KR930004199A - 염산을 사용하여 클로로실란 증류 잔사를 폐수 없이 후처리하는 방법 - Google Patents

염산을 사용하여 클로로실란 증류 잔사를 폐수 없이 후처리하는 방법 Download PDF

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Publication number
KR930004199A
KR930004199A KR1019920014398A KR920014398A KR930004199A KR 930004199 A KR930004199 A KR 930004199A KR 1019920014398 A KR1019920014398 A KR 1019920014398A KR 920014398 A KR920014398 A KR 920014398A KR 930004199 A KR930004199 A KR 930004199A
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KR
South Korea
Prior art keywords
hydrochloric acid
minutes
distillation residue
working
waste water
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Application number
KR1019920014398A
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English (en)
Inventor
루프 클라우스
팔크 베른하르트
Original Assignee
볼프강 스티헤를링, 한나 스타일
휠스 아크티엔게젤샤프트
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Application filed by 볼프강 스티헤를링, 한나 스타일, 휠스 아크티엔게젤샤프트 filed Critical 볼프강 스티헤를링, 한나 스타일
Publication of KR930004199A publication Critical patent/KR930004199A/ko

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    • AHUMAN NECESSITIES
    • A62LIFE-SAVING; FIRE-FIGHTING
    • A62DCHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
    • A62D3/00Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances
    • A62D3/30Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances by reacting with chemical agents
    • A62D3/35Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances by reacting with chemical agents by hydrolysis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/1071Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • AHUMAN NECESSITIES
    • A62LIFE-SAVING; FIRE-FIGHTING
    • A62DCHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
    • A62D2101/00Harmful chemical substances made harmless, or less harmful, by effecting chemical change
    • A62D2101/20Organic substances
    • A62D2101/22Organic substances containing halogen

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Business, Economics & Management (AREA)
  • Emergency Management (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Silicon Compounds (AREA)
  • Processing Of Solid Wastes (AREA)

Abstract

내용 없음.

Description

염산을 사용하여 클로로실란 증류 잔사를 폐수 없이 후처리하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 클로로실란 증류 잔사를 후처리하는 전체적 공정을 도시한 것이다.

Claims (3)

  1. a) 클로로실산 증류 잔사를 액체 염산중에서 반응시키면서 염화수소를 방출시키고, b) a)에 따라 형성된 반응 혼합물을 응고시킨 후, c) 수득된 반응 혼합물의 고체 성분을 분리하고 잔류 액체를 a)로 재공급한 후, d) 단계 c)에서 수득한 습윤성 고체를 건조시키고 140℃ 이상의 온도에서 가열처리한 후, e) 단계 d)에서 방출된 기체 성분을 냉각계를 공급하고 응축물을 a)로 재공급함을 특징으로 하여, 클로로실란 증류 잔사를, 처리가능한 염화수소 및 무수 폐기물을 생성시키며 폐수없이 후처리하는 방법.
  2. 제1항에 있어서, 가열처리를 300℃에서 15분 이상, 230℃에서 30분 이상 및 200℃에서 60분 이상 지속하는 방법.
  3. 제1항에 있어서, 가수분해 중 사용되는 물을 염산의 형태로 보충하는 방법.
    ※참고사항:최초출원 내용에 의하여 공개하는 것임.
KR1019920014398A 1991-08-13 1992-08-11 염산을 사용하여 클로로실란 증류 잔사를 폐수 없이 후처리하는 방법 KR930004199A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4126670A DE4126670A1 (de) 1991-08-13 1991-08-13 Verfahren zur abwasserfreien aufarbeitung von rueckstaenden einer chlorsilandestillation mit salzsaeure
DEP4126670.6 1991-08-13

Publications (1)

Publication Number Publication Date
KR930004199A true KR930004199A (ko) 1993-03-22

Family

ID=6438164

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920014398A KR930004199A (ko) 1991-08-13 1992-08-11 염산을 사용하여 클로로실란 증류 잔사를 폐수 없이 후처리하는 방법

Country Status (6)

Country Link
US (1) US5246682A (ko)
EP (1) EP0527309A1 (ko)
JP (1) JPH05213605A (ko)
KR (1) KR930004199A (ko)
DE (1) DE4126670A1 (ko)
NO (1) NO923120L (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5876609A (en) * 1997-03-28 1999-03-02 General Electric Company Process for treating methylchlorosilanes by-products
US5905183A (en) * 1997-06-03 1999-05-18 General Electric Company Process for reducing the residual chloride concentration in copper containing solids
US6174349B1 (en) 1999-04-06 2001-01-16 Seh America, Inc. Continuous effluent gas scrubber system and method
DE19963433A1 (de) * 1999-12-28 2001-07-12 Degussa Verfahren zur Abscheidung von Chlorsilanen aus Gasströmen
DE10056722A1 (de) * 2000-11-15 2002-06-06 Solarworld Ag Verfahren zur Inertisierung von staubförmigen siliziummetallhaltigen Rückständen der Trichlorsilansynthese im Wirbelbett
JP4160930B2 (ja) * 2004-05-19 2008-10-08 シャープ株式会社 ハロシランの製造方法、固形分の精製方法
DE102008001576A1 (de) 2008-05-06 2009-11-12 Wacker Chemie Ag Verfahren zur Hydrolyse von Metallsalzen mit Emulsionen
US20100061912A1 (en) * 2008-09-08 2010-03-11 Stephen Michael Lord Apparatus for high temperature hydrolysis of water reactive halosilanes and halides and process for making same
US8277768B2 (en) 2008-11-14 2012-10-02 Texas Instruments Incorporated System and method for production of high purity silicon solids and solids therefrom
DE102013206228A1 (de) * 2013-04-09 2014-10-09 Wacker Chemie Ag Vorrichtung und Verfahren zur Behandlung von Chlorsilane enthaltenden Flüssigkeiten
US9695052B2 (en) 2014-07-01 2017-07-04 Rec Silicon Inc Recovery of hydrohalosilanes from reaction residues
WO2018074268A1 (ja) * 2016-10-18 2018-04-26 株式会社トクヤマ 残渣廃棄方法及びトリクロロシランの製造方法
US11034585B2 (en) * 2016-10-19 2021-06-15 Tokuyama Corporation Method for controlling concentration of solid content and method for producing trichlorosilane
CN108069428B (zh) * 2016-11-18 2023-10-10 江苏中能硅业科技发展有限公司 用于处理多晶硅副产渣浆的装置和工艺

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE792542A (fr) * 1971-12-11 1973-03-30 Degussa Procede pour la fabrication de chlorosilanes exempts de metaux lors de la chloration ou l'hydrochloration de ferrosilicium
DE3642285C1 (de) * 1986-12-11 1988-06-01 Huels Troisdorf Verfahren zur Aufarbeitung von Rueckstaenden einer Chlorsilan-Destillation
US5094830A (en) * 1987-03-24 1992-03-10 Novapure Corporation Process for removal of water and silicon mu-oxides from chlorosilanes
DE3742614A1 (de) * 1987-12-16 1989-06-29 Huels Chemische Werke Ag Verfahren zur aufarbeitung von rueckstaenden der destillation von chlorsilanen
US5182095A (en) * 1987-12-16 1993-01-26 Huls Troisdorf Aktiengesellschaft Method for processing residues from the distillation of chlorosilanes
DE3941825A1 (de) * 1989-12-19 1991-06-20 Huels Chemische Werke Ag Verfahren zur abwasserfreien aufarbeitung von rueckstaenden einer chlorsilandestillation mit calciumcarbonat
DE59004137D1 (de) * 1989-12-19 1994-02-17 Huels Chemische Werke Ag Verfahren zur abwasserfreien Aufarbeitung von Rückständen einer Chlorsilandestillation mit Calcium-Basen oder Calciumcarbonat.

Also Published As

Publication number Publication date
NO923120L (no) 1993-02-15
DE4126670A1 (de) 1993-02-18
NO923120D0 (no) 1992-08-11
US5246682A (en) 1993-09-21
EP0527309A1 (de) 1993-02-17
JPH05213605A (ja) 1993-08-24

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