KR920702863A - 금속 킬레이트 화합물 및 그것을 이용한 광학적 기록 매체 - Google Patents
금속 킬레이트 화합물 및 그것을 이용한 광학적 기록 매체Info
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- KR920702863A KR920702863A KR1019910701635A KR910701635A KR920702863A KR 920702863 A KR920702863 A KR 920702863A KR 1019910701635 A KR1019910701635 A KR 1019910701635A KR 910701635 A KR910701635 A KR 910701635A KR 920702863 A KR920702863 A KR 920702863A
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- Prior art keywords
- group
- substituent
- alkyl group
- dis
- halogen atom
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- 239000013522 chelant Substances 0.000 title claims description 22
- 150000001875 compounds Chemical class 0.000 title claims description 22
- 239000002184 metal Substances 0.000 title claims 17
- 229910052751 metal Inorganic materials 0.000 title claims 17
- 230000003287 optical effect Effects 0.000 title claims 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 22
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 125000001424 substituent group Chemical group 0.000 claims 40
- 125000003118 aryl group Chemical group 0.000 claims 17
- -1 dis-azo compound Chemical class 0.000 claims 15
- 125000005843 halogen group Chemical group 0.000 claims 12
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 10
- 125000000217 alkyl group Chemical group 0.000 claims 9
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims 7
- 150000003839 salts Chemical class 0.000 claims 5
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims 3
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 239000010410 layer Substances 0.000 claims 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 3
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 claims 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000002738 chelating agent Substances 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 230000007704 transition Effects 0.000 claims 1
- 238000000862 absorption spectrum Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 7
- 238000002835 absorbance Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
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Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 실시예 1의 니켈 킬레이트 화합물의 가시 영역 흡수 스펙트럼을 나나태며, 종축은 흡광도, 횡축은 파장(nm)을 나타내는 도면이다
제2도는 실시예 1의 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제3도는 실시예 1의 코팅층의 흡수 스펙트럼이며, 종축은 흡광도, 횡축은 파장(nm)을 나타내는 도면이다
제4도는 실시예 2에서 수득한 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제5도는 실시예 3에서 수득한 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제6도는 실시예 4에서 수득한 니켈 킬레이트 화합물의 가시 영역 흡수 스펙트럼을 나타내는 도면이다
제7도는 실시예 4에서 수득한 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제8도는 실시예 6에서 수득한 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제9도는 실시예 9에서 수득한 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제10도는 실시예 13에서 수득한 니켈 킬레이트 화합물의 가시 영역 흡수 스펙트럼을 나타내는 도면이다
제11도는 실시예 13에서 수득한 니켈 킬레이트 화합물의 적외선 흡수 스펙트럼을 나타내는 도면이다
제12도는 실시예 13의 코팅층의 흡수 스펙트럼을 나타내는 도면이다
Claims (15)
- 하기실(Ⅰ)로 표현되는 디스-아조 화합물과 금속과의 금속 킬레이트 화합물:(식중, A는 그것이 결합된 탄소원자 및 질소원자와 함께 복소환을 형성하는 잔기이고, X는 그것이 결합된 두개의 탄소원자와 함께 방향족기를 형성하는 잔기이며, D는 치환기를 가질 수 있는 방향족 잔기 또는 치환기를 가질 수 있는 복소환 아민 잔기이고, Y는 활성수수로를 갖는 기이다.)
- 제1항에 있어서, 식(Ⅰ)에 있는 잔기 A가 하기식들로 표현되는 잔기들로 구성된 군으로부터 선택된 것인 금속 킬레이트 화합물:(식중, 환 B는 C1~6알킬기, C1~6일콕시기 또는 할로겐 원자에 의해 치환 가능하고, R3은 수소원자, C1~6알킬기, C1~6일콕시기, 할로겐 원자 또는 C1~12알릴기이며 R15는 수소원자 또는 C1~6알킬기이다.)
- 제1항에 있어서, 식(Ⅰ)에 있는 잔기 X가 -NR1R2(식중, 서로간에 독립적인 R1및 R2는 각각 수소원자, 치환기를 가질수 있는 C1~20알킬기, 치환기를 가질수 있는 C6~C12아릴기, 치환기를 가질수 있는 C2~10알케닐기 또는 치환기를 가질수 있는 C3~10시클로알킬기이다.), C1~6알킬기, C1~6일콕시기, 및 할로겐 원자로 구성된 군으로부터 선택된 1개 이상의 치환기를 갖는 금속 킬레이트 화합물.
- 제1항에 있어서, 식(Ⅰ)에 있는 잔기 D가 하기식들로 표현되는 잔기들로 구성된 군으로부터 선택된 것인 금속 킬레이트 화합물:[식중, 환 E는 치환기를 가질 수 있으며, 서로간에 독립적인 환 E의 치환체, R4, R5, R6, R7, R8, R9및 R10은 각각 C1~20알킬기, C1~20알킬기로 치환될수 있는 C3~10시클로알킬기, C1~20알콕시기, 니트로기, 시아노기, -COOR17(식중, R17은 C1~20알킬기, 치환기를 가질 수 있는 C3~10시클로알킬기 또는 치환기를 가질 수 있는 페닐기이다), C1~20알킬기 또는 C1~20알콕시기에 의해 치환될 수 있는 페닐기, C1~10알킬술포닐기, 할로겐 원자 또는 C1~3퍼플루오로알킬기이고, n은 1또는 2이며, m은 1, 2 또는 3이다.]
- 제1항에 있어서, 식(Ⅰ)에 있는 치환기 Y가 -OH, -SH, -COOH, -SO2H, -SO3H, -NH2, -B(OH)2, -PO(OH)2, -NHR16, -NHCOR16및 -NHSO2R16(식중, R16은 C1~6알킬기, C1~6일콕시기, 할로겐 원자로 치환될 수 있는 페닐기 또는 할로겐 원자로 치환될 수 있는 C1~6알킬기이다)로 로 구성된 군으로부터 선택된 것 또는 그의 염인 금속 킬레이트 화합물.
- 제1항에 있어서, 디스-아조 화합물이 하기 식(Ⅱ)로 표현되는 디스-아조 화합물인 금속 킬레이트 화합물:(식중, 환 B는 C1~6알킬기, C1~6알콕시기 또는 할로겐 원자에 의해 치환될 수 있고, X는 그것이 결합된 두 개의 탄소원자와 함께 방향족기를 형성하는 잔기이며, D는 치환기를 가질 수 있는 방향족 잔기 또는 치환기를 가질수 있는 복소환 아민 잔기이며, Y'는 -COOH, -SO3H 또는 그의 염이이다.)
- 제1항에 있어서, 디스-아조 화합물이 하기 식(Ⅲ)로 표현되는 디스-아조 화합물인 금속 킬레이트 화합물:(식중, 환 B는 C1~6알킬기, C1~6알콕시기 또는 할로겐 원자에 의해 치환될 수 있고, D는 치환기를 가질 수 있는 방향족 잔기 또는 치환기를 가질수 있는 복소환 아민 잔기이며, Y'는 -COOH, -SO3H 또는 그의 염이고, 서로간에 독립적인 R1및 R2는 각각 수소원자, 치환기를 가질수 있는 C1~20알킬기, 치환기를 가질수 있는 C6~12아릴기, 치환기를 가질수 있는 C2~10알케닐기 또는 치환기를 가질수 있는 C3~10시클로알킬기이며 환 C는 치환기를 가질수 있다.)
- 제1항에 있어서, 디스-아조 화합물이 하기 식(Ⅳ)로 표현되는 디스-아조 화합물인 금속 킬레이트 화합물:(식중, 환 B는 C1~6알킬기, C1~6알콕시기 또는 할로겐 원자에 의해 치환될 수 있고, Y'는 -COOH, -SO3H 또는 그의 염이고, 서로간에 독립적인 R1및 R2는 각각 수소원자, 치환기를 가질수 있는 C1~20알킬기, 치환기를 가질수 있는 C6~12아릴기, 치환기를 가질수 있는 C2~10알케닐기 또는 치환기를 가질수 있는 C3~10시클로알킬기이며 환 C 및 환 E는 치환기를 가질수 있다.)
