KR930009028A - Semiconductor package using interconnect lead and manufacturing method thereof - Google Patents

Semiconductor package using interconnect lead and manufacturing method thereof Download PDF

Info

Publication number
KR930009028A
KR930009028A KR1019910017974A KR910017974A KR930009028A KR 930009028 A KR930009028 A KR 930009028A KR 1019910017974 A KR1019910017974 A KR 1019910017974A KR 910017974 A KR910017974 A KR 910017974A KR 930009028 A KR930009028 A KR 930009028A
Authority
KR
South Korea
Prior art keywords
lead
semiconductor chip
semiconductor package
interconnect
inner lead
Prior art date
Application number
KR1019910017974A
Other languages
Korean (ko)
Other versions
KR940008329B1 (en
Inventor
김영선
Original Assignee
문정환
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 문정환, 금성일렉트론 주식회사 filed Critical 문정환
Priority to KR1019910017974A priority Critical patent/KR940008329B1/en
Publication of KR930009028A publication Critical patent/KR930009028A/en
Application granted granted Critical
Publication of KR940008329B1 publication Critical patent/KR940008329B1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/4826Connecting between the body and an opposite side of the item with respect to the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73215Layer and wire connectors

Abstract

본 고안은 인터컨넥트 리드를 이용한 반도체 패키지 및 그 제조방법에 관한 것으로 반도체칩의 중앙부에 구비된 복수개의 본드패드와 리드프레임의 인너리드를 전기적으로 접속 연결하고 봉합하여 구성하는 반도체 패키지에 있어서, 상기 인너리드를 짧게 형성하고 그 인너리드와 반도체칩의 본드패드를 전기적으로 접속연결시키기 위한 인터컨넥트 리드를 상기 반도체칩의 상면에 부착하여 구성함을 특징으로 하고 있으며, 상기 인너컨넥트 리드는 상, 하절연판의 사이에 반도체칩의 본드패드와 연결되는 내부리드와, 리드프레임의 인너리드와 연결되는 외부리드가 구비된 복수개의 전도성 리드가 형성되어 있다.The present invention relates to a semiconductor package using an interconnect lead and a method of manufacturing the same. A semiconductor package comprising a plurality of bond pads provided at a central portion of a semiconductor chip and an inner lead of a lead frame, wherein the semiconductor package is electrically connected and sealed. An interconnect lead is formed on the upper surface of the semiconductor chip to shorten the inner lead and electrically connect the inner lead and the bond pad of the semiconductor chip. A plurality of conductive leads including an inner lead connected to the bond pad of the semiconductor chip and an outer lead connected to the inner lead of the lead frame are formed between the insulating plates.

이와같이 구성되는 본 발명은 리드프레임의 인너리드가 짧아 리드의 평면도 문제를 해결할 수 있고 제조공정이 단축되며 다핀의 DiP타입 패키지를 실현할 수 있는 등의 효과가 있다.The present invention configured as described above has the effect of shortening the inner lead of the lead frame to solve the plan problem of the lead, shortening the manufacturing process, and realizing a multi-pin DiP type package.

Description

인터컨넥트 리드를 이용한 반도체 패키지 및 그 제조방법Semiconductor package using interconnect lead and manufacturing method thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명에 의한 인터컨넥트 리드(interconncet-lid)를 이용한 반도체 패키지의 구성도,2 is a configuration diagram of a semiconductor package using an interconnect lead according to the present invention;

제3도는 본 발명에 사용되는 인터컨넥트 리드의 구성을 보이는 평면도.3 is a plan view showing the configuration of the interconnect lead used in the present invention.

Claims (7)

반도체칩(11)의 중앙부에 구비된 복수개의 본드패드(12)와 리드프레임의 인너리드(13)를 전기적으로 접속 연결하고 봉합하여 구성하는 반도체 패키지에 있어서, 상기 인너리드(13)를 짧게 형성하고 그 인너리드(13)와 반도체칩(11)의 본드패드(12)를 전기적으로 접속연결시키기 위한 인터컨넥트리드(14)를 상기 반도체칩(11)의 상면에 부착하여 구성함을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지.In the semiconductor package formed by electrically connecting, connecting and sealing the plurality of bond pads 12 provided in the center portion of the semiconductor chip 11 and the inner lead 13 of the lead frame, the inner lead 13 is formed to be short. And an interconnect 14 for electrically connecting and connecting the inner lead 13 and the bond pad 12 of the semiconductor chip 11 to the upper surface of the semiconductor chip 11. Semiconductor package using interconnect leads. 제1항에 있어서, 상기 인너컨넥트리드(14)는 상, 하절연판(15), (16)의 사이에 반도체칩(11)의 본드패드(12)와 연결되는 내부리드(17a)와, 리드프레임의 인너리드(13)와 연결되는 외부리드(17b)가 구비된 복수개의 전도성 리드(17)가 형성된 것임을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지.The inner connector (14) of claim 1, wherein the inner connect (14) includes an inner lead (17a) connected to the bond pads (12) of the semiconductor chip (11) between the upper and lower insulating plates (15) and (16). A semiconductor package using an interconnect lead, characterized in that a plurality of conductive leads (17) having an outer lead (17b) connected to the inner lead (13) of the frame is formed. 제2항에 있어서, 상기 상, 하절연판(15), (16)의 재질은 각 전도성리드(17)들을 절연시킬 수 있도록 폴리이미드계 수지 또는, 코팅액으로 형성됨을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지.The interconnect lead according to claim 2, wherein the upper and lower insulating plates 15 and 16 are made of polyimide resin or a coating liquid to insulate the conductive leads 17. Semiconductor package. 제2항에 있어서, 상기 전도성리드(17)의 재질은 리드프레임의 재질과 동일한 것임을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지.3. The semiconductor package according to claim 2, wherein the material of the conductive lead (17) is the same as that of the lead frame. 제2항에 있어서, 상기 전도성리드(17)의 재질은 알루미늄 또는 골드인 것을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지.3. The semiconductor package according to claim 2, wherein the conductive lead (17) is made of aluminum or gold. 반도체 패키지 제조방법에 있어서, 반도체칩(11)의 양측으로 인접하게 리드프레임의 인너리드(13)를 피딩시키는 공정과, 상기 반도체칩(11)의 상면에 인터컨넥트리드(14)를 부착시키는 공정과, 상기 반도체칩(11)의 본드패드(12)와 리드프레임의 인너리드(13)를 전기적으로 접속연결시키는 본딩공정과, 상기 반도체칩(11)과 리드프레임의 아웃리드(19)를 포함하는 일정부위를 밀폐시키는 봉합공정과, 통상적인 트리밍/포밍공정 및 플래팅 공정을 포함하여 제작됨을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지 제조방법.In the method of manufacturing a semiconductor package, a step of feeding the inner lead 13 of the lead frame adjacent to both sides of the semiconductor chip 11, and the step of attaching the interconnect 14 to the upper surface of the semiconductor chip 11 And a bonding process for electrically connecting and bonding the bond pad 12 of the semiconductor chip 11 and the inner lead 13 of the lead frame, and the semiconductor chip 11 and the out lead 19 of the lead frame. Method for manufacturing a semiconductor package using an interconnect lead characterized in that it comprises a sealing process for sealing a certain portion to be made, including a conventional trimming / forming process and a plating process. 제6항에 있어서, 상기 인터컨넥트리드(14) 제조방법은 비전도성 재질을 이용하여 하부절연판(16)을 형성하는 공정과, 그 하부 절연판(16)위에 전도성 금속으로 미들플레이트(20)를 형성하는 공정과, 그 미들플레이트(20)에 포토/에치방법으로 복수개의 와이어 또는 리드를 형성하는 공정과, 그위에 비전도성 재질을 이용하여 상부 절연판(15)을 형성하는 공정과, 적용할 칩사이즈 및 본드패드(12)의 위치에 맞게 포토/에치방법으로 모양을 형성하는 공정과, 적용할 패키지 사이즈에 맞게 레이저 등으로 커팅하는 공정을 포함하여 제작됨을 특징으로 하는 인터컨넥트 리드를 이용한 반도체 패키지 제조방법.The method of claim 6, wherein the method of manufacturing the interconnect 14 comprises forming a lower insulating plate 16 using a non-conductive material, and forming a middle plate 20 of a conductive metal on the lower insulating plate 16. A process of forming a plurality of wires or leads on the middle plate 20 by a photo / etch method, a process of forming an upper insulating plate 15 using a non-conductive material thereon, and a chip size to be applied. And a process of forming a shape by a photo / etch method according to the position of the bond pad 12 and a process of cutting with a laser or the like according to a package size to be applied. Way. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019910017974A 1991-10-12 1991-10-12 Semiconductor package using inter connect lead and manufacturing method thereof KR940008329B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019910017974A KR940008329B1 (en) 1991-10-12 1991-10-12 Semiconductor package using inter connect lead and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019910017974A KR940008329B1 (en) 1991-10-12 1991-10-12 Semiconductor package using inter connect lead and manufacturing method thereof

Publications (2)

Publication Number Publication Date
KR930009028A true KR930009028A (en) 1993-05-22
KR940008329B1 KR940008329B1 (en) 1994-09-12

Family

ID=19321169

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910017974A KR940008329B1 (en) 1991-10-12 1991-10-12 Semiconductor package using inter connect lead and manufacturing method thereof

Country Status (1)

Country Link
KR (1) KR940008329B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104591078B (en) * 2013-10-31 2016-08-10 无锡华润安盛科技有限公司 What a kind of MEMS sensor dipped in adhesive dispenser and application thereof dips in gluing method

Also Published As

Publication number Publication date
KR940008329B1 (en) 1994-09-12

Similar Documents

Publication Publication Date Title
US3591839A (en) Micro-electronic circuit with novel hermetic sealing structure and method of manufacture
KR100214561B1 (en) Buttom lead package
JP4294161B2 (en) Stack package and manufacturing method thereof
JP2840316B2 (en) Semiconductor device and manufacturing method thereof
KR960019680A (en) Semiconductor device package method and device package
KR900005587A (en) Semiconductor device and manufacturing method
KR920010853A (en) Resin-sealed semiconductor device
KR970077540A (en) Manufacturing method of chip size package
KR900017153A (en) Semiconductor device and manufacturing method thereof
US6037662A (en) Chip scale package
JPS60167454A (en) Semiconductor device
KR970077584A (en) Semiconductor device and manufacturing method
JP2569400B2 (en) Method for manufacturing resin-encapsulated semiconductor device
KR930017154A (en) Semiconductor package
KR930009028A (en) Semiconductor package using interconnect lead and manufacturing method thereof
KR100218335B1 (en) Chip-sized package
JPS63160262A (en) Lead frame and semiconductor device using the same
JPH0451056B2 (en)
JP2002164496A (en) Semiconductor device and method for manufacturing the same
KR0163524B1 (en) Ball grid array package formed conducting pattern on the inner face of cap type package body
KR960002344Y1 (en) Semiconductor package
JPS6228780Y2 (en)
KR920008359Y1 (en) Lead frame
KR970013233A (en) Multi-chip package with center pad type chip using substrate
JPS63107126A (en) Semiconductor device

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20040820

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee