KR930003809B1 - 자동정밀 배열장치 - Google Patents

자동정밀 배열장치 Download PDF

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Publication number
KR930003809B1
KR930003809B1 KR1019850003480A KR850003480A KR930003809B1 KR 930003809 B1 KR930003809 B1 KR 930003809B1 KR 1019850003480 A KR1019850003480 A KR 1019850003480A KR 850003480 A KR850003480 A KR 850003480A KR 930003809 B1 KR930003809 B1 KR 930003809B1
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KR
South Korea
Prior art keywords
pattern
magnification
high magnification
key pattern
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019850003480A
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English (en)
Korean (ko)
Other versions
KR850008053A (ko
Inventor
마사노리 우가
Original Assignee
가부시끼가이샤 디스코
세끼야 겐이찌
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 가부시끼가이샤 디스코, 세끼야 겐이찌 filed Critical 가부시끼가이샤 디스코
Publication of KR850008053A publication Critical patent/KR850008053A/ko
Application granted granted Critical
Publication of KR930003809B1 publication Critical patent/KR930003809B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q15/00Automatic control or regulation of feed movement, cutting velocity or position of tool or work
    • B23Q15/20Automatic control or regulation of feed movement, cutting velocity or position of tool or work before or after the tool acts upon the workpiece
    • B23Q15/22Control or regulation of position of tool or workpiece
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/70Determining position or orientation of objects or cameras
    • G06T7/73Determining position or orientation of objects or cameras using feature-based methods
    • G06T7/74Determining position or orientation of objects or cameras using feature-based methods involving reference images or patches
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00Arrangements for image or video recognition or understanding
    • G06V10/40Extraction of image or video features
    • G06V10/44Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components
    • G06V10/443Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components by matching or filtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/10Integrated device layouts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0428Apparatus for mechanical treatment or grinding or cutting
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20016Hierarchical, coarse-to-fine, multiscale or multiresolution image processing; Pyramid transform
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Multimedia (AREA)
  • Dicing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1019850003480A 1984-05-21 1985-05-21 자동정밀 배열장치 Expired - Lifetime KR930003809B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP100658 1984-05-21
JP59100658A JPS60244803A (ja) 1984-05-21 1984-05-21 自動精密位置合せシステム

Publications (2)

Publication Number Publication Date
KR850008053A KR850008053A (ko) 1985-12-11
KR930003809B1 true KR930003809B1 (ko) 1993-05-13

Family

ID=14279904

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850003480A Expired - Lifetime KR930003809B1 (ko) 1984-05-21 1985-05-21 자동정밀 배열장치

Country Status (3)

Country Link
US (1) US4757550A (enExample)
JP (1) JPS60244803A (enExample)
KR (1) KR930003809B1 (enExample)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937618A (en) * 1984-10-18 1990-06-26 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
US4864630A (en) * 1986-07-30 1989-09-05 Drexler Technology Corporation Method and apparatus for reading data pages on a data surface
JP2675307B2 (ja) * 1987-08-28 1997-11-12 株式会社日立製作所 プリアライナー装置
US4929893A (en) * 1987-10-06 1990-05-29 Canon Kabushiki Kaisha Wafer prober
US4866629A (en) * 1987-11-13 1989-09-12 Industrial Technology Research Institute Machine vision process and apparatus for reading a plurality of separated figures
EP0435660B1 (en) * 1989-12-29 1997-06-04 Canon Kabushiki Kaisha Method of evaluating objects based upon image processing, and inspection apparatus using said method
US5243665A (en) * 1990-03-07 1993-09-07 Fmc Corporation Component surface distortion evaluation apparatus and method
US5220614A (en) * 1991-02-22 1993-06-15 Professional Coin Grading Service, Inc. Automated coin grading system
JP3029694B2 (ja) * 1991-04-19 2000-04-04 株式会社東芝 半導体ウエハ処理装置
DE4218063C2 (de) * 1991-05-31 1995-07-20 Sumitomo Heavy Industries Bildabtastsystem für aufgedruckte Registermarken
US5495535A (en) * 1992-01-31 1996-02-27 Orbotech Ltd Method of inspecting articles
US5305099A (en) * 1992-12-02 1994-04-19 Joseph A. Morcos Web alignment monitoring system
US5500906A (en) * 1994-01-14 1996-03-19 Cognex Corporation Locating curvilinear objects using feathered fiducials
US5943089A (en) * 1996-08-23 1999-08-24 Speedline Technologies, Inc. Method and apparatus for viewing an object and for viewing a device that acts upon the object
JP3384335B2 (ja) * 1998-09-02 2003-03-10 松下電器産業株式会社 自動組立装置および自動組立方法
US6348943B1 (en) * 1998-10-30 2002-02-19 Industrial Technology Research Institute Digital non-contact blade position detection apparatus
US6847729B1 (en) 1999-04-21 2005-01-25 Fairfield Imaging Limited Microscopy
JP4542223B2 (ja) * 2000-04-14 2010-09-08 株式会社ディスコ 切削装置
US6583879B1 (en) 2002-01-11 2003-06-24 X-Rite, Incorporated Benchtop spectrophotometer with improved targeting
US6996264B2 (en) * 2002-10-18 2006-02-07 Leco Corporation Indentation hardness test system
US20040092048A1 (en) * 2002-11-13 2004-05-13 Chiu-Tien Hsu Angle control system including a display device configured with two imaging windows that simultaneously display the same image captured by a single camera
US7054477B2 (en) * 2002-11-13 2006-05-30 Uni-Tek System, Inc. Automatic accurate alignment method for a semiconductor wafer cutting apparatus
DE10253250B4 (de) * 2002-11-15 2004-09-30 Uni-Tek System Inc. Automatisches Präzisionsausrichtungsverfahren für eine Halbleiterwaferschneidevorrichtung
GB2398196B (en) * 2003-02-05 2005-06-01 Fairfield Imaging Ltd Microscope system and method
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
WO2006083581A2 (en) * 2005-01-31 2006-08-10 Cascade Microtech, Inc. Microscope system for testing semiconductors
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7538868B2 (en) * 2005-12-19 2009-05-26 Kla-Tencor Technologies Corporation Pattern recognition matching for bright field imaging of low contrast semiconductor devices
US20070278421A1 (en) * 2006-04-24 2007-12-06 Gleason K R Sample preparation technique
JP2009300230A (ja) * 2008-06-12 2009-12-24 Olympus Corp 位置合わせを行う装置、方法、およびプログラム、ならびに基準モデルを作成する装置、方法、およびプログラム
JP5324232B2 (ja) * 2009-01-08 2013-10-23 日東電工株式会社 半導体ウエハのアライメント装置
JP5602548B2 (ja) * 2010-09-01 2014-10-08 株式会社ディスコ 加工位置検出方法
CN103831665B (zh) * 2012-11-23 2016-07-06 江西昌河航空工业有限公司 一种五轴机床旋转轴定位精度检测和校正方法
JP2014203917A (ja) 2013-04-03 2014-10-27 株式会社ディスコ 板状物
JP2014211417A (ja) * 2013-04-22 2014-11-13 株式会社ニューフレアテクノロジー パターン検査装置及びパターン検査方法
JP6979312B2 (ja) * 2017-09-08 2021-12-08 株式会社ディスコ アライメントパターンの設定方法
JP7022624B2 (ja) * 2018-03-13 2022-02-18 株式会社ディスコ 位置付け方法
JP7191473B2 (ja) 2019-01-29 2022-12-19 株式会社ディスコ キーパターンの検出方法、及び装置
JP7325904B2 (ja) * 2019-07-26 2023-08-15 株式会社ディスコ 切削ユニットの位置検出方法、及び切削装置
CN119310080A (zh) * 2019-12-31 2025-01-14 深圳迈瑞生物医疗电子股份有限公司 图像分析系统和控制拍摄样本图像的方法
JP7766513B2 (ja) 2022-02-10 2025-11-10 株式会社ディスコ アライメント方法
CN114973991A (zh) * 2022-04-11 2022-08-30 武汉精立电子技术有限公司 一种用于立方体三色合光棱镜与微显示屏贴合的相机对位机构、方法和系统
KR102541500B1 (ko) * 2022-11-14 2023-06-13 (주)오로스테크놀로지 상관관계 기반 오버레이 키 센터링 시스템 및 그 방법

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3450480A (en) * 1965-04-08 1969-06-17 Optomechanisms Inc Comparison viewer
US3895854A (en) * 1973-10-18 1975-07-22 Coulter Electronics Chromatic method and apparatus for conducting microscopic examinations at a plurality of magnifications
US4019173A (en) * 1974-07-08 1977-04-19 Agency Of Industrial Science & Technology System for recognition of shape patterns
JPS5214112A (en) * 1975-07-24 1977-02-02 Nissan Motor Co Ltd Torch iginition system internal combustion engine
JPS52140278A (en) * 1976-05-19 1977-11-22 Hitachi Ltd Position detector
US4244029A (en) * 1977-12-12 1981-01-06 Goodyear Aerospace Corporation Digital video correlator
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
US4310850A (en) * 1980-07-21 1982-01-12 Bethlehem Steel Corporation Solid-state video camera having a video signal processor
FR2498767A1 (fr) * 1981-01-23 1982-07-30 Cameca Micro-analyseur a sonde electronique comportant un systeme d'observation a double grandissement
JPS5974525A (ja) * 1982-10-21 1984-04-27 Toshiba Corp 自動細胞診断装置
US4672557A (en) * 1983-03-26 1987-06-09 Disco Abrasive Systems, Ltd. Automatic accurate alignment system
DE3334691C2 (de) * 1983-09-24 1985-11-28 C. Reichert Optische Werke Ag, Wien Mikroskop
US4625330A (en) * 1983-12-19 1986-11-25 Ncr Corporation Video enhancement system
US4618938A (en) * 1984-02-22 1986-10-21 Kla Instruments Corporation Method and apparatus for automatic wafer inspection

Also Published As

Publication number Publication date
KR850008053A (ko) 1985-12-11
US4757550A (en) 1988-07-12
JPS60244803A (ja) 1985-12-04
JPH0327043B2 (enExample) 1991-04-12

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