- 제1항에 있어서, 디스-아조 화합물이 하기 식(Ⅴ)로 표현되는 디스-아조 화합물인 금속 킬레이트 화합물:(식중, X는 그것이 결합된 두 개의 탄소원자와 함께 방향족기를 형성하는 잔기이며, D는 치환기를 가질 수 있는 방향족 잔기 또는 치환기를 가질수 있는 복소환 아민 잔기이며, Y는 활성 수소를 갖는 기 또는 그 염이며, R3은 수소원자, C1~6알킬기, C1~6알콕시기 또는 할로겐 원자 또는 C6~12아릴기이다.)
- 제1항에 있어서, 디스-아조 화합물이 하기 식(Ⅵ)로 표현되는 디스-아조 화합물인 금속 킬레이트 화합물:(식중, D는 치환기를 가질 수 있는 방향족 잔기 또는 치환기를 가질수 있는 복소환 아민 잔기이며, 서로간에 독립적인 R1및 R2는 각각 수소원자, 치환기를 가질수 있는 C1~20알킬기, 치환기를 가질수 있는 C6~12아릴기, 치환기를 가질수 있는 C2~10알케닐기 또는 치환기를 가질수 있는 C3~10시클로알킬기이고, R3은 수소원자, C1~6알킬기, C1~6알콕시기, 할로겐 원자 또는 C6~12아릴기이며 환 C는 치환기를 가질수 있다.)
- 제1항에 있어서, 디스-아조 화합물이 하기 식(Ⅶ)로 표현되는 디스-아조 화합물인 금속 킬레이트 화합물:(식중, 서로간에 독립적인 R1및 R2는 각각 수소원자, 치환기를 가질수 있는 C1~20알킬기, 치환기를 가질수 있는 C6~12아릴기, 치환기를 가질수 있는 C2~10알케닐기 또는 치환기를 가질수 있는 C3~10시클로알킬기이고, R3은 수소원자, C1~6알킬기, C1~6알콕시기, 할로겐 원자 또는 C6~12아릴기이며 환 C 및 E는 각각 치환기를 가질수 있다.)
- 기판위에 설치되어 레이저로 정보를 기입 및/또는 해독할 수 있는, 제1항 내지 제11항중 어는 한항에 따르는 금속과 디스-아조 화합물과의 킬레이트 화합물을 함유하는 기록층을 갖는 광학적 기록 매체.
- 제12항에 있어서, 금속이 전이 원소인 광학적 기록 매체.
- 제13항에 있어서, 금속이 코발트 또는 니켈인 광학적 기록 매체.
- 제12항 내지 제14항중 어느 한 항에 있어서, 금속 반사층 및 보호층이 기록층 위에 설치된 광학적 기록 매체.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6896790 | 1990-03-19 | ||
| JP90-68967 | 1990-03-19 | ||
| JP90-118197 | 1990-05-08 | ||
| JP11819790 | 1990-05-08 | ||
| JP90-147705 | 1990-06-06 | ||
| JP14770590 | 1990-06-06 | ||
| JP26362790 | 1990-10-01 | ||
| JP90-263627 | 1990-10-01 | ||
| PCT/JP1991/000365 WO1991014740A1 (fr) | 1990-03-19 | 1991-03-19 | Compose de chelation metallique et support d'enregistrement optique comprenant celui-ci |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR920702863A true KR920702863A (ko) | 1992-10-28 |
| KR0152089B1 KR0152089B1 (ko) | 1998-10-01 |
Family
ID=27465065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019910701635A KR0152089B1 (ko) | 1990-03-19 | 1991-03-19 | 금속 킬레이트 화합물 및 그것을 이용한 광학적 기록 매체 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5231173A (ko) |
| EP (1) | EP0477373B1 (ko) |
| KR (1) | KR0152089B1 (ko) |
| CA (1) | CA2057864A1 (ko) |
| DE (1) | DE69128118T2 (ko) |
| WO (1) | WO1991014740A1 (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69112337T2 (de) * | 1990-05-25 | 1996-05-02 | Mitsubishi Chem Corp | Farbstoffzusammensetzung und optisches aufzeichnungsmedium. |
| DE69320406T2 (de) * | 1992-06-02 | 1999-04-22 | Mitsubishi Chem Corp | Metallchelat sowie optisches Aufzeichnungsmedium, das diese Verbindung verwendet |
| TW340864B (en) | 1995-07-20 | 1998-09-21 | Mitsui Toatsu Chemicals | Optical recording medium |
