B1 (en) 1992-12-29 1992-12-29 Method for manufacturing thin film transistor

Publications (2)

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KR940016915A true KR940016915A (en) 1994-07-25
KR100290919B1 KR100290919B1 (en) 2001-10-24

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Publication number Priority date Publication date Assignee Title
KR102640164B1 (en) 2016-05-09 2024-02-23 삼성디스플레이 주식회사 Thin film transistor array panel

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