DE69904942D1 - Flüssige cvd-vorläuferverbindung - Google Patents

Flüssige cvd-vorläuferverbindung

Info

Publication number
DE69904942D1
DE69904942D1 DE69904942T DE69904942T DE69904942D1 DE 69904942 D1 DE69904942 D1 DE 69904942D1 DE 69904942 T DE69904942 T DE 69904942T DE 69904942 T DE69904942 T DE 69904942T DE 69904942 D1 DE69904942 D1 DE 69904942D1
Authority
DE
Germany
Prior art keywords
precondition
liquid cvd
polyfluoroalkenyl
compound
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69904942T
Other languages
English (en)
Inventor
Gilles Merienne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE69904942D1 publication Critical patent/DE69904942D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Steroid Compounds (AREA)
DE69904942T 1998-07-10 1999-07-05 Flüssige cvd-vorläuferverbindung Expired - Lifetime DE69904942D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11319698A 1998-07-10 1998-07-10
PCT/IB1999/001245 WO2000003063A1 (en) 1998-07-10 1999-07-05 Liquid precursor for chemical vapor deposition

Publications (1)

Publication Number Publication Date
DE69904942D1 true DE69904942D1 (de) 2003-02-20

Family

ID=22348094

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69904942T Expired - Lifetime DE69904942D1 (de) 1998-07-10 1999-07-05 Flüssige cvd-vorläuferverbindung

Country Status (8)

Country Link
US (1) US6689203B2 (de)
EP (1) EP1099006B1 (de)
JP (1) JP2002520488A (de)
KR (1) KR100666521B1 (de)
AT (1) ATE231193T1 (de)
AU (1) AU4386399A (de)
DE (1) DE69904942D1 (de)
WO (1) WO2000003063A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4041945B2 (ja) * 2000-05-22 2008-02-06 セイコーエプソン株式会社 ヘッド部材及び撥インク処理方法並びに処理装置
EP2067474A1 (de) 2007-12-05 2009-06-10 Grindeks, a joint stock company Neue medizinische Verwendung von 3-(2,2,2-Trimethylhydrazinium)propionat-Salz
TW202010746A (zh) * 2018-06-30 2020-03-16 美商應用材料股份有限公司 含錫之前驅物及沉積含錫薄膜之方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018090B2 (ja) * 1979-10-03 1985-05-08 日本板硝子株式会社 導電薄膜の形成方法
US4705701A (en) * 1984-11-14 1987-11-10 Chronar Corporation Conductive tin oxide methods
US4590096A (en) * 1984-12-28 1986-05-20 M&T Chemicals Inc. Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass
US4547400A (en) * 1985-02-25 1985-10-15 Ford Motor Company Method of making infrared reflective glass sheet-I
DE3673612D1 (de) * 1985-05-14 1990-09-27 M & T Chemicals Inc Herstellungsverfahren durchsichtiger schleierfreier zinnoxydschichten.

Also Published As

Publication number Publication date
JP2002520488A (ja) 2002-07-09
KR100666521B1 (ko) 2007-01-11
EP1099006A1 (de) 2001-05-16
EP1099006B1 (de) 2003-01-15
ATE231193T1 (de) 2003-02-15
KR20010074688A (ko) 2001-08-09
US6689203B2 (en) 2004-02-10
AU4386399A (en) 2000-02-01
WO2000003063A1 (en) 2000-01-20
US20030035890A1 (en) 2003-02-20

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Legal Events

Date Code Title Description
8332 No legal effect for de