KR920702016A - Cvd 장치를 위한 기판 지지장치 - Google Patents
Cvd 장치를 위한 기판 지지장치Info
- Publication number
- KR920702016A KR920702016A KR1019910700507A KR910700507A KR920702016A KR 920702016 A KR920702016 A KR 920702016A KR 1019910700507 A KR1019910700507 A KR 1019910700507A KR 910700507 A KR910700507 A KR 910700507A KR 920702016 A KR920702016 A KR 920702016A
- Authority
- KR
- South Korea
- Prior art keywords
- opening
- support
- substrate
- supporting
- substrate support
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 기판 지지구조의 일부 단면도, 제2도는 핫 월(got wall)형의 CVD 장치에 배치된 본 발명의 기판 지지 구조의 다른 실시예의 일부 단면도, 제3도는 종래의 기판 지지장치가 배치된 종형 항아리 모양의 CVD 장치의 개략 단면도.
Claims (2)
- 다수의 처리해야 할 기판 각각을 지지하는 평행으로 배열된 다수의 지지판을 갖는 기판 지지장치에 있어서, 상기 각 지지판이 그 중앙에 개구를 갖고 있고, 또 상기 기판을 상기 지지판에서 격리해서 상기 개구상에 지지하기 위한 다수의 클립을 개구의 주위에 구비하며, 상기 지지판의 개구의 크기가 2종류 이상인 것을 특징으로 하는 기판 지지장치.
- 다수의 기판상에 CVD에 의해 박막을 형성하는 CVD 장치에 있어서, 상기 다수의 기판 각각을 지지하는 평행으로 배열된 다수의 지지판을 갖는 기판 지지장치가 CVD 장치내에 설치되고, 상기 각 지지판이 그 중앙에 개구에 갖고 있고 또 상기 기판을 지지판에서 격리해서 개구상에서 지지하기 위한 복수의 클립을 개구의 주위에 구비하고, 상기 지지판의 개구의 크기가 2종류 이상인 것을 특징으로 하는 CVD장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP01-109677 | 1989-09-21 | ||
JP1-109677 | 1989-09-21 | ||
JP1989109677U JPH06818Y2 (ja) | 1989-09-21 | 1989-09-21 | Cvd装置のための基板支持装置 |
PCT/JP1990/001182 WO1991004572A1 (en) | 1989-09-21 | 1990-09-14 | Substrate support device for cvd apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920702016A true KR920702016A (ko) | 1992-08-12 |
KR950013428B1 KR950013428B1 (ko) | 1995-11-08 |
Family
ID=14516382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910700507A KR950013428B1 (ko) | 1989-09-21 | 1990-09-14 | Cvd장치를 위한 기판 지지 장치 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0444205B1 (ko) |
JP (1) | JPH06818Y2 (ko) |
KR (1) | KR950013428B1 (ko) |
DE (1) | DE69024478T2 (ko) |
WO (1) | WO1991004572A1 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4426518B2 (ja) * | 2005-10-11 | 2010-03-03 | 東京エレクトロン株式会社 | 処理装置 |
EP2815426B1 (de) * | 2012-02-16 | 2020-10-07 | (CNBM) Bengbu Design & Research Institute for Glass Industry Co., Ltd. | Prozessbox, anordnungen und verfahren zum prozessieren beschichteter substrate |
JP5977274B2 (ja) * | 2013-03-21 | 2016-08-24 | 東京エレクトロン株式会社 | バッチ式縦型基板処理装置および基板保持具 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3678893A (en) * | 1970-05-01 | 1972-07-25 | Stewart Warner Corp | Improved device for supporting semiconductor wafers |
FR2251370B1 (ko) * | 1973-11-15 | 1978-12-01 | Radiotechnique Compelec | |
JPS5670830A (en) * | 1979-11-10 | 1981-06-13 | Toshiba Corp | Vapor growth method |
US4421786A (en) * | 1981-01-23 | 1983-12-20 | Western Electric Co. | Chemical vapor deposition reactor for silicon epitaxial processes |
DD206687A3 (de) * | 1981-07-28 | 1984-02-01 | Mikroelektronik Zt Forsch Tech | Verfahren und vorrichtung zur gasfuehrung fuer lp cvd prozesse in einem rohrreaktor |
JPS58108735A (ja) * | 1981-12-23 | 1983-06-28 | Fujitsu Ltd | 縦型反応管用バスケツト |
JPS59117138U (ja) * | 1983-01-27 | 1984-08-07 | 日本電気ホームエレクトロニクス株式会社 | 半導体製造装置 |
JPS6252929U (ko) * | 1985-09-21 | 1987-04-02 | ||
JPS62142839U (ko) * | 1986-03-04 | 1987-09-09 | ||
JP2568185B2 (ja) * | 1987-01-23 | 1996-12-25 | 株式会社日立製作所 | 熱処理装置 |
JPS633155Y2 (ko) * | 1987-03-12 | 1988-01-26 | ||
JPH0727870B2 (ja) * | 1987-12-24 | 1995-03-29 | 東横化学株式会社 | 減圧気相成長方法 |
-
1989
- 1989-09-21 JP JP1989109677U patent/JPH06818Y2/ja not_active Expired - Lifetime
-
1990
- 1990-09-14 KR KR1019910700507A patent/KR950013428B1/ko not_active IP Right Cessation
- 1990-09-14 DE DE69024478T patent/DE69024478T2/de not_active Expired - Fee Related
- 1990-09-14 WO PCT/JP1990/001182 patent/WO1991004572A1/ja active IP Right Grant
- 1990-09-14 EP EP90913542A patent/EP0444205B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0444205A4 (en) | 1992-07-08 |
WO1991004572A1 (en) | 1991-04-04 |
KR950013428B1 (ko) | 1995-11-08 |
EP0444205B1 (en) | 1995-12-27 |
DE69024478T2 (de) | 1996-07-04 |
JPH06818Y2 (ja) | 1994-01-05 |
DE69024478D1 (de) | 1996-02-08 |
EP0444205A1 (en) | 1991-09-04 |
JPH0350324U (ko) | 1991-05-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR970018285A (ko) | 종형 열처리장치 | |
KR970023891A (ko) | 기판세정방법 및 기판세정장치 | |
EP0022874A4 (en) | Hanging scaffold. | |
KR870007569A (ko) | 테이프 자동 결합용 상호 접속 테이프 | |
DK269688D0 (da) | Fremgangsmaader til fremstilling af antistatisk papir og herved fremstillede papirprodukter og anvendt apparatur | |
KR890013729A (ko) | 반응성 이온 에칭장치 | |
NO840134L (no) | Proevesamler | |
KR860008593A (ko) | 웨이퍼 이재구(Wafer 移載具) | |
FI850953L (fi) | Dispergering av torra polymerer i vatten. | |
KR970077095A (ko) | 종형 기상성장 장치용 캡 | |
DE69008078D1 (de) | Gas-/Flüssigkeits-Trennungsvorrichtung. | |
KR920702016A (ko) | Cvd 장치를 위한 기판 지지장치 | |
KR840006871A (ko) | 표시장치 | |
ES510353A0 (es) | Un procedimiento y una instalacion separadora para el inter cambio de sustancias entre una corriente de liquido y una corriente de vapor. | |
EP0402052A3 (en) | Signal carrier supports | |
ES2134117A1 (es) | Barco con columnas de apoyo que se extienden verticalmente. | |
KR880010414A (ko) | 카세트 리일 | |
KR900007925A (ko) | 고온 반응 처리 방법 | |
KR930005074A (ko) | 플라즈마 표시소자 | |
KR880008707A (ko) | 다중기판을 이용한 칼라 플라즈마 디스플레이 판넬 | |
KR830007399A (ko) | 전기 및 전자부품이송용 이송홀더 | |
KR970076963A (ko) | 지주재 정열용 지구 | |
KR920003382A (ko) | 플라즈마 표시소자 | |
KR960014531A (ko) | 지료정선장치(紙料精選裝置) 및 지료정선장치용의 스크린의 제조방법 | |
IT8221311A0 (it) | Impilatore di pezzi piccoli con disposizione in verticale. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20071026 Year of fee payment: 13 |
|
LAPS | Lapse due to unpaid annual fee |