KR930000707A - 밴드형 기초재의 연속 코팅 장치 - Google Patents
밴드형 기초재의 연속 코팅 장치 Download PDFInfo
- Publication number
- KR930000707A KR930000707A KR1019920001751A KR920001751A KR930000707A KR 930000707 A KR930000707 A KR 930000707A KR 1019920001751 A KR1019920001751 A KR 1019920001751A KR 920001751 A KR920001751 A KR 920001751A KR 930000707 A KR930000707 A KR 930000707A
- Authority
- KR
- South Korea
- Prior art keywords
- continuous coating
- band
- base material
- type base
- coating device
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 독립소스로서 배열된 선행기술의 알루미늄 밴드코팅용의 증착용기의 평면도.
Claims (4)
- 모두 전도성의 세라믹으로 만들어져 전류가 직접 통과함으로서 가열될 수 있는 같은 크기와 모양을 한 여러개의 증착기(1, 1`,...)가 밴드(A)의 진행방향과 같은 간격(X)의 평행한 증착기열을 형성하고, 증착할 와이어를 증착용기에 연속적으로 공급할 장치가 진공실 내에 설치되고, 증착용기열의 각 증착기(1, 1`,...)가 서로 엇갈려 배열되고, 전체 증착기(1, 1`,...)가 같이 밴드의 진행방향(A)과 수직인 좁은 코팅지역(B)을 카바함을 특징으로 하는 밴드형 기초재의 연속코팅장치.
- 제1항에 있어서, 코팅지역(B)의 넓이가 2×a이고, 이 넓이가 증착기(1, 1`,...)의 전반길이 보다 작음을 특징으로 하는 배드형 기초재의 연속코팅장치.
- 제1항 내지 제2항에 있어서, 인접한 두 증착기(1, 1`,...)의 간격(x)는 증착기(1,1',...)길이의 2/3 길이임을 특징으로 하는 밴드형 기초재의 연속코팅장치.
- 제1항 내지 제3항에 있어서, 각 증착기(1, 1`,...)에 공급된 전력은 독자적으로 통제될 수 있음을 특징으로 하는 밴드형 기초재의 연속코팅장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4120910A DE4120910A1 (de) | 1990-08-27 | 1991-06-25 | Vorrichtung zur laufenden beschichtung von bandfoermigen substraten |
DEP4120910.9 | 1991-06-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930000707A true KR930000707A (ko) | 1993-01-15 |
KR960002118B1 KR960002118B1 (ko) | 1996-02-10 |
Family
ID=6434677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920001751A KR960002118B1 (ko) | 1991-06-25 | 1992-02-07 | 밴드형 기초재의 연속 코팅 장치 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0520133B1 (ko) |
JP (1) | JPH05179446A (ko) |
KR (1) | KR960002118B1 (ko) |
DE (2) | DE4120910A1 (ko) |
ES (1) | ES2073790T3 (ko) |
IT (1) | IT222135Z2 (ko) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE970246C (de) * | 1948-10-02 | 1958-08-28 | Siemens Ag | Vorrichtung zur laufenden Bedampfung endloser Gebilde |
DE3615487A1 (de) * | 1986-05-07 | 1987-11-19 | Helmuth Schmoock | Vorrichtung zur gleichmaessigen metallisierung von folien |
DE4027034C1 (ko) * | 1990-08-27 | 1991-09-12 | Leybold Ag, 6450 Hanau, De |
-
1991
- 1991-06-25 DE DE4120910A patent/DE4120910A1/de not_active Withdrawn
- 1991-11-25 IT ITMI911027U patent/IT222135Z2/it active IP Right Grant
-
1992
- 1992-01-22 ES ES92100972T patent/ES2073790T3/es not_active Expired - Lifetime
- 1992-01-22 DE DE59202673T patent/DE59202673D1/de not_active Expired - Fee Related
- 1992-01-22 EP EP92100972A patent/EP0520133B1/de not_active Expired - Lifetime
- 1992-02-07 KR KR1019920001751A patent/KR960002118B1/ko not_active IP Right Cessation
- 1992-06-25 JP JP4167402A patent/JPH05179446A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE59202673D1 (de) | 1995-08-03 |
JPH05179446A (ja) | 1993-07-20 |
EP0520133B1 (de) | 1995-06-28 |
DE4120910A1 (de) | 1993-01-07 |
ITMI911027V0 (it) | 1991-11-25 |
ES2073790T3 (es) | 1995-08-16 |
ITMI911027U1 (it) | 1993-05-25 |
IT222135Z2 (it) | 1995-01-09 |
EP0520133A1 (de) | 1992-12-30 |
KR960002118B1 (ko) | 1996-02-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |