KR930004071B1 - 플루오르-함유 산화주석 피막을 형성시키기 위한 화학적 증착법 - Google Patents

플루오르-함유 산화주석 피막을 형성시키기 위한 화학적 증착법 Download PDF

Info

Publication number
KR930004071B1
KR930004071B1 KR1019850009308A KR850009308A KR930004071B1 KR 930004071 B1 KR930004071 B1 KR 930004071B1 KR 1019850009308 A KR1019850009308 A KR 1019850009308A KR 850009308 A KR850009308 A KR 850009308A KR 930004071 B1 KR930004071 B1 KR 930004071B1
Authority
KR
South Korea
Prior art keywords
deposition method
vapor deposition
weight
carrier gas
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019850009308A
Other languages
English (en)
Korean (ko)
Other versions
KR860005048A (ko
Inventor
에취. 린드너 게오르그
Original Assignee
엘프 아토켐 노스 아메리카 인코포레이티드
프레드 더블유 베인
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24758907&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR930004071(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 엘프 아토켐 노스 아메리카 인코포레이티드, 프레드 더블유 베인 filed Critical 엘프 아토켐 노스 아메리카 인코포레이티드
Publication of KR860005048A publication Critical patent/KR860005048A/ko
Application granted granted Critical
Publication of KR930004071B1 publication Critical patent/KR930004071B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
KR1019850009308A 1984-12-28 1985-12-11 플루오르-함유 산화주석 피막을 형성시키기 위한 화학적 증착법 Expired - Fee Related KR930004071B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US687,067 1984-12-28
US06/687,067 US4590096A (en) 1984-12-28 1984-12-28 Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass

Publications (2)

Publication Number Publication Date
KR860005048A KR860005048A (ko) 1986-07-16
KR930004071B1 true KR930004071B1 (ko) 1993-05-20

Family

ID=24758907

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850009308A Expired - Fee Related KR930004071B1 (ko) 1984-12-28 1985-12-11 플루오르-함유 산화주석 피막을 형성시키기 위한 화학적 증착법

Country Status (4)

Country Link
US (1) US4590096A (enExample)
JP (1) JPS62124276A (enExample)
KR (1) KR930004071B1 (enExample)
ZA (1) ZA859527B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101352922B1 (ko) * 2009-03-31 2014-01-17 피피지 인더스트리즈 오하이오 인코포레이티드 모노부틸틴 트리클로라이드의 회수

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4696837A (en) * 1985-06-25 1987-09-29 M&T Chemicals Inc. Chemical vapor deposition method of producing fluorine-doped tin oxide coatings
BR8606673A (pt) * 1985-05-14 1987-08-11 M & T Chemicals Inc Processo para produzir revestimentos de oxido de estanho transparentes;livres de turvacao
US4776870A (en) * 1985-08-05 1988-10-11 Ford Motor Company Method for improving emmissivity value of a pyrolytically applied film
GB8630791D0 (en) * 1986-12-23 1987-02-04 Glaverbel Coating glass
US5004490A (en) * 1987-08-10 1991-04-02 Ford Motor Company Method of making glass substrate coated with tin oxide
US4857095A (en) * 1987-08-10 1989-08-15 Ford Motor Company Method for forming a fluorine-doped tin oxide coating on a glass substrate
US5108983A (en) * 1989-11-21 1992-04-28 Georgia Tech Research Corporation Method for the rapid deposition with low vapor pressure reactants by chemical vapor deposition
US5124180A (en) * 1991-03-11 1992-06-23 Btu Engineering Corporation Method for the formation of fluorine doped metal oxide films
US5393563A (en) * 1991-10-29 1995-02-28 Ellis, Jr.; Frank B. Formation of tin oxide films on glass substrates
CA2104591C (en) * 1991-12-26 2000-03-14 David A. Russo Composition for coating glass containing an accelerant
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5496583A (en) * 1994-08-29 1996-03-05 Amoco/Enron Solar Hydrogen fluoride dopant source in the preparation of conductive coated substrate
US5725904A (en) * 1995-06-02 1998-03-10 Elf Atochem North America, Inc. Liquid methyltin halide compositions
DE19526100C1 (de) * 1995-07-18 1996-07-18 Goldschmidt Ag Th Stabilisiertes Monobutylzinntrichlorid
US5536308A (en) * 1995-07-21 1996-07-16 Quattlebaum, Jr.; William M. Compositions and methods for glass coating formation
GB9515198D0 (en) * 1995-07-25 1995-09-20 Pilkington Plc A method of coating glass
US5698262A (en) * 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
GB9616983D0 (en) 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
ATE231193T1 (de) * 1998-07-10 2003-02-15 Gilles Merienne Flüssige cvd-vorläuferverbindung
US6596398B1 (en) 1998-08-21 2003-07-22 Atofina Chemicals, Inc. Solar control coated glass
JP4272534B2 (ja) * 2002-01-28 2009-06-03 日本板硝子株式会社 透明導電膜を備えたガラス基板の製造方法、透明導電膜を備えたガラス基板、およびそれを用いた光電変換装置
US20050196623A1 (en) * 2004-03-03 2005-09-08 Mckown Clem S.Jr. Solar control coated glass composition
US8734903B2 (en) * 2011-09-19 2014-05-27 Pilkington Group Limited Process for forming a silica coating on a glass substrate
CN102603206A (zh) * 2012-03-21 2012-07-25 浙江大学 一种多层氧化锡掺氟镀膜玻璃及其制备方法
US20130334089A1 (en) * 2012-06-15 2013-12-19 Michael P. Remington, Jr. Glass Container Insulative Coating
GB201515985D0 (en) * 2015-09-09 2015-10-21 Pilkington Group Ltd Deposition process

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265974A (en) * 1976-11-01 1981-05-05 Gordon Roy G Electrically conductive, infrared reflective, transparent coatings of stannic oxide
US4293594A (en) * 1980-08-22 1981-10-06 Westinghouse Electric Corp. Method for forming conductive, transparent coating on a substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101352922B1 (ko) * 2009-03-31 2014-01-17 피피지 인더스트리즈 오하이오 인코포레이티드 모노부틸틴 트리클로라이드의 회수

Also Published As

Publication number Publication date
KR860005048A (ko) 1986-07-16
JPH036993B2 (enExample) 1991-01-31
ZA859527B (en) 1986-08-27
JPS62124276A (ja) 1987-06-05
US4590096A (en) 1986-05-20

Similar Documents

Publication Publication Date Title
KR930004071B1 (ko) 플루오르-함유 산화주석 피막을 형성시키기 위한 화학적 증착법
US4601917A (en) Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings
US4696837A (en) Chemical vapor deposition method of producing fluorine-doped tin oxide coatings
EP0186481B1 (en) Improved chemical vapor deposition method of producing fluorine-doped tin oxide coatings
GB2033357A (en) Processes for the Production of Tin Oxide Coatings and Articles Having Such Coatings
US4965137A (en) Liquid preparation for the production of electrically conductive and infrared-reflecting fluorine-doped tin oxide layers on glass or glass-ceramic surfaces, as well as a method for the production of such layers
US4743506A (en) Tin oxide coated article
US4731256A (en) Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings
EP0158399B1 (en) Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings
US4731462A (en) Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating
US4788079A (en) Method of making haze-free tin oxide coatings
JP3423770B2 (ja) フッ素ドープ酸化スズ被膜の形成用の液体前駆物質および該液体前駆物質の被覆方法
KR960015222B1 (ko) 유기 디- 또는 트리카르복실레이트와 유기 플루오로산의 액체 피복조성물과, 낮은 체적 저항률과 낮은 헤이즈 값을 갖는 유리에 불소-도우프 산화 주석 피막을 형성시키는 화학 증착법
KR920007956B1 (ko) 헤이즈가 없는 투명한 산화주석코팅막의 제조방법
JPH046796B2 (enExample)
US5000790A (en) Liquid coating composition comprising an organotin di- or tricarboxylate and an organic fluoroacid, and method of coating a transparent substrate therewith
KR890004619B1 (ko) 플루오르화물이 함유된 산화주석피막 형성용 액체조성물과 피막의 형성방법
JP2708120B2 (ja) 透明酸化物薄膜用塗布液の製造方法および透明酸化物薄膜付基材
JPH06263443A (ja) 透明導電性酸化スズ膜の製造方法
CN85102350A (zh) 制造高质量、高性能、含氟氧化锡涂层的液态涂料配方
JP2004039269A (ja) 透明導電膜付基体の製造方法
JPH01230201A (ja) 感湿体薄膜およびその製造方法
CN1038260A (zh) 不混浊的红外线反射涂层玻璃

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

St.27 status event code: A-2-2-Q10-Q13-nap-PG1605

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20000422

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20010521

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20010521

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000