| US6214519B1 (en) | 1995-08-22 | 2001-04-10 | Mitsubishi Chemical Corporation | Optical recording medium |
| DE69730398T2 (de) * | 1996-11-20 | 2005-09-08 | Mitsubishi Chemical Corp. | Sulfonamide und Verfahren zu ihrer Herstellung, Metall-chelates hergestellt aus den Sulfonamiden, und optisches Aufzeichnungsmaterial hergestellt aus den Metall-chelaten |
| US6515665B1 (en) * | 1999-06-21 | 2003-02-04 | Tektronix, Inc. | Data filtering/suppression of data acquisitions/samples for multi-channel electronic display and analysis |
| US7147310B2 (en) * | 2002-01-30 | 2006-12-12 | Hewlett-Packard Development Company, L.P. | Printing-fluid container |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE943661C (de) * | 1952-01-17 | 1956-05-24 | Sandoz Ag | Verfahren zur Herstellung von Dis- und Polyazofarbstioffen |
| DE2557410C2 (de) * | 1975-12-19 | 1984-11-08 | Bayer Ag, 5090 Leverkusen | Disazofarbstoffe |
| DE2640542A1 (de) * | 1976-09-09 | 1978-03-23 | Basf Ag | Azofarbstoffe |
| DE2727114A1 (de) * | 1977-06-16 | 1978-12-21 | Bayer Ag | Disazofarbstoffe |
| US4175067A (en) * | 1977-08-17 | 1979-11-20 | The Quaker Oats Company | Curable binder for large foundry sand shapes |
| JPS54141820A (en) * | 1978-04-26 | 1979-11-05 | Agency Of Ind Science & Technol | Novel heterocyclic azo compound and its preparation |
| JPH0232301B2 (ja) * | 1981-12-05 | 1990-07-19 | Gosei Senryo Gijutsu Kenkyu Kumiai | Jisuazosenryonoseizoho |
| JPS6230090A (ja) * | 1984-12-28 | 1987-02-09 | Kuraray Co Ltd | 光情報記録媒体 |
| JPS6213461A (ja) * | 1985-07-11 | 1987-01-22 | Mitsubishi Chem Ind Ltd | ジスアゾ染料 |
| GB8704727D0 (en) * | 1987-02-27 | 1987-08-05 | Ici Plc | Aromatic disazo compound |
-
1991
- 1991-03-19 KR KR1019910701635A patent/KR0152089B1/ko not_active IP Right Cessation
- 1991-03-19 CA CA002057864A patent/CA2057864A1/en not_active Abandoned
- 1991-03-19 US US07/776,256 patent/US5231173A/en not_active Expired - Lifetime
- 1991-03-19 EP EP91906195A patent/EP0477373B1/en not_active Expired - Lifetime
- 1991-03-19 WO PCT/JP1991/000365 patent/WO1991014740A1/ja active IP Right Grant
- 1991-03-19 DE DE69128118T patent/DE69128118T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2057864A1 (en) | 1991-09-20 |
| EP0477373A1 (en) | 1992-04-01 |
| DE69128118D1 (de) | 1997-12-11 |
| KR0152089B1 (ko) | 1998-10-01 |
| EP0477373B1 (en) | 1997-11-05 |
| US5231173A (en) | 1993-07-27 |
| WO1991014740A1 (fr) | 1991-10-03 |
| EP0477373A4 (en) | 1992-09-09 |
| DE69128118T2 (de) | 1998-03-05 |
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